AVS1997 Plasma Science and Technology Division Sessions
Click a Session Code to view its Abstracts
Topics | Time Periods | Schedule Overview
| Session Code | Start | Session Name |
|---|---|---|
| PS+MS-MoM | Monday, October 20, 1997 8:20 AM | Plasma Sensors |
| PS-MoM | Monday, October 20, 1997 8:20 AM | Plasma Damage |
| PS+FP-MoA | Monday, October 20, 1997 2:00 PM | Flat Panel Plasma Sources & Processes |
| PS-MoA | Monday, October 20, 1997 2:00 PM | Plasma Damage and Feature Evolution |
| PS-MoP | Monday, October 20, 1997 5:30 PM | Plasma Sources, Sensors, Processes and Damage |
| PS1-TuM | Tuesday, October 21, 1997 8:20 AM | Novel Plasma Sources & Systems |
| PS2-TuM | Tuesday, October 21, 1997 8:20 AM | Chamber Cleaning and Downstream Processing |
| PS1-TuA | Tuesday, October 21, 1997 2:00 PM | Compound Semiconductor Etching |
| PS2-TuA | Tuesday, October 21, 1997 2:00 PM | Pulsed Plasma Material Processing |
| PS-TuP | Tuesday, October 21, 1997 5:30 PM | Plasma Etching, Deposition, and Surface Interactions |
| PS1-WeM | Wednesday, October 22, 1997 8:20 AM | Plasma Reaction Mechanisms |
| PS2-WeM | Wednesday, October 22, 1997 8:20 AM | Oxide Etching: Diagnostics and Tools |
| PS-WeA | Wednesday, October 22, 1997 2:00 PM | Oxide Etching: Aspect Ratio Dependent Etching and Selectivity |
| PS+TF+MS-ThM | Thursday, October 23, 1997 8:20 AM | Ionized PVD |
| PS1-ThM | Thursday, October 23, 1997 8:20 AM | Plasma Surface Interactions I |
| PS-ThA | Thursday, October 23, 1997 2:00 PM | Plasma Surface Interactions II |
| PS-FrM | Friday, October 24, 1997 8:20 AM | Low-K Dielectric and Organic Plasma Processes |