ICMCTF2010 Session B6-2: Hard and Multifunctional Nano-Structured Coatings
Time Period TuM Sessions | Abstract Timeline | Topic B Sessions | Time Periods | Topics | ICMCTF2010 Schedule
Start | Invited? | Item |
---|---|---|
8:00 AM |
B6-2-1 The Role of Interfaces in the Strengthening and Stability of Superhard Nanocomposites
Stan Veprek, Rui Feng Zhang, Shu Hong Sheng (Technical University Munich, Germany); Ali Argon (Massachusetts Institute of Technology); Mojmir Jilek (SHM s.r.o); Andreas Bergmaier (Universität der Bundeswehr, Germany) Superhard nanocomposites of -TiN/a-Si3N4 can reach hardness of more than 100 GPa when prepared under conditions which allow the formation of fully segregated phases with about 1 monolayer (ML) thick Si3N4-like interface, free of impurities, which is significally strengthened by valence charge transfer from surounding TiN nanocrystals [1,2]. In the present paper we shall show, that such strengthening results in weakening of the neigbour TiN by Friedel oscillations of the valence charge density [3]. The 1 ML SiNx interface is the strongest configuration because when its thicknes increases, the Friedel oscillations cause further weakening of the neighbor TiN. The Ti-Si-N system will then be compared with several others consisting of different transition metal and covalent nitrides in order to elucidate the possibility of finding a better one with reduced amplitude of the weakening Friedel oscillations. It has been shown earlier, that impurities, in particular oxygen, strongly degrade the mechanical properties of these materials by embrittling the SiNx interfaces [4]. We shall briefly discuss the recent progress in the understanding of this detrimental effect on the atomic scale, and compare it with several examples from other disciplines to show, that this effect is not uncommon. The final part of our paper deals with the control of the impurities in industrial-size coating applications.We shall show how an impurity content of ≤ 0.1 at.% is achieved today in industrial production, and outline possibilities of its further decrease down to a few 100 ppm.
[1] S. Veprek et al., Phil. Mag. Lett. 87(2007)955. [2] M. Veprek-Heijman et al., Surf. Coat. Technol. 203(2009)3385. [3] R. F. Zhang et al., Phys. Rev. Lett. 102(2009)015503; Phys. Rev. B 79(2009)245426. [4] S. Veprek et al., J. Vac. Sci. Technol. B 22(2004)L5; B 23(2005)L17 |
|
8:20 AM |
B6-2-2 Durability of CrSiN Nanocomposite Coatings: Key-Role of Grain Boundaries and Interfaces
Thomas Schmitt (Ecole Centrale de Lyon, France); Philippe Steyer (INSA de Lyon, France); Julien Fontaine (Ecole Centrale de Lyon, France); Nicolas Mary (INSA Lyon, France); Frederic Sanchette (CEA, France); Claude Esnouf (INSA Lyon, France) The recent developments in sputtering processes have allowed the achievement of complex ceramic hard coatings. The motivation of such research efforts is to provide multifunctional coatings in order to meet industrial needs, for instance in severe machining applications. In this study, we are focusing on ternary nanocomposite CrSiN coatings deposited by arc evaporation PVD, process which is increasingly used in industry. Our objective is to improve CrN-based coatings durability by modifying, on the one hand, their chemistry (addition from 0 to 20 at.% Si) and, on the other hand, their architecture (single- and multi-layered films). Special attention will be paid to mechanisms involved in the formation of the nanocomposite CrSiN structure, and to their consequences on oxidation and wear behaviours. Microstructure was investigated by XRD analyses, SEM and TEM observations. Mechanical properties were measured by nanoindentation and SEM in situ tensile tests. Silicon enrichment leads to a drastic improvement of the oxidation resistance, whereas it appears to be detrimental to the wear resistance in the case of single-layered films. Nevertheless, the use of a multi-layered architecture leads to the best functional properties. These results will be discussed in light of films microstructure, especially regarding grain boundaries and interfaces. |
|
8:40 AM | Invited |
B6-2-3 Advanced Modelling of Structures and Properties of Crystalline, Nanocrystalline and Amorphous Nitrogen-Based Materials
Jiri Houska (University of West Bohemia, Czech Republic) The combination of experiment with advances in computer simulation techniques and growing computing capacities constitute a powerful approach for explaining the complex relationships between deposition conditions, structure and properties of functional materials. Different levels of theory can be used to describe the interatomic interactions, ranging from ab-initio density-functional theory to classical molecular dynamics (MD) using empirical potentials. We review usefulness of individual simulation approaches using examples of novel high-performance nitrogen-based materials that have important applications. A special attention is paid to the comparison of calculated and experimental results. Amorphous Si‑B‑C-N materials provide outstanding thermal stability in inert atmosphere up to the 1700 °C substrate limit and oxidation resistance in air up to 1600 °C in connection with controllable mechanical, electronic and optical properties. We investigate in detail how the Si/C ratio, N/(Si+B+C) ratio and the B content affect structure and characteristics of Si-B-C-N materials. Observing the formation of N2 molecules and the dynamics of bond-breaking events in simulations of heated Si-B-C-N materials allows understanding of their thermal stability. Fcc metal nitrides exhibit superior but mutually different properties, including a qualitative difference between nonmagnetic hard cubic TiN, and magnetic oxidation-resistant CrN which may exhibit a cubic/orthorhombic structural transformation. Calculations of energies and electronic structures of Ti(Si)N(C) and Cr(Si)N(C) lead to complete understanding of evolutions of the lattice constant, elastic moduli, Poisson's ratio, magnetization and the structural preference. Depending on composition and deposition conditions, ternary metal nitrides may form superhard nanocomposite structures. We predict thermodynamically preferred structures of Ti(50-x)SixN50 nanocomposites of various compositions. We focus on formation and growth of TiN nanocrystals, and investigate how the Si content affects their number, size distribution, quality in terms of deformation and Si impurities, and thickness of the amorphous phase between them. Amorphous SiNH materials prepared by plasma-enhanced chemical vapor deposition are suitable for diverse applications including systems with a graded refractive index. We reproduce the deposition process of SiNH films from SiHx and N radicals. We investigate the effect of particle flux composition and ion bombardment characteristics on vertical profiles of the films, deposition characteristics such as sticking coefficients, and material characteristics such as dimension of nanopores formed. |
9:20 AM |
B6-2-5 Electrical Conductivity in Si-Based Transition Metal Nanocomposite Nitrides
Rosendo Sanjines, David Oezer, Cosmin Sandu (EPFL, Switzerland); Jörg Patscheider (Empa, Switzerland) In Me-S-iN (Me= Ti, Cr, Zr, Nb, Cr) nanocomposite materials composed of small MeN crystallites (5-10 nm size) surrounded by thin SiNx layers (1-2 molecular layers), the electrical conductivity exhibits metallic or non-metallic behaviour depending on the Si content, the MeN crystallite size and the thickness of the SiNx tissue phase. Resistivity measurements are therefore considered as a practical method to characterize the formation of nanocomposite films. By modelling the electron scattering mechanism, pertinent information can be obtained on the film morphology. However, as the Me-Si-N films deposited by magnetron scattering often exhibit columnar morphology, another parameter influencing the electrical conductivity is the film texture. In the present paper, we report on the electrical properties of ZrxSiyN thin films (from 10 nm to 200 nm) whose resistivity has been investigated as a function of the Si content, grain shape and size, and film thickness. ZrxSiyN films with selected Si content and film thickness have been deposited by reactive magnetron sputtering in UHV reactor chamber at 900 K. The grain size and shape were characterized by in situ STM and HRTEM , and the electrical conductivity of films was measured by the van der Pauw method in the temperature range of 20-350 K. The dependence of the electrical conductivity from grain boundary and grain size scattering effects is discussed. |
|
9:40 AM |
B6-2-6 Microstructure and Mechanical Properties of Nanocomposite Ti-B-C, Ti-B-C-N, and Ti-B-C-N-Si Films Deposited by Unbalanced Magnetron Sputtering
In-Wook Park, John J. Moore, Brajendra Mishra (Colorado School of Mines); Andrey Voevodin (Air Force Research Laboratory); Kwang Ho Kim (NCRC-HyMAS, Korea); Evgeny Levashov (Moscow State Institute for Steels and Alloys, Russia) Multifunctional nanocomposite, based on nanocrystalline (nc-) and amorphous (a-) phases, films attract considerable interest to extend the lifetime of cutting tools, press-forming tools and various other mechanical components. Films for most tribological applications require combinations of properties such as a relatively high hardness, high fracture toughness, wear- and oxidation-resistance, and a low friction coefficient. The present work investigates the co-deposition of Ti-B-C, Ti-B-C-N, and Ti-B-C-N-Si nanocomposite films from a composite target of TiB2-TiC and a pure boron doped Si target using DC unbalanced magnetron sputtering in Ar/N2 gas mixtures. The microstructures and mechanical properties for the films were investigated in various N and Si contents. The microstructures of the synthesized films were characterized by X-ray diffractometer (XRD), scanning electron microscope (SEM), X-ray photoelectron spectroscope (XPS), high-resolution transmission electron microscope (HRTEM), respectively. Nano-indentation was conducted to assess the hardness and Young’s modulus of the films. In the present work, the comprehensive microstructures and various mechanical properties of the films were investigated and correlated with deposition parameters. |
|
10:00 AM |
B6-2-7 Combinatorial Approach to the Growth of Al-Cr-O-N Thin Films by Reactive r.f. Magnetron Sputtering
Dominic Diechle, Michael Stüber, Harald Leiste, Sven Ulrich (Forschungszentrum Karlsruhe, Germany) The PVD synthesis of wear and oxidation resistant aluminum oxide and derivative coatings is currently attracting large scientific and technical interest. Ternary Al-Cr-O thin films with mechanical properties comparable or superior to binary Al-O thin films can be deposited at moderate deposition temperatures. New coatings from the quaternary Al-Cr-O-N system could even offer increased strength, hardness and toughness. A combinatorial approach to the growth of Al-Cr-O-N thin films by means of reactive r.f. magnetron sputtering will be presented. For specific deposition conditions well adherent, nanocrystalline Al-Cr-O-N thin films with high Vickers hardness and elastic modulus values were grown at non-equilibrium conditions on cemented carbide and silicon substrates. Detailed results on the coatings composition, constitution, microstructure and properties will be presented and discussed in comparison to ternary Al-Cr-O thin films deposited under identical conditions. |
|
10:20 AM | Invited |
B6-2-8 Design of Hard Ti-Based Nitride Coatings and Multilayer Structuring
Tetsuya Suzuki, Naoya Fukumoto (Keio University, Japan); Hiroyuki Hasegawa (Okayama University, Japan); Toshiyuki Watanabe (Kanagawa Academy of Science and Technology, Japan); S. Kinoshita (Tungaloy Corporation, Japan) In this talk, we present and summarize the effect of the coating properties by adding other elements such as Cr and (or) Si to this conventional TiAlN coating deposited by arc ion plating system, especially because of its tendency to form nanocomposite structure. Quaternary TiCrAlSiN coatings with varying (Al+Si) content formed a nanocomposite structure and showed superior properties with high hardness, good oxidation resistance and thermal stability [1, 2]. The addition of Cr and Si to TiAlN resulted in a mixed-phase coating at some compositions, which degraded the coating properties. Therefore, a ternary TiAlSiN coating was introduced to clarify the effect of Si addition and to inquire a new hard and tough coating. The structural transformation easily occurs by adding other elements and the choice of the right composition is an essential factor. The addition of Y to TiAlN can induce the growth of protective oxide scales at high temperatures, which prompts the good oxidation resistance [3]. Another trend in hard coatings for wear-protection is the development of multilayer coatings with small multilayer periods (nanometer thick layers). The multilayer coating show peculiar characteristic of hardness at small periods and new multilayer coating can be designed not only to increase the hardness, but also to compensate the degrading properties of each layer. The TiAlSiN coating with low Al content was layered with high Al content CrAlN coating to develop a new multilayer coating that could have a high Al content with a single cubic structure [4]. This multilayer coating showed a superior property with good oxidation resistance compared to monolayer coatings. [1] K. Ichijo, H. Hasegawa, T. Suzuki, Surf. Coat. Technol., 201, (2007) 5477. [2] H. Ezura, K. Ichijo, H. Hasegawa, K. Yamamoto, A. Hotta, T. Suzuki, Vacuum, 82, (2008) 476. [3] T. Urakawa, N. Fukumoto, T. Suzuki, PSE 2009 in press. [4] N. Fukumoto, H. Ezura, T. Suzuki, Surf. Coat. Technol., (in press). |
11:00 AM |
B6-2-11 Multifunctional NbC-Based Nanocomposite Thin Films
Nils Nedfors (Uppsala University, Sweden); Olof Tengstrand (Linköping University, Sweden); Erik Lewin, Andrej Furlan (Uppsala University, Sweden); Per Eklund, Lars Hultman (Linköping University, Sweden); Ulf Jansson (Uppsala University, Sweden) Earlier studies have shown that magnetron sputtered nc-TiC/a-C nanocomposite coatings have excellent electrical contact properties [1]. Consequently, this type of material has a potential use in, e.g., sliding contacts where low contact resistance and high wear resistance combined with low friction are required. We propose that the performance of the nanocomposite coating can be further improved by exchanging Ti towards another carbide-forming transition metal. In this study we have investigated sputtered nanocomposite films in the Nb-C system for multifunctional applications with a focus on electrical and mechanical properties. Thin films of nc-NbC/a-C were deposited by nonreactive, unbalanced dc-magnetron sputtering from two separate Nb and C targets. Samples with relative carbon content between 49 and 64 at. % were deposited through tuning of magnetron currents. The structure of the films was characterized with X-ray diffraction (XRD) and scanning and transmission electron microscopy (SEM and TEM). X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy were used to characterize the relative composition and chemical bonding. The mechanical properties of the films was determined with nano-indentation and pin-on-disc measurements. Contact resistance measurements were carried out in a custom-built set-up with crossed cylinder geometry. The results show that both the grain size of the NbC nanocrystallites as well as the relative amount of carbide and amorphous carbon matrix can be controlled by the process parameters. The electrical and mechanical properties are strongly dependent on the amount of matrix and carbide grain size. Optimum conditions are found with amorphous tissue phase between the carbide grains. The contact resistance for nc-NbC/a-C was about 50-90 µΩ at 100 N compared to 60-110 µΩ for nc-TiC/a-C at similar conditions. Possible mechanisms for this behaviour will be discussed. [1] E. Lewin, O. Wilhelmsson, U. Jansson, Journal of Applied Physics 100, 054303 (2006) |