ALD/ALE 2025 Tuesday Morning

Effect of Ga Doping on Coercive Field Reduction and Endurance Enhancement in Atomic Layer Deposited HfO2-based Thin Film for FeRAM Applications

Realizaton of Selector-Only Memory via Supercycle Atomic Layer Deposition of Ge-Sb-Se Ternary Alloy

Atomic-Scale Thickness Control of Antiferroelectric ZrO₂ via Morphotropic Phase Boundary Engineering for Enhanced Ferroelectricity

Metastable Rutile TiO2 Growth on Non-Lattice-Matched Substrates via a Sacrificial Layer Strategy

EWF Modulation and Electrical Performance Enhancement Using Fluorine Surface Treatment in Yttrium Oxide-based Dipole-First Gate Stack

Reconfigurable Memristor Crossbar for Graphlet Computing

Tuning of Effective Work Function in Cl Free TiAlN ALD Through Fine Al Doping Process for Gate Electrode Application

Optimizing Grain Structure in Mo-Ru Alloys for High Conductivity

Defect-free Carbon based EUV Pellicle by using Bi-layer Capping with Atomic Layer Deposition

Three-Step Plasma-Enhanced ALD of Ultra-Thin SiNx with Enhanced Etch Resistance for EUV Pellicle Applications

Mo₂C-Coated CNT with Hydrogen Radical Resistance for EUVL Pellicles

ALD Outstanding Presentation Award Finalist: Vapor-Phase Infiltration of Hafnium in Poly(Methyl Methacrylate) Thin Films for Extreme Ultraviolet Lithography Applications

Atomic Layer Deposition and Atomic Layer Etch cycles to minimize “Mushroom Growth” effect in Area Selective Atomic Layer Deposition

The Mechanism of Thermal ALD of Silicon Carbonitride from Chloroalkylsilanes and Ammonia – Theory Meets Experiment

Mechanistic Studies on Area Selective ALD of Iridium

ALD Outstanding Presentation Award Finalist: Like Boots or Hearts: The Kinetics of Precursor Decomposition

Reaction Mechanism of Atomic Layer Deposition of Zirconium Oxide Using Tris(dimethylamino)cyclopentadienyl Zirconium

A Study on the Correlation of Surface Chemistry to Electrical Properties of Ultra-thin Oxide Semiconductors by Atomic Layer Deposition: A Case Study of Indium Oxides Thin Films

Catalytic Role of Silane(SiH4) in Enhancing Titanium Nitride(TiN) Atomic Layer Deposition(ALD)

Correlation of Hydroxyl Group and Growth Characteristics in Atomic Layer Deposition of Ternary Oxide Depending on Growth Temperature

Atomistic Modeling of Oxygen Recombination Reactions in the ALD of SiO₂ and Al₂O₃

Screening Volatile Metal Complex for ALD Precursor by Modified COSMO-SAC Method and Estimating Its Reactivity by Atomistic Simulator Using Neural Network Potential

Ion Effects on Plasma-induced Surface Composition Changes during SiCN Atomic Layer Deposition: A Combined Ab-Initio and Monte Carlo Approach

Benchmarking Large Language Models for Atomic Layer Deposition

Adsorption State Study of Trimethylaluminum Using Neural Network Potential Computation and High Accuracy in-situ Quartz Crystal Microbalance

Atomistic Insights into the Surface Chemistry Driving ALD of IGZO Films from First-Principles and Machine-Learning Simulations

ALD of SnO₂ Thin Films using Tin(IV) Acetate as a Novel Precursor

Bridging the Gap: Volachem’s Mission to Advance ALD Precursor Development

Revealing the Effect of Defect and Hydrogenation on Borazine-based Atomic Layer Deposition using First Principles Calculations

Novel Heteroleptic Precursors for Oxide Semiconductor Films (In-, Ga-, Zn-, Sn-Ox), Aimed at Co-dosing Process and Cocktail Precursor

Investigation of Fluorinated Copper and Gold Alkoxides as Precursors for Atomic Layer Deposition

ALD of Al₂O₃ for Gas Barrier Applications: Impact of Al Precursors

Atomic Layer Deposition of Nb₂O₅ using New Nb Precursor

Atomic Layer Deposition of Mo Thin Film using Metal Organic Mo Precursor

Thermal Atomic Layer Etching in Next Generation 3D Devices

Atomic Layer Etching of SiCO Films with Surface Modification by O₂ and CF₄/NH₃/Ar Plasmas and Desorption by IR Annealing

Thermal Atomic Layer Etching of Mo with NbCl₅ and O₂

Film and Surface Stress During Thermal Atomic Layer Etching of Al₂O₃ and Tungsten

The Invention of Atomic Layer Etching: on the Conception of Cycled Exposures of Silicon to Halogens and Pulses of Heat, Ions, and More, by Seiichi Iwamatsu

Isotropic Atomic Layer Etching of HfO­₂ using Plasma Fluorination with NF₃ and Ligand Exchange with BCl₃

Enhancing 3D NAND Flash Memory Production: Addressing High Aspect Ratio Etching Challenges with Atomic Layer Etching

Controlled Electron-Enhanced Silicon Etching with H₂ Background Gas and Positive Sample Voltage

Suppressing Surface Roughness in Tungsten Wet Atomic Layer Etching using Halogenation

Plasma-Enhanced Isotropic Atomic Layer Etching of Molybdenum with Fluorocarbon Layer Formation Followed by Plasma Oxidation

Zeolite-Like Frameworks Created by ALD/MLD as an All-Dry Resist Technology

Atomic Layer Regulation of MIL-53 Metal-Organic Framework as Interconnect Low-k Dielectrics

Nanolaminated Films with Negative Capacitance Fabriacted by ALD

Thermal Annealing of Molecular Layer-Deposited Tincone : Unveiling Sulfur's Structural Impacts in Graphitic Carbon Formation