ALD2018 Tuesday Afternoon

Amorphous In-Ga-Zn-O Thin-Film Transistor-Based Nonvolatile Memory Devices

Atomic Layer Deposition of Elemental Tellurium for Composition Tuning Of Ovonic Threshold Switching Materials

Plasma Enhanced Atomic Layer Deposition of Low Temperature Silicon Nitride for Encapsulation Layer using Novel Silicon Precursor

Atomic Layer Delta Doping and Deposition of Ultrathin Metallic TiN-based Channel for Room-temperature Field Effect Transistor

Influences of Annealing Conditions on Characteristics of Sn-doped Zinc Oxide Thin Film Transistors Fabricated by Atomic Layer Deposition

Studying Metal ALD Processes through X-ray Based in situ Characterization

Stresses in ALD Films: Aiming for Zero Stress Thin Films

High-throughput Screening of Atomic Arrangements of Surface and Interfacial Structures of ALD-deposited Thin Films

Application of Low Energy Ion Scattering for Characterization of Modern ALD Films of Industrial Relevance

Characteristic Evaluation of ZrO₂ Thin Films by PEALD to Semiconductor and Display using Cp-Zr Precursor

Hybrid Electronically Tailorable Dielectric Thin Films and Substrate Effects on Electrical and Chemical Properties of ALD Al₂O₃

Atomic Layer Deposition of Pyrite FeS₂, CoS₂, and NiS₂

Modeling the Infiltration Kinetics of Porous, High Surface Area Materials in ALD: Effective Diffusivities, Saturation Times, and Densification

Thin Film Conformality Analysis, Reliability and Modeling using All-silicon Lateral High Aspect Ratio Structures

High Step Coverage Properties of New Zr Precursors with High Thermal Stability for High-k

Atomic Layer Deposition: Tailoring High Aspect Ratio TiO₂ Nanostructures

Mechanisms Limiting Conformality in Thermal and Plasma-assisted ALD Investigated by Lateral High Aspect Ratio Structures

Multilayers on Reinforcement Fiber Fabrics with ALD

Mechanism of HF Pulse in the Thermal Atomic Layer Etch of Al₂O₃

Low-K Dielectric Etch Challenges at the 7nm Logic Node and Beyond: Continuous-wave vs. Quasi-atomic Layer Plasma Etching Performance Review

Precise Etching Profile Control by Atomic-scale Process

Thermal Selective Etching on Metal Oxide and Nitride Film

Benefits of Atomic Layer Etching for Material Selectivity

Approaching Atomic Scale Precision for Etch Technology Needs in the Semiconductor Industry

Open Air Processing of Innovative Transparent Conductive Materials with Spatial ALD

Conformality of SiO₂ and Al₂O₃ Coatings Produced using High Speed Spatial ALD with a DC Plasma

Characterizing Precursor Delivery from Vapor Draw Ampoules

Monitoring Conformality in ALD Manufacturing: Comparing Lateral and Vertical High Aspect Ratio Test Structures

A Remote Plasma Spectroscopy Based Method for Monitoring of Atomic Layer Deposition Processes

Integrated Isothermal Atomic Layer Deposition and Thermal Atomic Layer Etching: “Atomic-Level Processing” for Area-Selective Patterning of TiO₂

Inherent Substrate Selectivity and Nucleation Enhancement during Ru ALD using the RuO₄-Precursor and H₂-gas.

Surface Preparation and High Nucleation for Selective Deposition using Anhydrous Hydrogen Peroxide

An Inherently Selective Atomic Layer Deposition of MoSi_x ­on Si (001) in Preference to Silicon Nitride and Silicon Oxide

Investigating the Difference in Nucleation during Si-based ALD on Different Surfaces (Si, SiC, SiO₂ and SiN_x) for Future Area-Selective Deposition (AS-ALD)

Strategies for Area Selective Atomic Layer Deposition and Applications in Catalysis

Simultaneous Enhancement of Toughness and Elimination of the UV Sensitivity of Kevlar with a Combined ALD/MPI Process

Mutual Synergistic Doping in Conductive Hybrid Materials Obtained after Vapor Phase Infiltration

Infiltration Synthesis of ZnO in a Non-reactive Polymer Facilitated by Residual Solvent Molecules

Thermal Conductivity in Layer-engineered Inorganic-Organic Thin Films

Reversible Trans-cis Photoisomerization of ALD/MLD-fabricated Azobenzene-based Inorganic-Organic Thin Films

Organic/Inorganic Nanocomposite Synthesis through Sequential Infiltration of 3D Printed Polymer Parts: A Microstructural Study

Reactivity of Common ALD Precursors with OH/H₂O-containing Metal Organic Framework Materials

Atomic/Molecular Layer Deposition of Inorganic-Organic Carboxylate Network Thin Films for Possible Sensing Applications

Atomic Layer Etching and Chemical Vapor Etching of 2D Materials and Metal Oxide Films using MoF₆-H₂O

Membranes by Atomic Layer Deposition: Design and Applications

Field-effect Transistor using Two-dimensional Electron Gas in ALD Al₂O₃/TiO₂ Ultrathin (<10 nm) Film Heterostructure Interface

Increased WS₂ Crystal Grain Size by Controlling the Nucleation Behavior during Plasma Enhanced Atomic Layer Deposition

Controlling Material Properties of Nanostructured WS₂ during Plasma ALD for Improved Electrochemical Performance