ALD2018 Tuesday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Tuesday, July 31, 2018
1:30 PM 2:30 PM 3:30 PM 4:30 PM
Amorphous In-Ga-Zn-O Thin-Film Transistor-Based Nonvolatile Memory Devices
Atomic Layer Deposition of Elemental Tellurium for Composition Tuning Of Ovonic Threshold Switching Materials
Plasma Enhanced Atomic Layer Deposition of Low Temperature Silicon Nitride for Encapsulation Layer using Novel Silicon Precursor
Atomic Layer Delta Doping and Deposition of Ultrathin Metallic TiN-based Channel for Room-temperature Field Effect Transistor
Influences of Annealing Conditions on Characteristics of Sn-doped Zinc Oxide Thin Film Transistors Fabricated by Atomic Layer Deposition
Studying Metal ALD Processes through X-ray Based in situ Characterization
Stresses in ALD Films: Aiming for Zero Stress Thin Films
High-throughput Screening of Atomic Arrangements of Surface and Interfacial Structures of ALD-deposited Thin Films
Application of Low Energy Ion Scattering for Characterization of Modern ALD Films of Industrial Relevance
Characteristic Evaluation of ZrO2 Thin Films by PEALD to Semiconductor and Display using Cp-Zr Precursor
Hybrid Electronically Tailorable Dielectric Thin Films and Substrate Effects on Electrical and Chemical Properties of ALD Al2O3
Atomic Layer Deposition of Pyrite FeS2, CoS2, and NiS2
Modeling the Infiltration Kinetics of Porous, High Surface Area Materials in ALD: Effective Diffusivities, Saturation Times, and Densification
Thin Film Conformality Analysis, Reliability and Modeling using All-silicon Lateral High Aspect Ratio Structures
High Step Coverage Properties of New Zr Precursors with High Thermal Stability for High-k
Atomic Layer Deposition: Tailoring High Aspect Ratio TiO2 Nanostructures
Mechanisms Limiting Conformality in Thermal and Plasma-assisted ALD Investigated by Lateral High Aspect Ratio Structures
Multilayers on Reinforcement Fiber Fabrics with ALD
Mechanism of HF Pulse in the Thermal Atomic Layer Etch of Al2O3
Low-K Dielectric Etch Challenges at the 7nm Logic Node and Beyond: Continuous-wave vs. Quasi-atomic Layer Plasma Etching Performance Review
Precise Etching Profile Control by Atomic-scale Process
Thermal Selective Etching on Metal Oxide and Nitride Film
Benefits of Atomic Layer Etching for Material Selectivity
Approaching Atomic Scale Precision for Etch Technology Needs in the Semiconductor Industry
Open Air Processing of Innovative Transparent Conductive Materials with Spatial ALD
Conformality of SiO2 and Al2O3 Coatings Produced using High Speed Spatial ALD with a DC Plasma
Characterizing Precursor Delivery from Vapor Draw Ampoules
Monitoring Conformality in ALD Manufacturing: Comparing Lateral and Vertical High Aspect Ratio Test Structures
A Remote Plasma Spectroscopy Based Method for Monitoring of Atomic Layer Deposition Processes
Integrated Isothermal Atomic Layer Deposition and Thermal Atomic Layer Etching: “Atomic-Level Processing” for Area-Selective Patterning of TiO2
Inherent Substrate Selectivity and Nucleation Enhancement during Ru ALD using the RuO4-Precursor and H2-gas.
Surface Preparation and High Nucleation for Selective Deposition using Anhydrous Hydrogen Peroxide
An Inherently Selective Atomic Layer Deposition of MoSix ­on Si (001) in Preference to Silicon Nitride and Silicon Oxide
Investigating the Difference in Nucleation during Si-based ALD on Different Surfaces (Si, SiC, SiO2 and SiNx) for Future Area-Selective Deposition (AS-ALD)
Strategies for Area Selective Atomic Layer Deposition and Applications in Catalysis
Simultaneous Enhancement of Toughness and Elimination of the UV Sensitivity of Kevlar with a Combined ALD/MPI Process
Mutual Synergistic Doping in Conductive Hybrid Materials Obtained after Vapor Phase Infiltration
Infiltration Synthesis of ZnO in a Non-reactive Polymer Facilitated by Residual Solvent Molecules
Thermal Conductivity in Layer-engineered Inorganic-Organic Thin Films
Reversible Trans-cis Photoisomerization of ALD/MLD-fabricated Azobenzene-based Inorganic-Organic Thin Films
Organic/Inorganic Nanocomposite Synthesis through Sequential Infiltration of 3D Printed Polymer Parts: A Microstructural Study
Reactivity of Common ALD Precursors with OH/H2O-containing Metal Organic Framework Materials
Atomic/Molecular Layer Deposition of Inorganic-Organic Carboxylate Network Thin Films for Possible Sensing Applications
Atomic Layer Etching and Chemical Vapor Etching of 2D Materials and Metal Oxide Films using MoF6-H2O
Membranes by Atomic Layer Deposition: Design and Applications
Field-effect Transistor using Two-dimensional Electron Gas in ALD Al2O3/TiO2 Ultrathin (<10 nm) Film Heterostructure Interface
Increased WS2 Crystal Grain Size by Controlling the Nucleation Behavior during Plasma Enhanced Atomic Layer Deposition
Controlling Material Properties of Nanostructured WS2 during Plasma ALD for Improved Electrochemical Performance
Sessions | Time Periods | Topics | Schedule Overview