AVS1997 Tuesday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Tuesday, October 21, 1997
8:20 AM 9:20 AM 10:20 AM 11:20 AM
AS-TuM
The Dependence of the Depth Resolution on the Structure of the Specimen.
Determination and Application of the Depth Resolution Function in Sputter Profiling with SIMS and AES
SIMS Depth Profiling of Ultra-Shallow Boron Implants in Silicon: Use of Low Energy Oxygen Primary Ion Bombardment and Oxygen Flooding of the Sample Surface
Ultra Shallow Depth Profiling by TOF-SIMS
SIMS Measurements of Ultra-Shallow Junctions Comparing Normal and Oblique Angle Primary Ion Beam Bombardment
Progress and Challenges in Depth Profiling with Angle Resolved XPS
X-ray Photoelectron Spectroscopy, Depth Profiling, and Elemental Imaging of the Effects of Humidity and Temperature on the Stability of a Metal/Polyimide Interface.
Tungsten Silicide Composition Analysis by RBS, AES, and XPS
The Use of the Navy Oxygen Cleaner for Bearing Steels
An Electron Spectroscopic Study of the Effects of Annealing on the Pd/SiC Schottky Structure
BI-TuM
Direct Measurements of Microenvironmental Influences on Biomolecular Recognition at Interfaces
Orientation of "G-wires" on Mica
Atomic Force Microscope Measurements of Enzyme Interactions with Various Cotton Fibers
Water Interfaces and Tunnel Channels in STM Studies
Solid State NMR Methods for Determination of Peptide Structure on Crystalline Surfaces
Biological Material Analysis by Matrix-Enhanced SIMS
Two Laser Mass Spectrometry for the Surface Analysis of Biological Materials
TOF-SIMS Analysis of Streptococcus Salivarius
Diffusion at the Adhesive/Dentin Interface
EM+
The Structure of Hydrogen-Passivated High-Index Silicon Surfaces
Deuterium Diffusion in Annealed NMOS Devices: A SIMS Study
SIMS Characterization of the Deuterium Sintering Process for the Enhanced Life-time CMOS Transistors
Hydrogen in Silicon: Fundamental Properties and Consequences for Devices
Hydrogen Desorption from the H-terminated Si(001)-3x1 Surface
Cryogenic UHV-STM Study of Electron Stimulated Desorption of Hydrogen and Deuterium from Silicon(100)
Infrared Spectroscopy of Hydrogen in Silicon: Defects, Platelets and Exfoliation
The Effect of Phosphorus on Hydrogen Desorption from Silicon
Effects of Surface Phosphorus on the Kinetics of Hydrogen Desorption from Silane-adsorbed Si(100) Surface at Room Temperatures
Hydride Reactions on Boron-doped Si(100)
FP-TuM
Diamond Cold Cathodes*
Field Emission of Heavily Nitrogen Doped Diamond Films
Electron Transport and Emission Properties of Diamond
Demonstration of Low Work Function, Stable Li-Based Alloy Coatings for Field Emitter Displays
Carbon Based Thin Film Cathodes for Field Emission Displays
Electron Emission Properties of Nanocrystalline Diamond- Coated Si Field Emitter Arrays*
Dynamics of Current-voltage Characteristics In Field Emission Cathodes Built from Various Types of Carbon Fibers
Field Emission from ZrC Films on Mo Field Emitters
Low-Voltage Platinum Lateral-Edge Field Emitter Lamp
MI+
Pseudo Spin Valve MRAM
Giant Magnetoresistance of NiMnSb-Based Multilayers
Tunneling Magnetoresistance through RF-Sputtered Alumina Barriers in Fe-Al2O3-Fe Junctions.
Ferromagnet-Insulator-Ferromagnet Tunnel Junctions Using the Heusler Alloy PtMnSb
Spin Conserved Tunneling and Large Magnetoresistance
Controlled Resistivity of Spin Dependent Tunnel Junctions with Al2O3 Barriers
Control of Switching in Magnetic Tunnel Junctions
Hybrid Ferromagnet - Semiconductor Devices
MS+
Quantitative Measurement of Nodule Formation in W-Ti Sputtering
Spectroscopic Ellipsometry Investigation of Nickel Silicide Formation by Rapid Thermal Process
Particle and Defect Detection and Characterization
Ultra-Shallow Junction Measurements: A Review of SIMS Capabilities for Implanted and Processed Wafers
In Situ Analysis of Airborne Molecular Contamination Using TOF-SIMS with a Liquid Nitrogen-Cooled Sample Stage: Advantages for Semiconductor Processing
The Application of X-ray Photoelectron Spectroscopy for the Routine Monitoring of Surface Composition.
Effect of Post-Al Etch Treatment on Corrosion Control : Determination of Residual Chlorine by Small Area Ion Chromatography
In Situ Particle Monitoring for Vacuum Processes; Today and Tomorrow
NS+
Viscoelastic Effects in Nanoscale Contacts Under Shear
Shear Modulation Spectroscopy in Nanometer Scale Contacts
Adhesion and Mechanical Properties at the Nanometer Level.
Nanomechanical Properties of Au (100), (110), and (111)
Calculations of Plastic Deformation and Recovery during Surface Indentation
Nanoindentation of Atomically Modified Surfaces
Adhesion at an Atomically Defined Junction.
Investigation of Ice-Solid Interfaces by Force Microscopy
Modification of Molecularly Thin Films of Water on Mica Surface by Nanometer Scale Contacts ---- A Scanning Polarization Force Microscopy Study
Correlation of Film Stress and the Nano-Mechanical Properties of Au Thin Films
PS1-TuM
Magnetically Neutral Loop Discharged Plasma Sources and Systems
Diagnostic and Simulation Study on the Relation between Electron Energy Distribution and Etching Characteristics of Ultrahigh-Frequency Plasmas
ECR Plasma Source for 12-inch Wafer Etching Using Slant Slot Antenna
Large Area High Density Plasma Excitation Using Standing Surface Waves
Investigations of 3D Asymmetries in rf Biased Inductively Coupled Plasma Tools Using a New Ambipolar Acceleration Technique1
Simulations of Particle Trapping Produced by 3-Dimensional Structures in Plasma Tools1
Control of Capacitive Currents in Inductively Coupled Plasma Sources for Uniformity Optimization
Coupling Between a Planar Geometry ICP Coil and an rf Bias Platten
Characterization of a Novel Lambda Balanced Inductive Plasma Source
Two Dimensional Modeling of Two-Frequency-Operated-Plasma in Ar by Relaxation Continuum Model
PS2-TuM
Characterization of Dry Cleans in a Polysilicon Etch Reactor
The Study of Plasma Clean Process On TCPTM 9400SE Through Optical Emission Spectrometer
Fundamental Studies Applied to Environmental Challenges in Plasma Processing
Characterization of In-Situ O2 Clean for High Density Plasma Silicon Dioxide Etching
Evaluation of Trifluoroacetic Anhydride as an Alternative PECVD Chamber Clean Chemistry Using Optical Emission Spectroscopy, Quadrupole Mass Spectroscopy, and Fourier Transform Infrared Spectroscopy
Optimizing Destruction Efficiencies in Electronegative Discharges: The Importance of the Impedance Phase Angle.
Ultra-High Selectivity Silicon Nitride Etch Process Using an Inductively Coupled Plasma (ICP) Source
Initial Results of a Quartz Crystal Microbalance Study for Characterizing Atomic Oxygen in Plasma Tools.
Fast Isotropic Etching of Phototresist and Silicon using an Expanding Thermal Plasma
Ion Density Distribution in an Expanding Thermal Nitrogen Plasma for Plasma/Surface Interaction Studies
SS-TuM
Molecular Dissociation at Surfaces: Is there Life beyond the Reaction Coordinate?
Vibrational Relaxation of H2 Scattered from Pd(111)
Steric Preferences in Surface Chemistry: Energy and Internal State Dependence of Alignment in D2(v,J) Associative Desorption From Cu(111)
H Atom Abstraction of D Adsorbed on Si(100): Dynamical Evidence for an Eley-Rideal Mechanism
Trajectory of H and D Desorption from a Passivated Si(100) Surface Induced by Electronic Excitation
Dissociative Sticking of O2 on Al(111)
Double-Precursor Mechanism in the Adsorption of Oxygen on Pd(111)
Direct Collisionally Activated and Trapping-Mediated Chemisorption of Neopentane on Clean Pt(111): The Activity of Surface Defect Sites
State Resolved Dynamics of Methyl Desorption from GaAs
SS1-TuM
Effects of Vacancies and On-Top Adatoms on Mobilities of Two-Dimensional Pt Clusters on Pt(111)
Cluster-Step and Cluster-Cluster Coalescence: Post-Deposition Dynamics in Ag/Ag(100) Adlayers
A New Understanding of Island Decay on Metal Surfaces
Island Diffusion and Coarsening on Metal (100) Surfaces
The Diffusion of Large, Adsorbed Molecules on Metal Surfaces
Mechanisms for Vacancy Formation in the Rh/Ag(001) System*
Kinetics of Ultrathin Film Growth and Island Thickening of Au on TiO2(110)
Growth and Epitaxial Studies of Nanometer Au islands on TiO2 (110)
Intermixing and Growth Anisotropy for Ni/Au(111)
Effects of Low Energy N2+ Irradiation on Surface Morphological Evolution during TiN(001) Epitaxy by Reactive Magnetron Sputtering
TF-TuM
Production of Low Defect Density Ultrathin Multilayer Coatings for ULSI Applications Using an RF Inductively Coupled Ion Beam Deposition System
How the PVD / CVD Metal Equipment Supplier Industry will meet the sub 0.25 µm Challenge
Re-Emission of Sputtered Refractory Metals during Deposition
Al Diffusion into Atomically Clean and Oxidized TiN(100)
A Novel Approach in the Activation of TiN for Highly Selective Electroless Copper Deposition Studied by Ex Situ Non-Contact AFM and XRD
The Effect of Process and Hardware on Ta Phase Formation of Ta Thin Film Deposited by Sputtering
Temperature, Pressure, and Substrate Dependence of the Beta to Alpha Phase Transition of Sputtered Tantalum
XPS Characterization of the Oxidation of Electroplated and Sputtered Copper Surfaces
Thermal Stability of NiSi in Deep Submicron Polysilicon Lines
TF+
Film Growth of Nanostructured C-N/TiNx Mulilayers Reactively Sputtered in Pure Nitrogen.
Electrical and Optical Properties of Magnetron Sputtered Boride and Silicide Coatings
Diffusion Bonding of Steel to Titanium to produce Hard Wearing Surface Layers.
Frictional and Related Surface Chemical Properties of Carbide and Nitride Hard Coating Materials
Recent Developments in the Design, Deposition, and Processing of Hard Coatings
Structure, Mechanical and Tribological Properties of Sputtered and Electron-Beam Evaporated TiAlBN PVD hard Coatings
Plasma Assisted Growth and Wear Behavior of Aluminum Oxynitride Thin Films.
Effect of Temperature on Ti and TiN Films Deposited on BN Substrate
An XPS Study of N2 Plasma Pretreatments on the Interface between Aluminum Alloy 7075-T6 and Films formed by Trimethylsilane Plasma Deposition.
Sessions | Time Periods | Topics | Schedule Overview