AVS1997 Tuesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Tuesday, October 21, 1997 | ||||||||||
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8:20 AM | 9:20 AM | 10:20 AM | 11:20 AM | ||||||||
AS-TuM |
The Dependence of the Depth Resolution on the Structure of the Specimen.
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Determination and Application of the Depth Resolution Function in Sputter Profiling with SIMS and AES
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SIMS Depth Profiling of Ultra-Shallow Boron Implants in Silicon: Use of Low Energy Oxygen Primary Ion Bombardment and Oxygen Flooding of the Sample Surface
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Ultra Shallow Depth Profiling by TOF-SIMS
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SIMS Measurements of Ultra-Shallow Junctions Comparing Normal and Oblique Angle Primary Ion Beam Bombardment
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Progress and Challenges in Depth Profiling with Angle Resolved XPS
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X-ray Photoelectron Spectroscopy, Depth Profiling, and Elemental Imaging of the Effects of Humidity and Temperature on the Stability of a Metal/Polyimide Interface.
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Tungsten Silicide Composition Analysis by RBS, AES, and XPS
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The Use of the Navy Oxygen Cleaner for Bearing Steels
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An Electron Spectroscopic Study of the Effects of Annealing on the Pd/SiC Schottky Structure
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BI-TuM |
Direct Measurements of Microenvironmental Influences on Biomolecular Recognition at Interfaces
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Orientation of "G-wires" on Mica
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Atomic Force Microscope Measurements of Enzyme Interactions with Various Cotton Fibers
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Water Interfaces and Tunnel Channels in STM Studies
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Solid State NMR Methods for Determination of Peptide Structure on Crystalline Surfaces
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Biological Material Analysis by Matrix-Enhanced SIMS
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Two Laser Mass Spectrometry for the Surface Analysis of Biological Materials
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TOF-SIMS Analysis of Streptococcus Salivarius
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Diffusion at the Adhesive/Dentin Interface
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EM+ |
The Structure of Hydrogen-Passivated High-Index Silicon Surfaces
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Deuterium Diffusion in Annealed NMOS Devices: A SIMS Study
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SIMS Characterization of the Deuterium Sintering Process for the Enhanced Life-time CMOS Transistors
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Hydrogen in Silicon: Fundamental Properties and Consequences for Devices
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Hydrogen Desorption from the H-terminated Si(001)-3x1 Surface
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Cryogenic UHV-STM Study of Electron Stimulated Desorption of Hydrogen and Deuterium from Silicon(100)
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Infrared Spectroscopy of Hydrogen in Silicon: Defects, Platelets and Exfoliation
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The Effect of Phosphorus on Hydrogen Desorption from Silicon
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Effects of Surface Phosphorus on the Kinetics of Hydrogen Desorption from Silane-adsorbed Si(100) Surface at Room Temperatures
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Hydride Reactions on Boron-doped Si(100)
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FP-TuM |
Diamond Cold Cathodes*
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Field Emission of Heavily Nitrogen Doped Diamond Films
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Electron Transport and Emission Properties of Diamond
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Demonstration of Low Work Function, Stable Li-Based Alloy Coatings for Field Emitter Displays
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Carbon Based Thin Film Cathodes for Field Emission Displays
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Electron Emission Properties of Nanocrystalline Diamond- Coated Si Field Emitter Arrays*
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Dynamics of Current-voltage Characteristics In Field Emission Cathodes Built from Various Types of Carbon Fibers
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Field Emission from ZrC Films on Mo Field Emitters
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Low-Voltage Platinum Lateral-Edge Field Emitter Lamp
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MI+ |
Pseudo Spin Valve MRAM
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Giant Magnetoresistance of NiMnSb-Based Multilayers
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Tunneling Magnetoresistance through RF-Sputtered Alumina Barriers in Fe-Al2O3-Fe Junctions.
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Ferromagnet-Insulator-Ferromagnet Tunnel Junctions Using the Heusler Alloy PtMnSb
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Spin Conserved Tunneling and Large Magnetoresistance
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Controlled Resistivity of Spin Dependent Tunnel Junctions with Al2O3 Barriers
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Control of Switching in Magnetic Tunnel Junctions
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Hybrid Ferromagnet - Semiconductor Devices
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MS+ |
Quantitative Measurement of Nodule Formation in W-Ti Sputtering
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Spectroscopic Ellipsometry Investigation of Nickel Silicide Formation by Rapid Thermal Process
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Particle and Defect Detection and Characterization
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Ultra-Shallow Junction Measurements: A Review of SIMS Capabilities for Implanted and Processed Wafers
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In Situ Analysis of Airborne Molecular Contamination Using TOF-SIMS with a Liquid Nitrogen-Cooled Sample Stage: Advantages for Semiconductor Processing
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The Application of X-ray Photoelectron Spectroscopy for the Routine Monitoring of Surface Composition.
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Effect of Post-Al Etch Treatment on Corrosion Control : Determination of Residual Chlorine by Small Area Ion Chromatography
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In Situ Particle Monitoring for Vacuum Processes; Today and Tomorrow
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NS+ |
Viscoelastic Effects in Nanoscale Contacts Under Shear
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Shear Modulation Spectroscopy in Nanometer Scale Contacts
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Adhesion and Mechanical Properties at the Nanometer Level.
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Nanomechanical Properties of Au (100), (110), and (111)
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Calculations of Plastic Deformation and Recovery during Surface Indentation
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Nanoindentation of Atomically Modified Surfaces
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Adhesion at an Atomically Defined Junction.
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Investigation of Ice-Solid Interfaces by Force Microscopy
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Modification of Molecularly Thin Films of Water on Mica Surface by Nanometer Scale Contacts ---- A Scanning Polarization Force Microscopy Study
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Correlation of Film Stress and the Nano-Mechanical Properties of Au Thin Films
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PS1-TuM |
Magnetically Neutral Loop Discharged Plasma Sources and Systems
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Diagnostic and Simulation Study on the Relation between Electron Energy Distribution and Etching Characteristics of Ultrahigh-Frequency Plasmas
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ECR Plasma Source for 12-inch Wafer Etching Using Slant Slot Antenna
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Large Area High Density Plasma Excitation Using Standing Surface Waves
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Investigations of 3D Asymmetries in rf Biased Inductively Coupled Plasma Tools Using a New Ambipolar Acceleration Technique1
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Simulations of Particle Trapping Produced by 3-Dimensional Structures in Plasma Tools1
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Control of Capacitive Currents in Inductively Coupled Plasma Sources for Uniformity Optimization
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Coupling Between a Planar Geometry ICP Coil and an rf Bias Platten
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Characterization of a Novel Lambda Balanced Inductive Plasma Source
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Two Dimensional Modeling of Two-Frequency-Operated-Plasma in Ar by Relaxation Continuum Model
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PS2-TuM |
Characterization of Dry Cleans in a Polysilicon Etch Reactor
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The Study of Plasma Clean Process On TCPTM 9400SE Through Optical Emission Spectrometer
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Fundamental Studies Applied to Environmental Challenges in Plasma Processing
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Characterization of In-Situ O2 Clean for High Density Plasma Silicon Dioxide Etching
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Evaluation of Trifluoroacetic Anhydride as an Alternative PECVD Chamber Clean Chemistry Using Optical Emission Spectroscopy, Quadrupole Mass Spectroscopy, and Fourier Transform Infrared Spectroscopy
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Optimizing Destruction Efficiencies in Electronegative Discharges: The Importance of the Impedance Phase Angle.
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Ultra-High Selectivity Silicon Nitride Etch Process Using an Inductively Coupled Plasma (ICP) Source
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Initial Results of a Quartz Crystal Microbalance Study for Characterizing Atomic Oxygen in Plasma Tools.
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Fast Isotropic Etching of Phototresist and Silicon using an Expanding Thermal Plasma
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Ion Density Distribution in an Expanding Thermal Nitrogen Plasma for Plasma/Surface Interaction Studies
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SS-TuM |
Molecular Dissociation at Surfaces: Is there Life beyond the Reaction Coordinate?
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Vibrational Relaxation of H2 Scattered from Pd(111)
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Steric Preferences in Surface Chemistry: Energy and Internal State Dependence of Alignment in D2(v,J) Associative Desorption From Cu(111)
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H Atom Abstraction of D Adsorbed on Si(100): Dynamical Evidence for an Eley-Rideal Mechanism
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Trajectory of H and D Desorption from a Passivated Si(100) Surface Induced by Electronic Excitation
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Dissociative Sticking of O2 on Al(111)
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Double-Precursor Mechanism in the Adsorption of Oxygen on Pd(111)
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Direct Collisionally Activated and Trapping-Mediated Chemisorption of Neopentane on Clean Pt(111): The Activity of Surface Defect Sites
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State Resolved Dynamics of Methyl Desorption from GaAs
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SS1-TuM |
Effects of Vacancies and On-Top Adatoms on Mobilities of Two-Dimensional Pt Clusters on Pt(111)
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Cluster-Step and Cluster-Cluster Coalescence: Post-Deposition Dynamics in Ag/Ag(100) Adlayers
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A New Understanding of Island Decay on Metal Surfaces
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Island Diffusion and Coarsening on Metal (100) Surfaces
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The Diffusion of Large, Adsorbed Molecules on Metal Surfaces
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Mechanisms for Vacancy Formation in the Rh/Ag(001) System*
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Kinetics of Ultrathin Film Growth and Island Thickening of Au on TiO2(110)
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Growth and Epitaxial Studies of Nanometer Au islands on TiO2 (110)
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Intermixing and Growth Anisotropy for Ni/Au(111)
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Effects of Low Energy N2+ Irradiation on Surface Morphological Evolution during TiN(001) Epitaxy by Reactive Magnetron Sputtering
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TF-TuM |
Production of Low Defect Density Ultrathin Multilayer Coatings for ULSI Applications Using an RF Inductively Coupled Ion Beam Deposition System
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How the PVD / CVD Metal Equipment Supplier Industry will meet the sub 0.25 µm Challenge
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Re-Emission of Sputtered Refractory Metals during Deposition
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Al Diffusion into Atomically Clean and Oxidized TiN(100)
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A Novel Approach in the Activation of TiN for Highly Selective Electroless Copper Deposition Studied by Ex Situ Non-Contact AFM and XRD
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The Effect of Process and Hardware on Ta Phase Formation of Ta Thin Film Deposited by Sputtering
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Temperature, Pressure, and Substrate Dependence of the Beta to Alpha Phase Transition of Sputtered Tantalum
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XPS Characterization of the Oxidation of Electroplated and Sputtered Copper Surfaces
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Thermal Stability of NiSi in Deep Submicron Polysilicon Lines
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TF+ |
Film Growth of Nanostructured C-N/TiNx Mulilayers Reactively Sputtered in Pure Nitrogen.
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Electrical and Optical Properties of Magnetron Sputtered Boride and Silicide Coatings
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Diffusion Bonding of Steel to Titanium to produce Hard Wearing Surface Layers.
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Frictional and Related Surface Chemical Properties of Carbide and Nitride Hard Coating Materials
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Recent Developments in the Design, Deposition, and Processing of Hard Coatings
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Structure, Mechanical and Tribological Properties of Sputtered and Electron-Beam Evaporated TiAlBN PVD hard Coatings
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Plasma Assisted Growth and Wear Behavior of Aluminum Oxynitride Thin Films.
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Effect of Temperature on Ti and TiN Films Deposited on BN Substrate
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An XPS Study of N2 Plasma Pretreatments on the Interface between Aluminum Alloy 7075-T6 and Films formed by Trimethylsilane Plasma Deposition.
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