AVS1997 Thursday Afternoon

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Session Thursday, October 23, 1997
2:00 PM 3:00 PM 4:00 PM
AS+
The Effect of Pressure Sensitive Adhesive Outgassing on Head/Disk Interface Tribology
Hard Disk Drive Analysis Using Time Of Flight Secondary Ion Mass Spectrometry (TOF-SIMS).
Analytical Methods for Determining Root Cause in Media Failure.
Calibration Standards for Substrate Defect Inspection Systems: The Development of the Indentation Technique
Nanoscale Indentation/Scratching of Ultrathin Protective Overcoats on Hard Magnetic Disks
Corrosion and Tribology Study of Carbon Overcoat on Magnetic Thin Film Disk
Chemistry / Orientation of Lubricants on Hard Disk Magnetic Media Substrates Using Near Edge X-ray Absorption Fine Structure
Scanning Auger Microscopy Characterization of Magnetic Hard Disc
EM1-ThA
c(4x4) Reconstruction on Si(001) as a Warning of Carbon Contamination
Correlating Surface SIMS and TXRF Measurements of Surface Metal Contamination on Silicon Wafers
Characterization of Fluorocarbon Polymers Generated by CHF3, CF4, CO, and C4F8 Chemistries during High Density Plasma SiO2 Etching
Post-Poly Etch Residue Removal in a Microwave Plasma Environment for a 0.18 micron CMOS Technology
Gas/Solid Etching of Silicon Dioxide Using HF/vapor Mixtures
In-Situ Formation and Patterning of Ultrathin SiO2 Mask Layers for Nanoscale Selective-Area Deposition of Si
GaAs(110) Terrace Patterning by Halogenation and Laser Irradiation
BEEM Study on Metal Schottky Contacts of 6H- and 4H-SiC
EM2-ThA
Deposition of Ultra Thin CVD Ta2O5 Films on Si(100) Using Ta(N(CH3)2)5 and O2 for Gate Dielectric Applications
Structure and Growth of Cerium Oxide Films by Molecular Beam Epitaxy
A Simple Efficient N Atom Source for Nitride MOCVD based on a Dielectric Barrier Discharge
Atomic Layer Growth Process Characterization of Dimethylethylamine Alane and Ammonia on Si(100) for AlN Thin Film Deposition
Analysis of AlN Thin Films Grown on Si(100) by Pulsed Supersonic Jet Molecular Beams
Direct Measurement of Ultrathin SiO2 Thickness by AFM with Self-Assembled-Monolayer Islands as a Self-Patterned-Mask
Studies on Ultrathin Silicon Oxides Grown by Low Temperature and Low Pressure Wet Oxidation.
Transition Metal Nitride Formed at 40K by Simultaneous Physisorption and Thermal-Evaporation ; TiN/Si(100)
Scanning Tunneling Microscopy and Ballistic Electron Emission Microscopy Studies of Epitaxial Pt/CaF2/Si(111)
MM-ThA
Dry Processing of Polycarbonate
Deep Silicon RIE with Profile Control
The Design, Fabrication and Characterization of a Thermal Microprobe
Microfabrication of 3D-microcoil for Miniature NMR Spectrometer
MS+
An Oxygen Plasma Flash Process for the Control of Corrosive Gas Migration in a Semiconductor Wafer Plasma Etch System
Mechanism of Polymer Formation in Poly-Si Etching
Gas Purity Requirements for Semiconductor Processing: Tungsten CVD and Aluminum Etch
Study of E-H Mode Transition in a Large Planar Geometry ICP Reactor
Effects of Lateral Confinement and Ti Underlayer Thickness on C49 and C54 TiSi2 Phase Formation in TiN/Ti Bilayers on Flat and Patterned Si(001)
MS+
The Business Case for In Situ Sensors and Metrology
Developments in Equipment Support Technology
Real-Time Process Sensing and Metrology of Amorphous Silicon and Silicon Nitride PECVD Processes Using In-Situ Mass Spectrometry
Matching Network Efficiency Measurements for Wafer Biasing Applications
A Diode Laser-Based Sensor for In Situ Measurement of Moisture Contamination in Semiconductor Process Tools
Particle Measurement in Vacuum Tools by In Situ Particle Monitor
Diode-Laser-Based Atomic Absorption Monitors for Atomic Flux Measurement in Electron Beam Evaporation
A High Resolution Quartz Microbalance for Studying Sub-Monolayer Deposits and Determining Surface Oxide Stoichiometry.
PS-ThA
Beam Scattering Studies of Plasma-Surface Interactions in Chlorine Etching of Photoresist, Polysilicon and Silicon Dioxide
Ion Bombardment Energies in Continuous and Pulsed High Frequency Plasma for Materials Processing.
Positive Ion Species in Inductively Coupled rf Discharges Containing Mixtures of Cl2, BCl3, Ar, and N2
Surface Reactivity, and Velocity Distributions of NH2 Radicals in an NH3 Plasma Molecular Beam and Scattered from a Surface.
Measurements and Modeling of Low-Energy Sputtering as a Function of Target Temperature and Grain Size
Molecular Dynamics Simulations of Low Energy (25-200 eV) Ion-Surface Interactions
Surface Chemistry of NF3 Plasma and Ion Beam Interactions with Silicon
Interactions of Molecular Fragments from Silane/Hydrogen Plasma with Si Surfaces: An Atomic Scale Computational Study
Molecular Dynamics Simulations of Physisorbed Halogen Atoms on Halogenated Silicon Surfaces
SS1-ThA
Electronic Structure vs. Coverage of Alkali Atoms on W(110)
Surface Photoelectric Effect in Thin Layers of Alkali Metals
Predicting Scanning Tunneling Microscopy Images of Molecules Adsorbed on Metal Surfaces
Chemisorption on Metal Surfaces via a New Embedding Theory
An X-ray Absorption Study of Benzene Bonded to Clean and Chemically Modified Metal Surfaces and Metal Clusters
The Electronic Structures of Ir(100): A Photoemission Study.
SS2-ThA
Atomic View of Corrosion of Strained Metal Films
Oxidation and Reduction of Pt-Sn Surface Alloys
Oxidation-Reduction Kinetics of Palladium Catalysts
Enhanced Reactivity of Co Deposited on Cu(111)
Surface Reactivity Studies of an AlPdMn Alloy
Hydrodesulfurization Reactions on Carbon Modified Mo(110) Surfaces
Reconstruction and C-1 Chemistry of Oxygen-Modified Mo(100)
Bonding Nature between Oxygen and Sodium on Si(113) Surface
Study of the Reactions of Li with Tetrahydrofuran and Propylene Carbonate by Photoemission Spectroscopy
Temperature-Dependent Near-Surface Chemistry of BaLi4 Gettering Alloy Studied by Means of X-ray Photoemission Spectroscopy
SS3-ThA
Thermal Dependence of fcc(001) Surface Structure: Failure of the Quasiharmonic Model
Nature of Adatom Bonds to Transition-Metal Surfaces: O/Pt
A Low Temperature Scanning Tunneling Microscopy Study of Benzene and Carbon Monoxide Coadsorbed on Pd(111)
Cr-induced Self-organization of Nanostructures on a Pt(111) Surface
Nonstoichiometry on TiO2(110) and Cu- TiO2 Interfaces
Ab Initio Calculation of the Stoichiometry and Structure of the (0001) Surfaces of GaN and AlN
The Structure of Sb-Terminated GaAs(001) Surfaces.
Dynamics of Phasons Formed on Si(100) Surface Dimer Rows Studied by Scanning Tunneling Microscopy
New Structural Model for the Si(111)4x1-In Reconstruction
TF1-ThA
An XPS Analysis of Several Co3-y Fey O4 Films and Their Optical Properties.
A High Resolution XPS Investigation into the Oxidation Resistance of Ti1-xAlxN Based Layers
An Investigation of the Optical Properties and Composition of Three Binary Metal Oxide Films: Co3-y Fey O4, Co3-x Cr x O4, and Crx FeyO4.
Infrared and Ellipsometric Analysis of Ion Implanted SiO2
Negative Ion Assisted Silicon Oxidation at Low Temperature
Infrared Spectroscopy and UV-Visible Ellipsometry Analysis of SiO2 Films Deposited from O2/TEOS Plasmas
Structure of the Interfacial Region between Polycarbonate and Plasma-Deposited SiN1.3 and SiO2 Optical Coatings.
Heterogeneity in Hydrogenated Silicon: Evidence for a Linear Chain-like Structure
Texture Formation and Surface Roughening of Ni Thin Films Deposited by Magnetron Sputtering onto SiO2/Si, MgO and SiC Surfaces
Determining Thickness of Thin Metal Films with Spectroscopic Ellipsometry for Applications in Magnetic Random-Access Memory (MRAM)
TF2-ThA
A Phase-Space Compressed, Guided Ion Beam Instrument for Mass-Selected Ion Beam Deposition
Plume Development and Evolution during Low Fluence UV Laser Ablation of Transparent Materials
Synergetic Effects in Ion Beam Energy and Substrate Temperature During Energetic Film Deposition
Seeded Pulsed Supersonic Molecular Beam Growth of Silicon Carbide Thin Films
Formation of Carbon Nitride Thin Films by Charge Balanced Dual Ion Beam Deposition
Cubic Boron Nitride Thin Film Deposition by Unbalanced Magnetron Sputtering and dc Pulse Substrate Biasing
Growth of GaN and AlN on 6H-SiC(0001) using Supersonic He Beams Seeded with NH3
Sessions | Time Periods | Topics | Schedule Overview