AVS1997 Thursday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
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Click a Session in the first column to view session papers.
Session | Thursday, October 23, 1997 | ||||||||||
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2:00 PM | 3:00 PM | 4:00 PM | 5:00 PM | ||||||||
AS+ |
The Effect of Pressure Sensitive Adhesive Outgassing on Head/Disk Interface Tribology
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Hard Disk Drive Analysis Using Time Of Flight Secondary Ion Mass Spectrometry (TOF-SIMS).
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Analytical Methods for Determining Root Cause in Media Failure.
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Calibration Standards for Substrate Defect Inspection Systems: The Development of the Indentation Technique
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Nanoscale Indentation/Scratching of Ultrathin Protective Overcoats on Hard Magnetic Disks
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Corrosion and Tribology Study of Carbon Overcoat on Magnetic Thin Film Disk
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Chemistry / Orientation of Lubricants on Hard Disk Magnetic Media Substrates Using Near Edge X-ray Absorption Fine Structure
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Scanning Auger Microscopy Characterization of Magnetic Hard Disc
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EM1-ThA |
c(4x4) Reconstruction on Si(001) as a Warning of Carbon Contamination
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Correlating Surface SIMS and TXRF Measurements of Surface Metal Contamination on Silicon Wafers
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Characterization of Fluorocarbon Polymers Generated by CHF3, CF4, CO, and C4F8 Chemistries during High Density Plasma SiO2 Etching
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Post-Poly Etch Residue Removal in a Microwave Plasma Environment for a 0.18 micron CMOS Technology
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Gas/Solid Etching of Silicon Dioxide Using HF/vapor Mixtures
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In-Situ Formation and Patterning of Ultrathin SiO2 Mask Layers for Nanoscale Selective-Area Deposition of Si
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GaAs(110) Terrace Patterning by Halogenation and Laser Irradiation
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BEEM Study on Metal Schottky Contacts of 6H- and 4H-SiC
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EM2-ThA |
Deposition of Ultra Thin CVD Ta2O5 Films on Si(100) Using Ta(N(CH3)2)5 and O2 for Gate Dielectric Applications
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Structure and Growth of Cerium Oxide Films by Molecular Beam Epitaxy
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A Simple Efficient N Atom Source for Nitride MOCVD based on a Dielectric Barrier Discharge
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Atomic Layer Growth Process Characterization of Dimethylethylamine Alane and Ammonia on Si(100) for AlN Thin Film Deposition
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Analysis of AlN Thin Films Grown on Si(100) by Pulsed Supersonic Jet Molecular Beams
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Direct Measurement of Ultrathin SiO2 Thickness by AFM with Self-Assembled-Monolayer Islands as a Self-Patterned-Mask
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Studies on Ultrathin Silicon Oxides Grown by Low Temperature and Low Pressure Wet Oxidation.
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Transition Metal Nitride Formed at 40K by Simultaneous Physisorption and Thermal-Evaporation ; TiN/Si(100)
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Scanning Tunneling Microscopy and Ballistic Electron Emission Microscopy Studies of Epitaxial Pt/CaF2/Si(111)
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MM-ThA |
Dry Processing of Polycarbonate
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Deep Silicon RIE with Profile Control
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The Design, Fabrication and Characterization of a Thermal Microprobe
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Microfabrication of 3D-microcoil for Miniature NMR Spectrometer
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MS+ |
An Oxygen Plasma Flash Process for the Control of Corrosive Gas Migration in a Semiconductor Wafer Plasma Etch System
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Mechanism of Polymer Formation in Poly-Si Etching
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Gas Purity Requirements for Semiconductor Processing: Tungsten CVD and Aluminum Etch
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Study of E-H Mode Transition in a Large Planar Geometry ICP Reactor
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Effects of Lateral Confinement and Ti Underlayer Thickness on C49 and C54 TiSi2 Phase Formation in TiN/Ti Bilayers on Flat and Patterned Si(001)
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MS+ |
The Business Case for In Situ Sensors and Metrology
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Developments in Equipment Support Technology
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Real-Time Process Sensing and Metrology of Amorphous Silicon and Silicon Nitride PECVD Processes Using In-Situ Mass Spectrometry
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Matching Network Efficiency Measurements for Wafer Biasing Applications
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A Diode Laser-Based Sensor for In Situ Measurement of Moisture Contamination in Semiconductor Process Tools
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Particle Measurement in Vacuum Tools by In Situ Particle Monitor
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Diode-Laser-Based Atomic Absorption Monitors for Atomic Flux Measurement in Electron Beam Evaporation
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A High Resolution Quartz Microbalance for Studying Sub-Monolayer Deposits and Determining Surface Oxide Stoichiometry.
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PS-ThA |
Beam Scattering Studies of Plasma-Surface Interactions in Chlorine Etching of Photoresist, Polysilicon and Silicon Dioxide
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Ion Bombardment Energies in Continuous and Pulsed High Frequency Plasma for Materials Processing.
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Positive Ion Species in Inductively Coupled rf Discharges Containing Mixtures of Cl2, BCl3, Ar, and N2
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Surface Reactivity, and Velocity Distributions of NH2 Radicals in an NH3 Plasma Molecular Beam and Scattered from a Surface.
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Measurements and Modeling of Low-Energy Sputtering as a Function of Target Temperature and Grain Size
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Molecular Dynamics Simulations of Low Energy (25-200 eV) Ion-Surface Interactions
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Surface Chemistry of NF3 Plasma and Ion Beam Interactions with Silicon
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Interactions of Molecular Fragments from Silane/Hydrogen Plasma with Si Surfaces: An Atomic Scale Computational Study
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Molecular Dynamics Simulations of Physisorbed Halogen Atoms on Halogenated Silicon Surfaces
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SS1-ThA |
Electronic Structure vs. Coverage of Alkali Atoms on W(110)
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Surface Photoelectric Effect in Thin Layers of Alkali Metals
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Predicting Scanning Tunneling Microscopy Images of Molecules Adsorbed on Metal Surfaces
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Chemisorption on Metal Surfaces via a New Embedding Theory
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An X-ray Absorption Study of Benzene Bonded to Clean and Chemically Modified Metal Surfaces and Metal Clusters
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The Electronic Structures of Ir(100): A Photoemission Study.
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SS2-ThA |
Atomic View of Corrosion of Strained Metal Films
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Oxidation and Reduction of Pt-Sn Surface Alloys
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Oxidation-Reduction Kinetics of Palladium Catalysts
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Enhanced Reactivity of Co Deposited on Cu(111)
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Surface Reactivity Studies of an AlPdMn Alloy
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Hydrodesulfurization Reactions on Carbon Modified Mo(110) Surfaces
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Reconstruction and C-1 Chemistry of Oxygen-Modified Mo(100)
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Bonding Nature between Oxygen and Sodium on Si(113) Surface
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Study of the Reactions of Li with Tetrahydrofuran and Propylene Carbonate by Photoemission Spectroscopy
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Temperature-Dependent Near-Surface Chemistry of BaLi4 Gettering Alloy Studied by Means of X-ray Photoemission Spectroscopy
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SS3-ThA |
Thermal Dependence of fcc(001) Surface Structure: Failure of the Quasiharmonic Model
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Nature of Adatom Bonds to Transition-Metal Surfaces: O/Pt
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A Low Temperature Scanning Tunneling Microscopy Study of Benzene and Carbon Monoxide Coadsorbed on Pd(111)
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Cr-induced Self-organization of Nanostructures on a Pt(111) Surface
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Nonstoichiometry on TiO2(110) and Cu- TiO2 Interfaces
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Ab Initio Calculation of the Stoichiometry and Structure of the (0001) Surfaces of GaN and AlN
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The Structure of Sb-Terminated GaAs(001) Surfaces.
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Dynamics of Phasons Formed on Si(100) Surface Dimer Rows Studied by Scanning Tunneling Microscopy
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New Structural Model for the Si(111)4x1-In Reconstruction
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TF1-ThA |
An XPS Analysis of Several Co3-y Fey O4 Films and Their Optical Properties.
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A High Resolution XPS Investigation into the Oxidation Resistance of Ti1-xAlxN Based Layers
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An Investigation of the Optical Properties and Composition of Three Binary Metal Oxide Films: Co3-y Fey O4, Co3-x Cr x O4, and Crx FeyO4.
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Infrared and Ellipsometric Analysis of Ion Implanted SiO2
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Negative Ion Assisted Silicon Oxidation at Low Temperature
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Infrared Spectroscopy and UV-Visible Ellipsometry Analysis of SiO2 Films Deposited from O2/TEOS Plasmas
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Structure of the Interfacial Region between Polycarbonate and Plasma-Deposited SiN1.3 and SiO2 Optical Coatings.
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Heterogeneity in Hydrogenated Silicon: Evidence for a Linear Chain-like Structure
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Texture Formation and Surface Roughening of Ni Thin Films Deposited by Magnetron Sputtering onto SiO2/Si, MgO and SiC Surfaces
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Determining Thickness of Thin Metal Films with Spectroscopic Ellipsometry for Applications in Magnetic Random-Access Memory (MRAM)
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TF2-ThA |
A Phase-Space Compressed, Guided Ion Beam Instrument for Mass-Selected Ion Beam Deposition
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Plume Development and Evolution during Low Fluence UV Laser Ablation of Transparent Materials
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Synergetic Effects in Ion Beam Energy and Substrate Temperature During Energetic Film Deposition
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Seeded Pulsed Supersonic Molecular Beam Growth of Silicon Carbide Thin Films
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Formation of Carbon Nitride Thin Films by Charge Balanced Dual Ion Beam Deposition
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Cubic Boron Nitride Thin Film Deposition by Unbalanced Magnetron Sputtering and dc Pulse Substrate Biasing
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Growth of GaN and AlN on 6H-SiC(0001) using Supersonic He Beams Seeded with NH3
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