AVS1996 Wednesday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Wednesday, October 16, 1996
8:20 AM 9:20 AM 10:20 AM 11:20 AM
EM-WeM
Physical Limits on Nanoelectronics
Interconnections for Devices and Circuits and Packages of the 21st Century Challenges in Materials, Processing, and Characterization
Fabrication in the Sub-100nm Regime
Technology Challenges: A Silicon Device and Integration Perspective
Toward Giga-scale Si Integrated Circuits
TF-WeM
Generalized Ellipsometric Characterization of Cubic and Hexagonal Boron Nitride Thin Films Deposited by Magnetron Sputtering on [100]-Si
A Five Layer Stack of Nitride, Oxide, and Amorphous Silicon on Glass, Analyzed with Spectroscopic Ellipsometry
Comparison of Ellipsometry Measurements of ZrO\sub 2\ Films Deposited on Fused Silica Substrates in a Round-Robin Experiment, Part 2
Thin Film Characterization by Spectroscopic Ellipsometry: Overcoming the Data Analysis Challenge
Analysis of Plasma-Enhanced CVD Diamond Film Growth Processes from CO/H\sub 2\ and CH\sub 4\/H\sub 2\ Mixtures using Real Time Spectroellipsometry
Optical Properties of a Mixed-Metal Oxide Film, Co\sub 3\(Cr,Fe)\sub 3-x\O\sub 4\, Deposited by Spray Pyrolysis
Extended-range FTIR-ATR Si Surface Spectroscopy using a Novel Ge Prism with an Epitaxial Si Overlayer
In Situ Characterization of Thin Films by Differential Reflectance Spectroscopy: Nucleation and Growth of Silver Films on TiO\sub 2\(110) Surfaces
Sessions | Time Periods | Topics | Schedule Overview