AVS1996 Wednesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Wednesday, October 16, 1996 | ||||||||||
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| 8:20 AM | 9:20 AM | 10:20 AM | 11:20 AM | ||||||||
| EM-WeM |
Physical Limits on Nanoelectronics
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Interconnections for Devices and Circuits and Packages of the 21st Century Challenges in Materials, Processing, and Characterization
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Fabrication in the Sub-100nm Regime
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Technology Challenges: A Silicon Device and Integration Perspective
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Toward Giga-scale Si Integrated Circuits
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| TF-WeM |
Generalized Ellipsometric Characterization of Cubic and Hexagonal Boron Nitride Thin Films Deposited by Magnetron Sputtering on [100]-Si
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A Five Layer Stack of Nitride, Oxide, and Amorphous Silicon on Glass, Analyzed with Spectroscopic Ellipsometry
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Comparison of Ellipsometry Measurements of ZrO\sub 2\ Films Deposited on Fused Silica Substrates in a Round-Robin Experiment, Part 2
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Thin Film Characterization by Spectroscopic Ellipsometry: Overcoming the Data Analysis Challenge
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Analysis of Plasma-Enhanced CVD Diamond Film Growth Processes from CO/H\sub 2\ and CH\sub 4\/H\sub 2\ Mixtures using Real Time Spectroellipsometry
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Optical Properties of a Mixed-Metal Oxide Film, Co\sub 3\(Cr,Fe)\sub 3-x\O\sub 4\, Deposited by Spray Pyrolysis
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Extended-range FTIR-ATR Si Surface Spectroscopy using a Novel Ge Prism with an Epitaxial Si Overlayer
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In Situ Characterization of Thin Films by Differential Reflectance Spectroscopy: Nucleation and Growth of Silver Films on TiO\sub 2\(110) Surfaces
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