ALD/ALE 2025 Wednesday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Wednesday, June 25, 2025 | ||||||||||||||
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| 1:30 PM | 2:30 PM | 3:30 PM | 4:30 PM | ||||||||||||
| AA1-WeA |
Atomic Layer Deposition and Molecular Layer Deposition for Li and Na Metal Anodes
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Low Temperature Spatial Atomic Layer Deposition of LiF Films for Li-Ion Batteries
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Advancing Nickel-Rich Layered Oxide Cathodes via Atomic-Scale Synthesis and Surface Engineering
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Unveiling the Unconventional ALD Chemistry of Trimethylaluminum (TMA) on Battery Materials
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Novel Li-Precursor for Interface Engineering in Li-Ion Batteries
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Oxidative Molecular Layer Deposition of Polypyrrole on High Surface Area Powder Substrates for Li-ion Battery Applications
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Break
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| AA2-WeA |
Role of the Precursor’S Stability for ALD Lithium-Containing Films
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Enabling Uniform Lithiation in Solid-State Synthesis by Preventing Pre-Matured Surface Grain Coarsening Through Grain Boundary Engineering
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Closing Remarks and Awards in Tamna Hall A
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| AA3-WeA |
Atomic Layer Deposition for Self-Healing Stone Cultural Heritage Preservation
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Surface Modification of Additive Manufacturing Feedstocks
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Energy Storage Performance of Field-Induced Ferroelectric Al2O3-Inserted Hf0.5Zr0.5O2 Thin Films for Electrostatic Supercapacitors
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Closing Remarks and Awards
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| AA4-WeA |
Room-Temperature Atmospheric Pressure ALD for Pharmaceutical Powder Coating: Tailoring Surface Properties and Controlling Drug Release
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Atomic Layer Deposition for Medical Applications
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Closing Remarks and Awards in Tamna Hall A
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| AF-WeA |
ALD of Nitride Semiconductors
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Low-Temperature Atomic Layer Deposition of (00l)-Oriented Elemental Bismuth
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High-Quality ALD-Ru Process Using Thermally Stable ALD Ru Precursor
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The Development of Ultralow-Dielectric Constant Boron Nitride Film by Novel Plasma Atomic Layer Deposition
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Thermal Atomic Layer Deposition of InN using Hot-wire-activated NH3 and Hydrazine Reactants
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Electron-Enhanced ALD and CVD of Titanium-, Silicon- and Tungsten-Containing Films at Low Temperatures Using Metal Precursors with Various Reactive Background Gases
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Break
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| AM1-WeA |
Spatial Atomic Layer Deposition of Cu-Based Thin Films
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Spatial ALD Deposited Functional Layers for Large-Area Inverted Perovskite Solar Modules
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Atomic Layer Deposition on Highly Cohesive Granular Material in Fluidized Beds
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High Deposition Rate TiO PEALD Process for Semiconductor Industry
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Break
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| AM2-WeA |
Advancing Atomic Layer Processing for Next Generation Devices: Atlant 3d’S Direct Atomic Layer Processing (Dalp™)
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Closing Remarks and Awards in Tamna Hall A
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| AS-WeA |
Area Selective Deposition of SiAlOx Films for Self-Aligned Dielectric-on-Dielectric Application
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Control of Three-Color Area-Selective Deposition of PEDOT Conjugated Polymer on SiN vs SiO2 and Si-H by Adjustment of Pre-Treatment Sequence
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Annealing PEDOT Thin Films to Generate a Selectively Deposited Etching Hard Mask Layer
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Ring-Opening Enhanced Etching of Cyclosiloxanes for Area-Selective MLD of SiOC(H) Thin Films
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Area-Selective Molecular Layer Deposition of Polymer Thin Films for Contact Hole/Trench Shrinking
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Catalytic Oxygen Dissociation for Area-Selective HfO₂ Deposition on Cobalt through Selective PMMA Etching
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Break
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