ALD/ALE 2025 Wednesday Afternoon

Atomic Layer Deposition and Molecular Layer Deposition for Li and Na Metal Anodes

Low Temperature Spatial Atomic Layer Deposition of LiF Films for Li-Ion Batteries

Advancing Nickel-Rich Layered Oxide Cathodes via Atomic-Scale Synthesis and Surface Engineering

Unveiling the Unconventional ALD Chemistry of Trimethylaluminum (TMA) on Battery Materials

Novel Li-Precursor for Interface Engineering in Li-Ion Batteries

Oxidative Molecular Layer Deposition of Polypyrrole on High Surface Area Powder Substrates for Li-ion Battery Applications

Taming Lithium Nucleation and Growth on Cu Current Collector by Electrochemical Activation of ZnF₂ Layer 

Atomic Layer Deposition of Aluminum Phosphorus Oxynitride and Its Application as Passivation Layers on Aluminum Metal Anode

Novel Atomic and Molecular Layer Deposition Processes for Robust Battery Interfaces

Role of the Precursor’S Stability for ALD Lithium-Containing Films

Closing Remarks and Awards in Tamna Hall A

Atomic Layer Deposition for Self-Healing Stone Cultural Heritage Preservation

Surface Modification of Additive Manufacturing Feedstocks

Closing Remarks and Awards

Room-Temperature Atmospheric Pressure ALD for Pharmaceutical Powder Coating: Tailoring Surface Properties and Controlling Drug Release

Atomic Layer Deposition for Medical Applications

Recent Advances in Multifunctional Antibacterial Neural Interfacing Electrodes Manufactured via Atomic Layer Deposition and Hierarchical Surface Restructuring

Closing Remarks and Awards in Tamna Hall A

ALD of Nitride Semiconductors

Towards Two New Atomic Layer Deposition Processes for the Distinct Synthesis of Coo or Co₃O₄ Thin Films

High-Quality ALD-Ru Process Using Thermally Stable ALD Ru Precursor

The Development of Ultralow-Dielectric Constant Boron Nitride Film by Novel Plasma Atomic Layer Deposition

Thermal Atomic Layer Deposition of InN using Hot-wire-activated NH₃ and Hydrazine Reactants

Electron-Enhanced ALD and CVD of Titanium-, Silicon- and Tungsten-Containing Films at Low Temperatures Using Metal Precursors with Various Reactive Background Gases

Low-Temperature Atomic Layer Deposition of (00l)-Oriented Elemental Bismuth

Spatial Atomic Layer Deposition of Cu-Based Thin Films

Visualization of Precursor Transport in Vapor Deposition Systems: Measurements and Simulations

Atomic Layer Deposition on Highly Cohesive Granular Material in Fluidized Beds

From the Research Lab to the Fab: Comparison of Vapor Generation by Bubbler and Direct Liquid Injection Vapor Delivery Systems

Advancing Fast Spatial Atomic Layer Deposition: Optimizing Precursor Control and Atmospheric Effects for Functional Oxide Thin Films

High Deposition Rate TiO PEALD Process for Semiconductor Industry

Spatial ALD Deposited Functional Layers for Large-Area Inverted Perovskite Solar Modules

Spatial Atomic Layer Deposition of Nanolaminate Barrier Coatings Enables Sustainable Packaging

Advancing Atomic Layer Processing for Next Generation Devices: Atlant 3d’S Direct Atomic Layer Processing (Dalp™)

Analysis of Controllable Coil Patterns to Improve Temperature Uniformity of Inducted-Heated Susceptor

Closing Remarks and Awards in Tamna Hall A

Polypeptoid Brushes as Growth-Promoting Monolayers: Advancing Area-Selective Deposition for EUV Lithography

Area Selective Deposition of SiAlO_x Films for Self-Aligned Dielectric-on-Dielectric Application

Control of Three-Color Area-Selective Deposition of PEDOT Conjugated Polymer on SiN vs SiO2 and Si-H by Adjustment of Pre-Treatment Sequence

Annealing PEDOT Thin Films to Generate a Selectively Deposited Etching Hard Mask Layer

Ring-Opening Enhanced Etching of Cyclosiloxanes for Area-Selective MLD of SiOC(H) Thin Films

Area-Selective Molecular Layer Deposition of Polymer Thin Films for Contact Hole/Trench Shrinking

Catalytic Oxygen Dissociation for Area-Selective HfO₂ Deposition on Cobalt through Selective PMMA Etching