ALD/ALE 2025 Monday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Monday, June 23, 2025 | ||||||||||||||||||
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| 1:30 PM | 2:30 PM | 3:30 PM | 4:30 PM | 5:30 PM | |||||||||||||||
| AA-MoA |
Atomic Layer Technology for Ferroelectrics and Resistive Switching Devices: Advances in Epitaxial Growth, Doping, and Defect Control
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Atomic-Scale Processing of Ruthenium Thin Films via ALD and ALE for Advanced Interconnects
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ALD of ferroelectric TiN/Hf0.5Zr0.5O2/TiN stacks; growth and interfacial oxidation studied by in situ spectroscopic ellipsometry
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Stable Synaptic Function and Orientation Selectivity Recognition Under Strain in Bilayer Stretchable Memristors via Atomic Layer Deposition
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P-Type Tellurium Thin Film Transistor with Sacrificial Atomic Layer Deposition
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| AF1-MoA |
Continuous Production of Nanocoated Powders
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Plasma-Enhanced Spatial ALD on 2D and 3D Surface Topologies: The Case of Amorphous and Crystalline TiO2
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Rapid Test for ALD in High Aspect Ratio Spaces Utilizing Thermally Bonded Chips and Hydrazine with Titanium Tetrachloride for TiN Deposition
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Enhancing Step Coverage in High-Temperature Ald for Advanced Semiconductor Scaling
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ALD as the Solution for Uniform Cu Electroplating in High Aspect Ratio Vias
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Multi-Scale Model for Optimization of Low-Temperature Al2O3 ALD Process Conformality Within High Aspect Ratio Trench
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| AF2-MoA |
The Emergence of New Ligands for ALD Precursor Development
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Perspective on Beryllium Compounds as Precursors for ALD Applications
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Anhydrous Hydrogen Iodide Source for ALD of CsI and Other Metal Halides
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Evaluating Trisilylamine and Diiodosilane as Silicon Precursors for PEALD of Silicon Nitride in Front-End-of-Line Applications
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Precursor Design for Thermal ALD of Silver Metal
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A Novel Liquid Cocktail Precursor for Atomic Layer Deposition of Hafnium-Zirconium-Oxide Films for Ferroelectric Devices
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| ALDALE-MoA |
ALD Student Award Finalist Talk: Integrating Machine Learning into Atomic Layer Deposition: A Case Study on Hafnium Oxide Process Optimization
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ALD Student Award Finalist Talk: The AtomicLimits ALD/E Database: Unlocking the Future of ALD/E with Large Language Models
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ALD Student Award Finalist Talk: Influence of Hydrocarbon Chain Length in Phenyl(Alkyl)trimethoxysilane Inhibitors on AS-ALD Selectivity: Comparison of Adsorption Mechanisms in Gas-phase and Liquid-phase
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ALD Student Award Finalist Talk: Molecular Layer Deposition (MLD): A New Platform for Precision Engineering of Water Filtration Membranes
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ALD Student Award Finalist Talk: Diffusion Behavior Study for Vapor Phase Infiltration Using Quartz Crystal Microgravimetry and its Application in Energy Storage Materials
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ALE Student Award Finalist Talk: Lateral Etching of 2D MoS2 Crystalline Layers Using Sequential Ozone and Thionyl Chloride Exposures
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ALE Student Award Finalist Talk: A Sustainable and Precise Solution to IGZO Etch Residual Challenges Using Transient-Assisted Processing (TAP)
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Break & Exhibits
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| ALE-MoA |
Revolutionizing Semiconductor Scaling with Atomic Layer Etch Pitch Splitting
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Exploring Atomic Layer Etching Behavior Differences in ZnO Crystallographic Planes and Surface Energy Analysis via DFT
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Investigation of Plasma ALD and ALE of Al2O3 in Nanoscale Structures: Towards Corner Lithography at the sub-20 nm Scale
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Optimizing EUV Etching with In-Situ Atomic Processing: Where and Why?
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