ALD/ALE 2022 Tuesday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Tuesday, June 28, 2022
1:30 PM 2:30 PM 3:30 PM 4:30 PM
High-Stability and High-Performance PEALD-IZO/IGZO Top-Gate Thin-Film Transistor via Nano-Scale Thickness Control
Impacts of Deposition Temperatures on Insulation Properties of Atmospheric Pressure Spatial ALD Al2O3 Thin Films for Flexible PEALD IGZO TFT
Enhanced Crystallinity Using in-Situ Atomic Layer Deposition Process of Al2O3 on P-Type SnO Thin Film and the Associated Device Applications
Oxidant- and Temperature-Dependent Growth Behavior of ALD-Processed ZnO Thin Films and their Applications inTransistors
Facile Control of p-type SnO TFT Performance with Restraining Redox Reaction by ITO Interlayers
Break & Exhibits
Electron-Enhanced Atomic Layer Deposition (EE-ALD) of Titanium Nitride Using Ammonia Reactive Background Gas
Atomic Layer Deposition of MoNx Thin Film Using New Synthesized Liquid Mo Precursor
Atomic Layer Deposition of Tungsten Nitride Thin Film using WCl5 as a Fluorine-free W Precursor and its Application into the Diffusion Barrier for Cu and Ru Interconnects
Thermal Atomic Layer Deposition of Ru With H2 Molecules for Emerging Ru Interconnects
The Oxygen-Free Thermal ALD and Area Selective ALD of Ruthenium Film
ALD-Prepared 2D Transition Metal Dichalcogenides as Diffusion Barriers in Interconnects
Evolution of Structural and Electrical Properties of Molecular Layer Deposited Hafnicone Films after Thermal Processing for Applications in Low-K Etch Stops
Reaction Mechanisms of ALD of Transition Metal Oxides from Metal Amido Complexes and Water
An in-Vacuo X-Ray Photoelectron Spectroscopy Study of the Reaction of Trimethylaluminum With Water, Oxygen and Argon Plasma for Low Temperature Atomic Layer Deposition
In Vacuo Cluster Tool for Studying Reaction Mechanisms in ALD and ALE Processes
Watching the ALD of Pt Films in Real-Time
In Situ X-Ray Studies of Lamellar Dichalcogenides Prepared by Molecular Layer Deposition and Thermal Annealing
Effect of O2 Plasma Exposure Time During Atomic Layer Deposition of Amorphous Gallium Oxide
Pyroelectric Calorimetry: Measuring the Time-Resolved Heat of ALD Half Reactions
Break & Exhibits
Get the Full Picture: Full-Range Time-Resolved In Situ Mass Spectrometry During ALD
Strategies to Produce Boron-Containing ALD Thin Films Using Trimethyl Borate Precursor: From Thermal to Plasma to Combined-Plasma Approach
Examining Large Grain Growth and Low Temperature Crystallization Kinetics for TiO2 Thin Films Prepared by Atomic Layer Deposition (ALD)
Deposition and Characterization of Hafnium Dioxide Films Embedding Nickel Nanoparticles
Biased QCM for Studies of Reductive Surface Chemistry Induced by Plasma Electrons
NHC Monolayer Growth Behaviour and Film Durability Measured by QCM
Surface Reaction Mechanisms by Metal-Organic Compound Formations in Atomic Layer Etching Processes
Atomic Layer Etching of Al2O3 on Metallic Substrates Using in situ Auger Electron Spectroscopy
In-situ Optical Emission Spectroscopy as a Tool to Characterize Cyclic Quasi-Atomic Layer Etching
Atomic Layer Etching of CAR/SOG in EUV Patterning of 300 Mm Wafers - Selectivity and Roughness Mechanisms
Ab Initio Calculations on the Thermal Atomic Layer Etching of Copper
Damage Formation in the Underlying Silicon after the Removal of Silicon Nitride by Atomic Layer Etching: A Molecular Dynamics Study
Break & Exhibits
Plasma Processes for Isotropic and Anisotropic Atomic Layer Etching
SF6 and Ar Plasma Based Atomic Layer Etching of Gallium Nitride (GaN)
SF6 Physisorption based Cryo-ALE of Silicon
Precision and Repeatability of ALE Process in AlGaN/GaN Layer by in-Situ Etch Depth Monitoring
Investigation of Self-Limiting Sputtering of Fluorinated Al2O3 and HfO2: Where's the Limit?
Isotropic Plasma ALE of Al2O3 using F-based Plasma and AlMe3: Key Parameters, Upscaling and Applications
Atomic Layer Deposition Equipment Used in Industrial Production of More Than Moore Devices
Spatial ALD on Large-Area Porous Substrates: How to Avoid Supply Limitation and Maximize Precursor Efficiency?
Atmospheric-Pressure Plasma-Assisted Spatial Atomic Layer Deposition of Silicon Nitride
Production-Suitable 200 Mm Batch ALD/MLD Thin Film Encapsulation Toward Flexible OLED Manufacturing
Roll-to-Roll ALD Coatings for Battery Cell Interfaces at Production Scale
An Innovative Method for in Situ Calorimetry of ALD/ALE Surface Reactions
Break & Exhibits
High-Throughput Nanocoating Technology for Energy Applications
Optimizing Vapor Delivery of Transition-Metal Diazadienyl Complexes for ALD Processes
Inherently Selective Atomic Layer Process Based on Spatial Micronozzles: Microreactor Selective Area Direct Atomic Processing (µSADALP)
Atomic Layer Rastering
Maskless Localized Atomic Layer Deposition: Surface Structuration and Functionalization
New Spatial ALD/CVD Approaches for Area-Selective Deposition
Sessions | Time Periods | Topics | Schedule Overview