ALD2018 Wednesday Morning
Sessions | Time Periods | Topics | Schedule Overview
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| Session | Wednesday, August 1, 2018 | |||||||||||||||
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| 8:00 AM | 9:00 AM | 10:00 AM | 11:00 AM | |||||||||||||
| AA1-WeM | 
                                 
                                    Growth Of Indium Oxide Thin Films Based On A Plasma Enhanced Atomic Layer Deposition Technique
                                    
                                 
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                                    Large-Area Atmospheric Pressure Spatial ALD for Display Applications
                                    
                                 
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                                    Amorphous Indium Zinc Tin Oxide (IZTO) Semiconductor Materials and the Associated Thin Film Transistor Properties Deposited by Atomic Layer Deposition
                                    
                                 
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                                    Evaluation of Si precursor for SiO2 OLED Encapsulation by PEALD
                                    
                                 
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                                    Hydrogen Barrier Properties of ALD Al2O3 with Different Oxidants
                                    
                                 
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                                    Flexible Al2O3/Organic Multilayer Moisture Barrier Films Deposited by Spatially Resolved ALD Processes in a Single Chamber
                                    
                                 
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                                    Optimization of Film Structure by Stress Engineering for Flexible Thin Film Encapsulation
                                    
                                 
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| AA2-WeM | 
                                 
                                    A Condense Polymer-inorganic Hybrid Nanolayer with Extremely Low Gas Transmission Rate Behavior and Ultra-flexible Nature
                                    
                                 
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                                    SiN-Al2O3 Nano-laminates Fabricated with Combination of CVD-ALD Method for Encapsulation of Highly Stable Flexible OLED Electronics
                                    
                                 
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                                    Thermoelectric Device Based on ALD/MLD-grown ZnO and ZnO:benzene Thin Films on Flexible and Textile Substrates
                                    
                                 
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                                    Transparent Graphene Heater Improved by Defect Healing of Metal Atomic Layer Deposition
                                    
                                 
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                                    Surface Modification Studies and Stabilization of Perovskite Quantum Dots with Atomic Layer Deposition
                                    
                                 
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| AA3+ | 
                                 
                                    Fabrication of TiO2 Interconnected Nanotubes by ALD and Synthesis of g-C3N4/Au/TiO2 Heterostructure for Photocatalytic Water Splitting
                                    
                                 
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                                    Nano-energetic Materials Fabricated by Atomic/Molecular Layer Deposition
                                    
                                 
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                                    Atomic Layer Deposition of Alumina on Lactose Particles for Modified Release: Effect of Co-reactants and Substrate Crystallinity
                                    
                                 
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                                    A High Vacuum Plasma Enhanced Atomic Layer Deposition System for Depositing Very Reactive Metals
                                    
                                 
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                                    Plasma Properties of High Pressure ALD
                                    
                                 
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                                    Remote Plasma Atomic Layer Deposition of Gallium Oxide Thin Films using Trimethylgallium and Oxygen Plasma
                                    
                                 
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                                    Impact of Substrate Biasing during Plasma-enhanced Atomic Layer Deposition on Dielectric Breakdown of Al2O3 Thin Film
                                    
                                 
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                                    Growth Mechanism of High-k Y2O3 on GaAs(001)-4×6 using in-situ Cycle-by-Cycle ALD and Synchrotron Radiation Photoelectron Spectroscopy
                                    
                                 
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| AF1-WeM | 
                                 
                                    Role of Low and Medium Energy Ions in PEALD Processes
                                    
                                 
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                                    Energetic Ions during Plasma ALD and their Role in Tailoring Material Properties
                                    
                                 
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                                    Role of Plasma Chemistry on Structure and Properties of Low Resistivity PEALD TiN Films
                                    
                                 
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                                    Effect of Oxygen Plasma and Growth Temperature on the Densification of Plasma-Enhanced Atomic Layer Deposited Silicon Dioxide Film
                                    
                                 
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                                    On the Co-reactant for Atomic Layer Deposition of Metals: Hydrogen/Nitrogen-based Plasmas for Cobalt ALD
                                    
                                 
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                                    Plasma-enhanced Atomic Layer Deposition of Tungsten Films using Tungsten Chloride Precursor
                                    
                                 
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                                    Tailoring Molybdenum Carbide Properties by Plasma and Ion Energy Control during Plasma Enhanced ALD
                                    
                                 
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                                    Atmospheric-Pressure Plasma-Enhanced Spatial ALD of In2O3:H
                                    
                                 
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| AF2-WeM | 
                                 
                                    Low-Temperature Plasma-Enhanced ALD of Highly Conductive Niobium Nitride Thin Films with RF Substrate Biasing
                                    
                                 
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                                    Low-temperature Plasma Assisted Atomic Layer Deposition of Cadmium Telluride
                                    
                                 
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                                    Improved Deposition Rate of Low T PEALD Silicon Nitride Using Amines
                                    
                                 
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                                    Improved Adhesion and Electrical Properties of Plasma-Enhanced ALD Platinum through Cycle-by-Cycle Hydrogen Plasma Treatment
                                    
                                 
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                                    Low Temperature SiNx Film Deposition by Plasma Enhanced Atomic Layer Deposition with Trisilylamine
                                    
                                 
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| EM1-WeM | 
                                 
                                    Enhanced Thermal Stability of LTO Electrode by Atomic-Layer-Deposited Al2O3
                                    
                                 
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                                    Electrochemical Performance of Atomic Layer Deposited Zinc Oxysulfide Thin Film in Li-ion Battery
                                    
                                 
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                                    Interfacial and Surface Design of Electrode by ALD and MLD for Next-generation Batteries
                                    
                                 
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                                    Biodegradable ALD Materials for the Packaging of Thin Film Batteries for Implantable Medical Devices
                                    
                                 
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                                    Enhanced Conductivity in Thin-Film Solid-Composite Electrolytes for Lithium-Ion Batteries by Combining Molecular and Atomic Layer Deposition
                                    
                                 
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                                    Resolving the Mutual Contradiction between Porosity and Toughness of Carbon Textile for Flexible Supercapacitors
                                    
                                 
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| EM2-WeM | 
                                 
                                    Atomically-Precise Interfacial Engineering of Energy Conversion and Storage Materials by ALD
                                    
                                 
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                                    Minimizing Polysulfide Shuttle Effect in Lithium-Ion Sulfur Batteries by Anode Surface Passivation via Atomic Layer Deposition
                                    
                                 
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                                    A Facial Way to Prepare Large Areal 3D Porous Carbon via Molecular Layer Deposition and its Application for Lithium Sulfur Batteries
                                    
                                 
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                                    Enhanced Metal-support Interaction of Ceria Supported Platinum Single Atoms and Subnanoclusters for Room Temperature CO Oxidation
                                    
                                 
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| NS-WeM | 
                                 
                                    DBD Plasma Assisted Atomic Layer Deposition Alumina Barrier Layer and its Applications
                                    
                                 
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                                    Sequential Infiltration Synthesis for sub 20 nm Thermal Scanning Probe Lithography Patterns
                                    
                                 
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                                    Fabrication of BN Coated Carbon Nanostructures using ALD Based on Polymer Derived Ceramics Route
                                    
                                 
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                                    Atomic Layer Deposition of Lead(II) Iodide
                                    
                                 
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                                    Crystalline High-k Dielectric Films on Atmospheric Plasma Treated Graphene by Atomic Layer Deposition
                                    
                                 
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