ALD2018 Monday Afternoon

Atomic Layer Deposition as a Key Technology for Manufacturing 3D V-NAND Flash Memory

Room-temperature Resonant Tunneling by Band-offset Engineering of Nanolaminated High-k Oxides Deposited by Atomic-layer Deposition

Atomic Layer Deposition of HfO₂ Thin Films using Hf(BH₄)₄ and H₂O

TaN Based Multi-Vth Devices for 7nm and Beyond Technology

Atomic Layer Deposition: A Few Prospective Applications Aiming Mass-production after Current Si-based Semiconductor Process

Atomic Layer Deposition of NbO_x Films with Tunable Stoichiometry Using Hydrogen Plasma Reduction

Effects of Fluorine in ALD W on Dielectric Properties

Low Temperature Atomic Layer Deposition of Ru for Copper Metallization

Conformal Growth of Low-resistivity Ru by Oxygen-free Thermal Atomic Layer Deposition

Plasma Enhanced Atomic Layer Deposition of Nickel and Nickel-based Alloy Thin Films for High-quality and Thermally Stable Nickel Silicide

Ternary Thin Film Alloys of Ti-Si-N as Low Resistance Diffusion Barrier for Memory Applications

Atomic Layer Deposition of Mixed Phase TiN_xC_y using Highly Reactive Substituted Hydrazines and Tetrakis(dimethylamido)Titanium

Forcing Timescale: Can Monolayer Stability Be Built Into a Precursor?

Comparative Study on New Heteroleptic Zirconium ALD Precursors

A New Class of ALD Precursors for Aluminum Oxide – Potential Alternative to TMA!

Atomic Layer Deposition of Aluminum Metal Using a Thermally Stable Aluminum Hydride Reducing Agent

Low Temperature PE-ALD of Copper Films using Copper Aminoalkoxides Precursors with Hydrogen

Atomic Layer Deposition of Rhenium Selenide Thin Films

Plasma Enhanced Atomic Layer Deposition of Silicon Nitride Films with Inorganic Disilane Precursors

Different Growth Mechanism of SiO₂ Layer on Various High-k films by PE-ALD using Tris(dimethylamino)silane and Oxygen Plasma

In-situ Surface Science Studies of Atomic Layer Processes of GaN Surfaces in Preparation for Atomic Layer Epitaxial Growth

Surface Chemistry during Atomic Layer Deposition of Zn(O,S)

Surface Reaction Mechanism of Atomic Layer Deposited Metal on Organic Textiles

Insight in Surface Dependence and Diffusion-mediated Nucleation Mechanism of Ruthenium Atomic Layer Deposition on Dielectrics

Surface Oxidation Model in Plasma-enhanced ALD for Silicon Oxide Films Including Various Aminosilane Precursors

Thermal and Plasma Enhanced Atomic Layer Deposition of Al₂O₃ and HfO₂ Films Investigated by using in situ Auger Electron Spectroscopy

Investigation of Atomic Layer Etching Process and UV Damage for AlGaN/GaN HEMT

Plasma-assisted Atomic Layer Etching of Si-based Dielectric Films Studied using in situ Surface Diagnostics

Silicon Atomic Layer Etching by Two-step Plasma-enhanced Atomic Layer Deposition Consisting of Oxidation and (NH₄)₂SiF₆ Formation

Factors in Selectively Etching SiO₂ over Si₃N₄ Using C₄F₈/Ar Atomic Layer Etching

Bias System for Controlling Ion Energy Distributions

Reactions of Hexafluoroacetylacetone ( hfac) and Metal Surfaces under Low-energy Ion Irradiation

Application of ALE Technology to <10nm Generation Logic Device Fabrication

Isotropic Atomic Layer Etching of ZnO on 3D Nanostructures, using Acetylacetone and O₂ Plasma

Etching Reactions of Halogenated Layers Induced by Irradiation of Low-energy Ions and Gas-clusters

Optimization of Atomic Layer Etch Process for Fabrication of Dual Barrier GaN-based Power Device using in-situ Auger Spectrometric Surface Ananlysis

ALE to Enable Memory Scaling

Comparisons Between TiO₂/Al₂O₃ Nanolaminates Grown by Thermal and Plasma Enhanced Atomic Layer Deposition: Growth Mechanism and Material Properties

Texture Control of ALD PbTiO₃ and PbTi_xZr_1-xO₃ Films by Hot Chuck and Rapid Thermal Annealing

Optical and Electrical Properties of Ti_xSi_(1-x)O₂ Films Prepared by ALD

Concerted Coating and Reduction for the Fabrication of Magnetic Fe₃O₄/TiO₂ Core-shell Nanoparticles

Aluminum Nitride – From Amorphous to Highly Oriented Hexagonal Thin Films

Purely Thermal Deposition of Polycrystalline Gallium Nitride Films at 400^oC

ABC-type pulsing for group 13 nitrides

Low-temperature Growth of 2-D SnS Thin Films by Atomic Layer Deposition

Atomic Layer Deposition of 2D Semiconductor SnS₂

Wafer-scale Growth of Single Phase SnS₂ Thin Films by Atomic Layer Deposition

ALD Tin Sulfide Thin Films and Their Device Applications

Synthesis of 2D MoS₂ and MoS₂-Graphene Heterojunction by Atomic Layer Deposition

Atomic Layer Deposition of MoS₂/WS₂ Nanolaminates from bis(tert-butylimido)-bis(dialkylamido) Compounds and 1-Propanethiol

Wafer-scale MoS₂ Monolayer Grown on SiO₂/Si Substrate by Modified Atomic Layer Deposition

X-ray Absorption Spectroscopy of Amorphous and Layered ALD Molybdenum Sulfide Films Prepared using MoF₆ and H₂S