ICMCTF2011 Session B4-1: Properties and Characterization of Hard Coatings and Surfaces

Monday, May 2, 2011 10:00 AM in Room Golden West

Monday Morning

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10:00 AM B4-1-1 Comparative ab Initio and Experimental Study of Ti-Al-N, Zr-Al-N and Hf-Al-N
Paul Mayrhofer, David Holec, Richard Rachbauer (Montanuniversität Leoben, Austria)

Hard coatings based on transition metal aluminum nitrides are well established and routinely used for various industrial applications due to their outstanding properties like high hardness, wear and corrosion resistance. However, the favourable phenomena are often strictly connected to their crystalline structure. While Ti-Al-N coatings are known to crystallize either in cubic or wurtzite structure (or a mixture of both) depending on the Al content, the crystallization behavior is more complicated for Zr-Al-N and Hf-Al-N, which can also form Zr3N4 and Hf3N4 based structures.

Here we present experimental and ab initio studies with emphasis on phase stability ranges and lattice structures of ternary Ti1-xAlxN, Zr1-xAlxNy and Hf1-xAlxNy alloys. The concept of special quasi-random structures to simulate more random-like alloys is compared with studies of ad hoc structures which can mimic also clustering of ions. Several crystallographic configurations (like cubic, wurtzite, hexagonal) are considered, as these are the stable and metastable phases of the binary constituents.

A strong dependence of the various phase-stability-ranges on the alloyed elements is obtained. In particular, the maximum metastable solubility limit for Al in the cubic structure decreases from ~0.7 for Ti1-xAlxN to ~0.6 for Zr1-xAlxN and to ~0.55 for Hf1-xAlxN. This result is rationalised by an analysis of the structural and electronic configurations and is confronted with experimental data showing a strong dependence of the evolving crystalline structure on the N2 partial pressure during growth. We furthermore show that the Al-content of the films also strongly depends on the N2/Ar partial pressure ratio when sputtering a powder metallurgically prepared alloy target.

10:20 AM B4-1-3 The Effect of Elastic Anisotropy on the Spinodal Decomposition in TiAlN: a Phase Field Study
Jennifer Ullbrand (Linköping University, Sweden); Bo Jansson (Seco Tools AB, Fagersta & Linköping University, Sweden); Ferenc Tasnádi, Lars Hultman, Magnus Odén (Linköping University, Sweden)

TiAlN alloys are of interest for hard wear protective coatings, for example on metal machining cutting inserts. Arc evaporated TiAlN coatings can be grown as metastable solid solutions in the cubic (c) B1 structure over a wide range of Ti/Al ratios. This B1-structure possesses a broad miscibility gap and may decompose spinodally into c-TiN and c-AlN rich domains when heated. The evolving differences in lattice parameter and elastic constants during heat treatment affect the decomposition behavior and the final microstructure. Here the phase field approach is used to solve the Cahn-Hilliard equations including the elastic energy term to describe the microstructure evolution during decomposition. In order to appropriately address TiAlN alloys enthalpy of mixing and the elastic stiffness tensor, determined by first-principles density-functional theory (DFT) calculations, are also taken into account as input parameters.

The microstructure and local strain evolution is studied during spinodal decomposition. At compositions above 40 at.% AlN the microstructure reveals nanosized domains with preferred growth directions in the elastically compliant directions <100>. At AlN contents below 40 at.% where the elastic anisotropy is less pronounced spherical domains are instead formed. Hence, there is a strong correlation between the evolved microstructure and the elastic properties. The initiation of the spinodal decomposition is notably slower when the composition is displaced from the center of the miscibility gap towards lower amounts of AlN. In addition, the evolved modulation in elastic properties itself slows down the decomposition since ­it results in an increased amount of stored elastic energy. The origins of the observed kinetic differences are discussed and the simulated microstructure evolution is compared to experimental observations by small angle x-ray scattering, scanning transmission electron microscopy, and atom probe tomography.

10:40 AM B4-1-4 Effect of Internal Stress on Cutting Performance of Coated Carbide Tools
Shinya Imamura, Akihiko Shibata, Haruyo Fukui, Keizo Tanaka (Sumitomo Electric Hardmetal Corp., Japan)

This study was intended to investigate the effect of internal stress on cutting performance of coated carbide tools.

In order to control the internal stress, PVD films were deposited under a lot of bias conditions. The depth profiles of internal stress measurement were carried out by using synchrotron radiation ‘SPring-8’ in Japan. In case of the PVD-TiAlN film, the bias voltage was changed linearly gradient from -50V up to -150V during the deposition, the compressive residual stress was increased to a maximum value of 5.5 GPa gradually from a substrate to a surface of film. Such a gradient stress film enhanced a balance between fracture property of cutting edge and adhesion of film. The film microstructure was evaluated by using Electron Backscatter Diffraction Pattern (EBSP) and Scanning Ion Microscopy (SIM). Furthermore, the cutting test was carried out with different stress condition films of TiAlN, TiSiN, AlCrN etc.

On the other hand, in order to control the internal stress of CVD-TiCN/Al2O3 film, shot-peening was treated from film surface. The internal stress of CVD-TiCN/Al2O3 film was changed from tensile stress (0.24GPa) to compressive stress (-0.17GPa) by shot-peening treatment. Such CVD film shows high chipping resistance in steel machining.

11:00 AM B4-1-5 In-Situ Measurement of Residual Stresses Developed During Triode Magnetron Sputtering Film Depositions with Step-Variation of Substrate Bias
Cristiano Fernandes Lagatta (University of Sao Paulo, Brazil); Abel Recco (University of Santa Catarina, Brazil); André Tschiptschin, Roberto Souza (University of Sao Paulo, Brazil)
In this work, a series of depositions of titanium nitride thin films was conducted in a triode unbalanced magnetron sputtering chamber. Similar parameters were selected during each deposition, except for the substrate bias voltage, which was either step-increased or step-decreased. Depositions with constant substrate bias were also conducted. An in-situ measurement of film residual stresses was carried out as the depositions proceeded. This measurement was based on substrate curvature, which was assessed by a home-built capacitive sensor positioned inside the sputtering chamber. Results have indicated that the in-situ sensor was able to resolve differences between depositions in which the substrate bias was varied differently. Furthermore, the changes observed as the value of the substrate bias was step-increased or step-decreased were also described.
11:20 AM B4-1-6 Low-Temperature Plasma Nitriding of Ti-6Al-4V: Microstructural Characterization and Mechanical Properties
Khorameh Farokhzadeh, Afsaneh Edrisy (University of Windsor, Canada); Graham Pigott, Peter Lidster (Exactatherm Ltd., Canada)
Significant weight reduction occurs by using titanium alloys instead of steels for load bearing components. However, the application of Ti alloys has been restricted due to their poor tribological behaviour. Plasma nitriding has been successfully developed to improve load bearing capacity and wear resistance of Ti alloys, however, it had a detrimental side effect on fatigue properties. Grain growth, lack of good interfacial bonding and low fracture toughness of the hard deposited coatings have been identified to be responsible for coating failure under static and dynamic loadings.

In this investigation, plasma nitriding treatment parameters have been optimized to achieve a modified nitrided microstructure to deal with wear issues while maintaining other mechanical properties. For this purpose, the nitriding treatment was performed at low temperatures to minimize grain growth of the bulk material. Also, the active nitriding gas composition was diluted for minimal formation of hard, brittle nitride phases on the surface and enhanced diffusion of nitrogen atoms. Prior to the treatment, samples’ surfaces were polished and possible sources of surface contamination like oxide scales were removed. The SEM, FIB and TEM examinations of the nitrided samples showed a thin compound layer (< 2μm) composed of TiN and Ti2N formed on top of a relatively deep diffusion zone (~ 40μm). The surface-and depth-profiling chemical analysis was established by incorporating XRD, GDOES, and XPS results. Conventional metallographic preparation technique was used to prepare samples for nano-hardness versus depth measurements. Micro-scratch tests under progressive loading were performed to determine the resistance to surface deformation and the critical failure load of the compound layer to the diffusion zone as well as its friction behaviour. The results showed good interfacial bonding as well as load bearing capacity. The scratch paths were investigated using FIB, SEM and optical surface profilometry. The results showed that ductile β particles embedded at α-grain boundaries in the diffusion zone served as crack deflection sites. The hardened diffusion zone suppressed extensive plastic deformation of the substrate and provided good mechanical support for the compound layer, thus early spallation was inhibited and surface fracture toughness was increased.

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