ICMCTF2006 Session G7-2: Advances in Industrial Deposition Equipment and Metrology for Coatings and Thin Films
Wednesday, May 3, 2006 1:30 PM in Room Royal Palm 4-6
Wednesday Afternoon
Time Period WeA Sessions | Abstract Timeline | Topic G Sessions | Time Periods | Topics | ICMCTF2006 Schedule
| Start | Invited? | Item |
|---|---|---|
| 1:30 PM |
G7-2-1 In-Situ Real Time Sputtering Source Health Monitoring Using Ultrasonics
A. Leybovich (Tosoh Smd., Inc.) This work describes the technique of monitoring functional health of sputtering source during sputter-deposition process using ultrasound time of flight (TOF) measurements. The TOF is measured between echoes reflected from the boundaries of dissimilar components inside the source. The technique, as described can be used for in-situ real time monitoring of source cooling water temperature, target-to-magnet displacement, target deformation, real time target thickness at any given time of target life, and finally bond integrity if bonded assemblies are used. |