ICMCTF2004 Session B2-2: Arc and E-Beam Coatings and Technologies

Wednesday, April 21, 2004 1:30 PM in Room Golden West

Wednesday Afternoon

Start	Invited?	Item
1:30 PM		B2-2-1 Results of an Evaluation of a Newly Developed Cathodic Arc Filter D.M. Sanders (Lawrence Livermore Laboratory); P.E. Sathrum (Fluxion); J.A. Budd (Rohwedder Inc.); J. Wolfe (Lawrence Livermore Laboratory) This paper describes the results of a series of experiments carried out to evaluate the performance of a newly developed cathodic arc filter. Filter properties such as ion transport efficiency and effectiveness in macroparticle removal will be described. Coating rate distribution as a function of operating parameters will be discussed. Finally, the properties of the resulting coatings such as stoichiometry and roughness will be defined.
1:50 PM		B2-2-2 Influencing the Surface Roughness of Hard Coatings using a New Designed Arc Source A. Schütze, T. Bartz, V.H. Derflinger, R. Lampert (Balzers AG, Liechtenstein) Modern wear resistant hard PVD coatings are mostly deposited using either sputtering or arcing as the principle deposition method. A drawback using arc evaporation lies in the nature of the process creating droplets or macroparticles resulting in a relatively rough coating surface. In general rough surfaces result in higher friction during cutting operation and thus earlier tool failure as compared to tools having a smoother coating. Filter exist to reduce the amount of droplets to a minimum but also reduces the deposition rate significantly. Here, we describe a method to manipulate the arc movement to deposit smoother in-line-of-sight coatings. With this technique also the deposition rate and target utilization could be improved. Performance tests of TiAlN coatings will be shown comparing one type of coating deposited with different set-ups of the technology used.
2:10 PM	Invited	B2-2-3 Effects of Tungsten Contents on Micro-hardness and Microstructure in Ti_1-xW_xN Films Synthesized by Cathodic Arc Method H. Hasegawa, T. Hayashi, T. Suzuki (Keio University, Japan) It has been recognized that incorporation of second elements to Ti-based nitride films effects on improvements of mechanical properties and cutting performances. The incorporation of Al to TiN films leads to superior hard coatings to that of binary films. In this study, Ti_1-XW_XN films synthesized by the cathodic arc method by changing tungsten contents, X and micro-hardness was measured by Vickers hardness test. The micro-hardness of Ti_1-XW_XN changed from 20 GPa (X=0) to 32 GPa (X=0.5). The XRD pattern showed that peaks of Ti_1-XW_XN shifted higher angles from that of TiN presumably because W atoms replaced Ti atoms and correspondingly, the films were hardened. Effects of W contents in TiN films on microstructures and micro-hardness were investigated, based on changes in lattice parameter. Further, microstructural changes were analyzed with atomic scale by high-resolution electron microscopy.