High-rate Reactive Sputtering Comes of Age.

Deposition and Optimization of Amorphous Silicon Carbide Thin Film Characteristics for Tribological Applications

Engineered Thin Film Microstructures using Glancing Angle Deposition (GLAD)

Deposition of Boron Carbide Thin Film by Supersonic Plasma Jet CVD with Secondary Discharge

Magnetically Enhanced Ionized PVD using ICP.

Anode Mass Loss During Pulsed Air Arc Deposition

Deposition of Hard Crystalline Al₂ O₃ Coatings by Bipolar Pulsed D.C. PACVD

Titanium Nitrade Hard Coatings Deposited on Steel by Pulsed Plasma

The Simultaneous Influence of Process Parameters on the Properties of the Arc-Ion-Plated ZrN Coatings

Pulsed High Current Electron/Ion/Cluster Source for Deposition of Films and Coatings with High Adhesion

Identification of Transitions Between Erosion-corrosion Regimes for Erosion of PVD Coatings in Aqueous Slurries

Effect of MEMS Compatible Thin Film Hard Coatings on Erosion Resistance of Silicon Micromachined Atomizers

Metallic and Ceramic Coatings, Including Biomimetic Coatings for Biomedical Applications

Magnetron Sputtered Hard Material Coatings on Thermoplastic Polymers for Clean Room Applications

Application of Coatings in Various Energy Technology Systems

Wear Resistant Aluminide Composite Surfaces by Electro Spark Deposition (ESD)

Modification and Characterization of Mineralization Surface for Corrosion Protection

Tribological Fundamentals of Polycrystalline Diamond Films

Tribological Characteristics of Nanocrystalline Diamond Films

Friction and Wear of DLC-based Multilayer Nanocomposite Coatings

Tribological Behaviour of Amorphous Hard Carbon Films Against Zinc Plated Steel Sheets

Wear Behavior of Diamond-like Nano-composite Coatings

Comparison of Tribological and Mechanical Properties of DLC-Coatings Deposited with Different CVD-and PVD-Techniques

Time-dependant Changes in the Mechanical Properties of Diamond-like Carbon Films

Fretting Wear Behavior of DLC Films Produced from Methane and Acetylene

Effects of Nanoscale Morphology on the Abrasion of Steel by Diamondlike Carbon

Atomic Scale Characterization by Cross-sectional Scanning Tunneling Microscopy

Secondary Electron Imaging of Nucleation and Growth of Semiconductors for Nanostructure Fabrication

Investigation of Borophosphosilicate Glass Roughness and Planarization with the Atomic Force Microscope

X-ray Diffraction and Reflection Techniques for Thin Film Analysis

The Effect of Transverse Current Injection on the Structural and Electrical Properties of Ti Films During Post-deposition Annealing in Air

Surface Morphology of Co-sputtered Alloy Thin Films

Structural and Electrochromic Properties of InN Thin Films

Superlattices of Semiconductor Microstructures: Experimental Methods of Characterisation by the Third Order Non-linear Dielectric Susceptibility

Characterization by TEM of the Crystalline and Quasicrystalline Phases Observed During the In-Situ Heating of Al-Mn Thin Films

A TiAlN Coating Texture Sets New Performance Standards

Wear and Cutting Performance of Coated Microdrills

PVD Hard Coating Applications Update

Failure Mechanisms of Multi- and Mono-layer PVD Coatings in Interrupted Cutting Processes

Investigation of New Arc PVD Coatings in the System Ti-Hf-C-N

Crystalline Aluminum Oxide Layers on Steel Workpieces

A Hard and Soft Tool Coating Reaches Out for New Frontiers

Advanced Soft Tool Coatings and Their Complex Mechanisms of Operations

Use of DLC Coatings in Lubrication Reduced Metal Forming

Optimisation of Low Dielectric Constant Flowfill Layers for Advanced Intermetal Applications.

The Effects of Plasma Treatment for Low Dielectric Constant Hydrogen Silsesquioxane (HSQ)

Enhancing the Thermal Stability of Low Dielectric Constant Hydrogen Silsesquioxane (HSQ) by Ion Implantation

Uncooled Thin Film Infrared Imaging Device with Aerogel Thermal Isolation: Deposition and Planarization Techniques

Precursor Selection for Plasma Deposited Fluorinate Amorphous Carbon Films

Properties of Low Dielectric Constant Fluorinated SiO₂ Films Prepared by Plasma Enhanced Chemical Vapor Deposition

Process Development for PECVD High Temperature Nitride and Delta Nitride Films

High Temperature Sub-atmospheric CVD Ozone/TEOS Process Characterization for Shallow Trench Isolation Application

MOS Capacitor Characteristics of Plasma Oxide on Partially Strained SiGeC Films