ICMCTF1998 Thursday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Thursday, April 30, 1998 | |||||||||||
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8:30 AM | 9:30 AM | 10:30 AM | 11:30 AM | |||||||||
B4 |
High-rate Reactive Sputtering Comes of Age.
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Deposition and Optimization of Amorphous Silicon Carbide Thin Film Characteristics for Tribological Applications
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Engineered Thin Film Microstructures using Glancing Angle Deposition (GLAD)
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Deposition of Boron Carbide Thin Film by Supersonic Plasma Jet CVD with Secondary Discharge
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Magnetically Enhanced Ionized PVD using ICP.
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Anode Mass Loss During Pulsed Air Arc Deposition
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Deposition of Hard Crystalline Al2 O3 Coatings by Bipolar Pulsed D.C. PACVD
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Titanium Nitrade Hard Coatings Deposited on Steel by Pulsed Plasma
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The Simultaneous Influence of Process Parameters on the Properties of the Arc-Ion-Plated ZrN Coatings
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Pulsed High Current Electron/Ion/Cluster Source for Deposition of Films and Coatings with High Adhesion
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E3 |
Identification of Transitions Between Erosion-corrosion Regimes for Erosion of PVD Coatings in Aqueous Slurries
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Effect of MEMS Compatible Thin Film Hard Coatings on Erosion Resistance of Silicon Micromachined Atomizers
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Metallic and Ceramic Coatings, Including Biomimetic Coatings for Biomedical Applications
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Magnetron Sputtered Hard Material Coatings on Thermoplastic Polymers for Clean Room Applications
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Application of Coatings in Various Energy Technology Systems
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Wear Resistant Aluminide Composite Surfaces by Electro Spark Deposition (ESD)
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Modification and Characterization of Mineralization Surface for Corrosion Protection
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E5/D4 |
Tribological Fundamentals of Polycrystalline Diamond Films
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Tribological Characteristics of Nanocrystalline Diamond Films
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Friction and Wear of DLC-based Multilayer Nanocomposite Coatings
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Tribological Behaviour of Amorphous Hard Carbon Films Against Zinc Plated Steel Sheets
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Wear Behavior of Diamond-like Nano-composite Coatings
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Comparison of Tribological and Mechanical Properties of DLC-Coatings Deposited with Different CVD-and PVD-Techniques
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Time-dependant Changes in the Mechanical Properties of Diamond-like Carbon Films
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Fretting Wear Behavior of DLC Films Produced from Methane and Acetylene
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Effects of Nanoscale Morphology on the Abrasion of Steel by Diamondlike Carbon
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F4/B3-2 |
Atomic Scale Characterization by Cross-sectional Scanning Tunneling Microscopy
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Secondary Electron Imaging of Nucleation and Growth of Semiconductors for Nanostructure Fabrication
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Investigation of Borophosphosilicate Glass Roughness and Planarization with the Atomic Force Microscope
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X-ray Diffraction and Reflection Techniques for Thin Film Analysis
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The Effect of Transverse Current Injection on the Structural and Electrical Properties of Ti Films During Post-deposition Annealing in Air
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Surface Morphology of Co-sputtered Alloy Thin Films
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Structural and Electrochromic Properties of InN Thin Films
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Superlattices of Semiconductor Microstructures: Experimental Methods of Characterisation by the Third Order Non-linear Dielectric Susceptibility
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Characterization by TEM of the Crystalline and Quasicrystalline Phases Observed During the In-Situ Heating of Al-Mn Thin Films
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G5 |
A TiAlN Coating Texture Sets New Performance Standards
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Wear and Cutting Performance of Coated Microdrills
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PVD Hard Coating Applications Update
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Failure Mechanisms of Multi- and Mono-layer PVD Coatings in Interrupted Cutting Processes
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Investigation of New Arc PVD Coatings in the System Ti-Hf-C-N
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Crystalline Aluminum Oxide Layers on Steel Workpieces
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A Hard and Soft Tool Coating Reaches Out for New Frontiers
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Advanced Soft Tool Coatings and Their Complex Mechanisms of Operations
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Use of DLC Coatings in Lubrication Reduced Metal Forming
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H2 |
Optimisation of Low Dielectric Constant Flowfill Layers for Advanced Intermetal Applications.
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The Effects of Plasma Treatment for Low Dielectric Constant Hydrogen Silsesquioxane (HSQ)
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Enhancing the Thermal Stability of Low Dielectric Constant Hydrogen Silsesquioxane (HSQ) by Ion Implantation
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Uncooled Thin Film Infrared Imaging Device with Aerogel Thermal Isolation: Deposition and Planarization Techniques
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Precursor Selection for Plasma Deposited Fluorinate Amorphous Carbon Films
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Properties of Low Dielectric Constant Fluorinated SiO2 Films Prepared by Plasma Enhanced Chemical Vapor Deposition
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Process Development for PECVD High Temperature Nitride and Delta Nitride Films
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High Temperature Sub-atmospheric CVD Ozone/TEOS Process Characterization for Shallow Trench Isolation Application
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MOS Capacitor Characteristics of Plasma Oxide on Partially Strained SiGeC Films
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