AVS2014 Session 2D+AS+BI+PS+SS-TuM: 2D Materials: Surface Chemistry, Functionalization, Bio and Sensor Applications

Tuesday, November 11, 2014 8:00 AM in Room 310

Tuesday Morning

Time Period TuM Sessions | Abstract Timeline | Topic 2D Sessions | Time Periods | Topics | AVS2014 Schedule

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8:00 AM 2D+AS+BI+PS+SS-TuM-1 Phase Engineering in 2D Transition Metal Dichalcogenides
Manish Chhowalla (Rutgers University)
Two-dimensional transition metal dichalcogenides (2D TMDs) — whose generalized formula is MX2, where M is a transition metal of groups 4–7 and X is a chalcogen — exhibit versatile chemistry and consist of a family of over 40 compounds that range from complex metals to semiconductors to insulator. Complex metal TMDs assume the 1T phase where the transition metal atom coordination is octahedral. The 2H phase is stable in semiconducting TMDs where the coordination of metal atoms is trigonal prismatic. Unlike mechanical exfoliation and chemical vapor deposition, chemical exfoliation of semiconducting layered TMDs yields monolayered nanosheets with heterogeneous atomic structure consisting of metallic (1T) and semiconducting (2H) phases. Metal (1T phase) to semiconductor (2H phase) transition can be achieved via mild annealing of exfoliated materials. Semiconductor to metal transitions can be achieved via chemistry. The 1T phase in semiconducting TMDs has scarcely been studied but it deserves urgent attention as it exhibits promise as a hydrogen evolution catalyst and as contact electrode in electronic devices. We will describe these phase transitions in semiconducting TMDs and provide examples of how we have learned to exploit them for covalent functionalization, enhanced catalytic and electronic performance.
8:40 AM 2D+AS+BI+PS+SS-TuM-3 Transition Metal Nanoparticles on Single-Layer MoS2: Structural, Electronic and Catalytic Properties
Takat B. Rawal, Duy Le, Talat Rahman (University of Central Florida)

We will present results of density functional theory based calculations of the geometric and electronic structure of several types of sub-nanometer sized transition metal nanoparticles (TMNPs) on pristine and defect-laden single-layer MoS2. We will show that among the investigated TMNPs (Cu, Ag, Au), Cu nanoparticles bind strongest to pristine MoS2 while Au and Ag nanoparticles bind with similar, weaker strengths. The presence of the vacancy defect on MoS2 enhances significantly the binding strength of Cu nanoparticles, while it has very little effect on the binding strength of Au NPs. More interestingly, the amounts of charge transfer from TMNPs to MoS2 vary following the order of the bind energies of TMNPs on MoS2. Additionally, the shape of the nanoparticles also has an impact on the binding characteristics. Of particular interest is the role of the substrate on the catalytic properties of the TMNP and conversely that of the TMNP on the defect-laden MoS2 single layer. In this regard we will examine in detail the reactivity of the atoms at the TMNP/MoS2 interface in reactions such as CO oxidation and methanol decomposition and compare them to that of similar nanoparticles when supported on titania.

Work supported in part by DOE Grant No. DE-FG02-07ER15842

9:00 AM 2D+AS+BI+PS+SS-TuM-4 How Fluorination Enhances Friction Forces for Graphene
Xin Liu, Qunyang Li (University of Pennsylvania); Sang-Pil Kim (Brown University); Vivek Shenoy (University of Pennsylvania); Paul Sheehan, Jeremy Robinson (Naval Research Laboratory); Robert Carpick (University of Pennsylvania)

The chemical functionalization of graphene can alter its electronic, chemical, mechanical, and tribological properties. Here we employ atomic force microscopy (AFM), Raman microscopy, and molecular dynamics (MD) simulations to show that friction can be fine-tuned by chemically modifying graphene. Although bulk fluorinated graphite has a very low surface energy, our experiments and simulations both show that friction between nanoscale tips and FG is up to 9 times higher than that for pristine graphene. The ability to resolve an ordered lattice in atomic stick-slip friction measurements also diminishes with greater fluorination, indicating that the fluorinated graphene is disordered. Our observation suggests that AFM friction measurements provide a sensitive local probe of the degree of fluorination of graphene. Motivated by MD simulations, we propose that the dramatic enhancement of friction results from increased corrugation of the interfacial potential due to the strong local charge concentrated at fluorine sites, consistent with the Prandtl-Tomlinson model.

9:20 AM 2D+AS+BI+PS+SS-TuM-5 Chemical, Structural and Electrical Modification of Graphene
Sandra Hernández, Evgeniya Lock, Michael osofsky, Stanislav Tsoi (Naval Research Laboratory); Chad Junkermeier (Penn State University); Rory Stine (Nova Research); Jeremy Robinson (Naval Research Laboratory); Anindya Nath (George Mason University); Virginia Wheeler, Rachael Myers-Ward, Josh Caldwell, Cy Tamanaha, Thomas Reinecke, Paul Sheehan, D.Kurt Gaskill, Scott Walton (Naval Research Laboratory)

2D nanomaterials have been vigorously investigated due to their superlative mechanical, thermal, and electronic properties. Being composed entirely of surface atoms, they are incredibly amenable to surface modification thus providing the opportunity towards excellent control over their properties. Surface engineering of 2D materials composed of carbon materials, such as graphene, can be achieved by plasma modification. We will discuss our efforts in understanding the chemical, structural, and electrical properties of plasma functionalized graphene by introducing -oxygen, -fluorine, and -nitrogen chemical moities, and discuss their impact on chemical reactivity, electrical transport, and enhanced sensing behavior. Demonstrating how precise nano-engineering of surface chemistry impacts contact engineering, biosensing and device based applications.

This work is supported by the Naval Research Laboratory Base Program.

9:40 AM 2D+AS+BI+PS+SS-TuM-6 The Mechanochemistry of Chemically Modified Graphene
Jonathan Felts, Sandra Hernandez, Andrew Oyer, Jeremy Robinson, Scott Walton, Paul Sheehan (Naval Research Laboratory)

Defining the optoelectronic properties of graphene through controlled chemical functionalization provides a route to fabricating a wide range of graphene based devices. In prior work, we showed that heat supplied by a scanning probe removed functional groups from chemically modified graphene (CMG) thereby restoring it to graphene [1]. Here we show that mechanical stress alone effectively removes functional groups. We measured the degree of surface functionalization by monitoring both normal load and friction between the sliding tip and a plasma processed CMG sheet. For oxygenated graphene, friction decayed exponentially with sliding distance, dropping to ~15% of the starting value. These measurements revealed an initial drop in friction that was independent of applied stress, suggesting the presence of an adsorbed water layer on the surface. More importantly, they reveal an Arrhenius-like relationship between contact stress and degree of surface reduction. The reduction in friction persisted, precluding the presence of the adsorbed contaminants as the source of the friction change. Conductive AFM and Raman measurements provide further evidence for chemical reduction. Conductive diamond AFM tips measure the current through the surface during the reduction process, revealing a 5x increase in conductivity corresponding to the friction force reduction. Additionally, Raman measurements on a 5 mm2 reduced area showed a relative increase in both the G and 2D peaks, consistent with a reduction in functionalization. These experiments enabled detailed comparison of tribochemical reactions without the complications of transfer films or the initial run-in of the film. They also enable experiments difficult by other means. For instance we could directly compare the mechanical barrier to functional group removal by monitoring friction while slowly ramping the applied stress between the tip and a graphene surface functionalized with either oxygen or fluorine groups. For oxygenated graphene, the contact stress at the maximum reduction rate was ~0.47 ± 0.14 GPa; for fluorinated graphene it was ~0.85 ± 0.27 GPa. Thus, by using the same tip and same supporting substrate we could directly compare the bond strengths between different functional groups and the graphene lattice. This work demonstrates the ability to measure and control the chemistry of single-layer functionalized surfaces at the nanometer scale, and has wide application in tribochemical wear, mechanochemistry, and nanoelectronic device fabrication with chemically tuned optoelectronic properties.

[1] Z. Wei, et al, Science 328, 1373-1376 (2010)
10:00 AM BREAK - Complimentary Coffee in Exhibit Hall
11:00 AM 2D+AS+BI+PS+SS-TuM-10 Fe-catalyzed Etching of Graphene, Few-Layer Graphene, and Graphite
Guangjun Cheng, Angela Hight Walker (National Institute of Standards and Technology)

Mechanically exfoliating graphite onto a substrate provides a family of layered materials with adjustable thickness, including monolayer graphene, few-layer graphene (FLG), and graphite. In this work, we investigated the Fe-catalyzed etching of graphene, FLG, and graphite in forming gas (10% H2/90% N2) or N2 using low-voltage scanning electron microscopy and Raman spectroscopy. Fe thin films were deposited by sputtering onto mechanically exfoliated graphene, FLG, and graphite flakes on a Si/SiO2 substrate. When the sample is rapidly annealed in either gas environment, particles are produced due to the dewetting of the Fe thin film and expected to catalyze the etching of graphene, FLG, and graphite. The combined microscopic and spectroscopic evidence reveals a thickness-dependent, catalytic etching behavior in these two gas environments and provides insights into the catalytic mechanisms involving carbon hydrogenation and carbon dissolution.

11:20 AM 2D+AS+BI+PS+SS-TuM-11 Tunable Graphene/Si Schottky Diode Sensor: Before and After Functionalization for Wide Range of Molecular Sensing
MdAhsan Uddin, Amol Singh, Tangali Sudarshan, MVS Chandrashekhar, Goutam Koley (University of South Carolina)

Graphene/Semiconductor Schottky devices attracted significant research attention due to wide range of applications from transistor to IR detector [1-2]. Such heterojunctions are also promising for sensing applications due to the molecular adsorption induced Schottky barrier height (SBH) change at the interface, affecting the junction current exponentially in reverse bias, which leads to ultrahigh sensitivity. Graphene/p-Si diode sensor [Device image, Raman spectra and I-V characteristics shown in fig. 1(a), (b) and (c)] has been developed with high bias-dependent sensitivity and low operating power.

Performance enhancement has been demonstrated by fabricating graphene chemiresistor and diode sensor on the same chip. The diode sensor exhibited 13 times higher sensitivity for NO2 [Fig. 2(a)] and 3 times higher for NH3 [Fig. 2(b)] in ambient condition, while consuming ~500 times less power for same applied voltage. Sensing tunability is achieved by operating the device in reverse bias, tuning the graphene work function and hence the SBH by the applied bias. The sensitivity varied from 268 to 574% for NO2 as the bias magnitude varied from -1 to -8V [Fig. 3(a)]. Optimized sensor design to detect particular analyte is also possible by careful selection of graphene/Si heterojunction SBH. For example, graphene/p-Si with larger SBH is better NO2 sensor while smaller SBH device has better NH3 sensitivity. The sensing mechanism based on SBH change has been confirmed by capacitance-voltage measurements [Fig. 3(b)]. The SBH decreased by 0.23eV for NO2 exposure while increased by 0.16eV for NH3. Variation in sensitivity with NO2 and NH3 concentration has also been demonstrated (Fig. 4).

Pd and Pt functionalization has been carried out to make the graphene/Si diode [Fig 5] sensitive to H2. Extrapolated SBH from the I-V characteristics, before and after few nm metal decoration, and H2 exposure showed initial SBH decrease after functionalization and subsequent increase in presence of H2, respectively [Fig. 6(a) and (b)]. Compared to graphene chemiresistor, the chemi-diode sensor offers more than one order of magnitude higher H2 sensitivity for both types of functionalization. Similarly, the reverse bias operation also enables low power consumption, tunable sensitivity and detection of H2 down to 1 ppm [Fig. 7(a)] in air which is close to the atmospheric background of 0.6 ppm [3]. Among the two metals, Pd-functionalization always exhibited better sensing response irrespective of the bias voltage [Fig. 7(b)]. Remarkably, for Pd-functionalization, the sensor response showed absolute exponential change with varying H2 concentration ranging from 2 to 1000 ppm [Fig. 7(c)].

12:00 PM 2D+AS+BI+PS+SS-TuM-13 Dielectrics Layer Deposition on Graphene Surface by Functionalization with Polar Titanyl Phthalocyanine
Jun Hong Park, Iljo Kwak, Kasra Sardashti, Andrew C. Kummel (University of California at San Diego)
Several novel designs for beyond CMOS devices have emerged using two-dimensional semiconductors. These devices require deposition of thin insulators on 2D semiconductors or between two sheets of 2D semiconductors. However, 2D semiconductors are nearly inert surfaces thereby making uniform nucleation of oxide growth challenging preventing scaling of the insulator thickness. A new technique has been developed to employ a monolayer of ordered metal phthalocyanines (MPc) on 2D semiconductors directly as a monolayer low-k dielectric or as a nucleation layer for growth of high-k insulators. This study demonstrates the molecular scale observation of formation of O-TiPc mono and bilayers on graphene with UHV scanning tunneling microscopy (STM). O-TiPc monolayers were deposited on HOPG surfaces by organic molecular beam epitaxy. After deposition, O-TiPc forms a monolayer with only few defects, and the crystal structure of monolayer has four-fold symmetry in a 1.4 x 1.4 nm grid. Observation of bright protrusions on each O-TiPc indicates that each O-TiPc in the monolayer is directed outward to vacuum. STS shows the band gap of the monolayer is 1.7 eV and the band gap of the bilayer is 2.3 eV. The monolayer or bilayer can directly be employed for sub-nanometer insulators on 2D semiconductors at low bias. Multiple cycles of TMA and water were dosed onto O-TiPc/HOPG to investigate nucleation of Al2O3 on the O-TiPc layers. The first cycle of TMA was observed to chemisorb on a 1.4 x 1.4 nm grid on the TiOPc monolayer. After exposure O-TiPc monolayer to 5 cycles ALD pulse (tri-methyl-aluminum (TMA)+H2O), insulating aluminum oxide was deposited uniformly on O-TiPc/HOPG. After formation of Al2O3 on O-TiPc/HOPG, the band gap of surface increases from 1.7 eV to 2.7 eV, while the conductance decreased. As shown in XPS spectra, the quality of Al2O3 can be improved by post annealing, consisting with transition of chemical states in O 1s peak and Al 2p. The chemical shifts of O and Al indicate that post annealing converts remained the Al-OH to Al2O3. Consequently, O-TiPc can not only act as a low-K dielectric but also induce high density ordered nucleation of ALD on central ion of O-TiPc for high-k dielectric growth.
Time Period TuM Sessions | Abstract Timeline | Topic 2D Sessions | Time Periods | Topics | AVS2014 Schedule