AVS2004 Tuesday Morning

Light Induced Chemically Resolved Electrical Measurements (LICREM) in XPS: Anomalous Photoresponse of CdSe Nanoparticle Films

Validation of Information Gained from the XPS Survey Scan

Extensions of Photoelectron Spectroscopy to the Study of Nanoscale Systems

XPS Chemical Depth Profiling Using C₆₀ Ion Beams

X-Ray Photoelectron Spectroscopy of Rubber Compounds: Temperature Dependence and Crosslink Distribution

Monte Carlo Simulations of Electron Backscattering from Surfaces in Scanning Auger Microscopy

Round Robin Study of Evaluation of Electron Beam Damage of SiO2/Si in Auger Microprobe Analysis

Performance of a High throughput TOF-HREELS Analyzer

Oxygen Environmental Electron Spectroscopy and Microscopy: A New Concept for Reducing Harmful Electron Beam Effects on Insulating Samples

Programmed Macromolecular Synthesis

The Art of Mechano-Transduction within the Extracellular Matrix

Capture and Release of Proteins on the Nanoscale by Surface-Confined Biomolecular Switches

Micro- and Nanopatterns of DNA-Tagged Vesicles

Label-Free Biosensor Based on the Surface Plasmon Resonance of Gold Nanoparticles

Activation of Integrin Function by Nanopatterned Adhesive Interfaces

Lifetime of Biomolecules in Hybrid Nanodevices: The Aging Process of Motor Protein-based Molecular Shuttles

Analysis of Collision Events of Self-Propelled Biomolecular Shuttles Carrying Cargo

Inductively Coupled Remote Nitrogen Plasma Treatment of Hf Based Gate Dielectrics for Improved Interface Stability on Si(100)

In Situ Infrared Spectroscopy of High-k Dielectric Growth on Si (100)

DFT Study of the Initial ALD Reactions of Hf(N(CH3)2)4 on the SiO2 and Si-H Surfaces: Mechanism, Kinetics, Vibrational Spectra and Interface Structure

Development of Post Etching Process for Hf Based High-K Gate Dielectric

Plasma-Enhanced Atomic Layer Deposition for Compositionally Controlled Metal Oxide Thin Films

DFT Investigation of Initial HfO₂ Atomic Layer Deposition on Nitrided Silicon Surface

Oxygen Transport Properties in Hafnium Silicate Films

Investigation of the Roles of Oxygen Plasma and Solvent in the Pulsed-Liquid Injection PE-MOCVD Deposition of Y₂O₃ High-κ Materials in MIM Structures

UV Activated Surface Preparation of Silicon for High-k Dielectric Deposition

Annealing of Hafnium Oxide Grown on Silicon by Atomic Layer Deposition: Changes in Interfacial Structure

Near-Surface Defects and Schottky Barrier Formation at Au/ZnO(000-1) Interfaces

Investigation of the Sources of Variations in the Electrical Characteristics of Ohmic and Rectifying Contacts

Simultaneous Formation of p- and n-type Ohmic Contacts to 4H-SiC using Ni/Ti/Al Contact Materials

Fabrication, Processing and Specific Contact Resistance Measurements of Contacts to Semiconductor Nanowires

CMOS Metal Gate Implementation

Physical and Electrical Properties of Mo_X N_Y and Mo_X Si_Y N_Z as Gate Electrode Materials for MOS Devices.

Influence of Interactions Between Ta-N Films and Low Dielectric Constant Materials on the Stability of Copper Interconnection

Low Resistivity Germanides

Semiconductor Spintronics: From Basic Physics towards Spin Devices

Characterization of Thin Film MnGa/GaAs(001) Heterostructures

Co₂MnGe/Ga_1-xAl_xAs Heterostructures: Growth, Characterization and Spin Injection

Determination of the Influence of the Interfacial Formation and the Semiconductor Doping Profiles on the Spin Injection from Fe_xCo_1-x Contacts into Ga_xAl_1-xAs

Growth and Magnetic Properties of Group-IV Dilute Magnetic Semiconductors

Universal Scaling of Magnetoconductance in Magnetic Nanoconstrictions^*

Spin-Transfer Torque in a Single Ferromagnetic Layer

Magneto-Resistance in Epitaxial Nano-Contacts for Spintronic Device Applications

C-MEMS/NEMS: A Novel Technology for Graphite, Ni, and Si Nanoscale Material Formation

Durability Studies of MEMS/NEMS Materials/Coatings at High Sliding Velocities (upto 10 mm/s) Using a Modified AFM

Chemical Control of Micromechanical Resonators: The Role of Surface Chemistry

Tribological and Wear Studies of ALD and SILAR Coatings for MEMS Devices

MEMS-based Force-Detected Nuclear Magnetic Resonance Spectrometer

Frequency-Tuning for Control of Parametrically-Resonant Mass Sensors

Field Emission from a Tungsten MEMS Structure

Suspended Waveguide-Based Tunable Integrated Optical Filters on Indium Phosphide MEMS Platform

Use of Plasma Polymerisation Process for Fabrication of Micro Electromechanical System (MEMS) for Micro-Fluidic Devices

Controlled Fabrication and Modification of Organized Carbon Nanotube Architectures

Growth of Arrays of mm Long, Straight Single-Walled Carbon Nanotubes

Low-temperature Synthesis of Aligned Carbon Nanotubes by Hot-Filament Assisted DC Plasma CVD

Theoretical Study of Catalytic Growth Single-Walled Carbon Nanotubes

Controlling and Modeling the Interphase in Polymeric Nanocomposites

Wetting of Individual Carbon Nanotubes with Organic Liquids

Impregnation of Osmium Dioxide to MWCNTs and Improvement of the Electron Emission Characteristics

Electron Emission Property from MWCNTs with Subnano Ruthenium Dioxide Clusters and with High Adhesivity on Substrate - High Current Endurance Test in UHV and Influence of H₂O or CO -

Synthesis of Y-Junction Singlewall Carbon Nanotubes

Surface-Programmed Assembly Process of Large-Size Multi-Wall Carbon Nanotubes and Its Mechanism

Polymer Formation in Fluorocarbon Etch Plasmas

Reduction of Line Edge Roughness for 90nm Technology Node for Contact and Trench Etched Features

Effect of Non-sinusoidal Bias Voltage Waveforms on Ion Energy Distributions and SiO₂/Si Etch Selectivity in Fluorocarbon Plasmas¹

Dielectric Processes Enhancements Using Multifrequency Sheath Modulation

A Novel Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma for Fabrication of Micro-Optical Devices

Surface Kinetics Modeling for Silicon Oxide and OSG Etching in Fluorocarbon Plasmas

Study on Self-aligned Contact Oxide Etching Using C₅F₈/O₂/Ar and C₅F₈/O₂/Ar/CH₂F₂ Plasma

Advanced Inductive Plasma Etcher for Low-k Materials and Oxide

Impact of Vibrational States on Dissociation in Fluorocarbon and Hydrogenated Fluorocarbon Plasmas

Measuring Macro- and Micro-loading Impact on Etch Bias

Study of Refractory Metal Nitrides/HfO₂ Gate Stack Etching Using Inductively Coupled Plasma

Line Width Roughness Reduction for Advanced Metal Gate Etch and STI Etch with 193nm Lithography in a Silicon Decoupled Plasma Source Etcher (DPSII)

Plasma Etching of Metal/High-K Gate Stack

Etching Ruthenium with O2- and Cl2-Containing Inductively Coupled Plasma

Ru Etching Characteristics in Capacitively Coupled Ar/Cl₂/O₂ Plasma

An Isotropic SiGe Etch Process for Fabrication of Silicon-on-Nothing Transistors

X-ray Photoelectron Spectroscopy Study on Walls Coatings and Passivation Layers Generated on Sidewalls Trenches during Shallow Trench Isolation Processes.

The Control of Electrode Impedance, Gas-Injection and Wafer-Temperature Radial Profile and their Effects on Poly-Gate Etching Performance

Process Diagnostics and Optimization in Plasma Etch Chambers Using In-Situ Temperature Metrology

New Mthod to Analyse Chamber Walls Coating during Plasma Etch Processes

Tribological Coatings: Synthesis, Structure, and Properties

New Concepts for Low-friction Coatings

Why do DLC and MoS_x-based Amorphous Coatings Have Similar Friction and Wear Behavior?

In-situ Quantitative Nano-scale Metrology of Thin Coatings

Effect of Impurities and Deposition Condition on the Mechanical Properties of Superhard Nanocomposites with High Thermal Stability

Development of Hybrid Deposition Techniques for Nanocomposite Coating Growth

Growth and Characterization of Zirconium Nitride/Inconel Nanocomposite Structures

Microstructure and Properties of Ti-Al-Si-N Coatings Prepared by r.f.-Reactive Sputtering in Facing Targets-type Sputtering (FTS) System

Surface Reactions and Catalysis

The CO-oxidation Reaction on Pt(111) and Pt(553): The Role of Steps

Controlling the Catalytic Reactivity and Selectivity of Ni Surfaces by Step Blocking

High Pressure Scanning Tunneling Microscopy Study on CO Poisoning of Ethylene Hydrogenation on Metal Single Crystals

Iridium (210): Nanoscale Faceting and Structure-sensitivity of Surface Reactions

Kinetics of Co Oxidation Catalyzed by Supported Iridium Particles in a Wide Pressure Range

High Pressure Methane Activation on Platinum Single Crystal Surfaces

Nanoporous Pd Films Grown Via Ballistic Deposition: Structural And Catalytic Properties

Novel NO Adsorption States on Pd (111) at Elevated Pressures: Irreversibility of the Effects of Temperature and Pressure on Heterogeneous Catalytic Systems

Vapor-Phase Adsorption Kinetics of 1-Decene on Hydrogenated Si(111)

Molecular Monolayers on Single-Crystal and Nanocrystalline Diamond Surfaces

High Resolution Mapping of Compositional Differences and Reactions at Buried Interfaces by Electric Force Microscopy

Chemical Engineering of GaAs Surfaces with Aromatic Self-Assembled Monolayers

Self Assembled Monolayers of Arenethiol Molecules on Cu(111)

Fabricating Self-Assembled Monolayers of Selenolates on Noble Metal Substrates

Interface Electronic Structure of Thiol Terminated Molecules on Metals

Designing Self-assembled Monolayers (SAM) of Thiols: A Study on Lattice Mismatch

Sulfur-induced Nano-restructuring of the Au(111) Surface: A Real-time STM Study

Comparative UHV-STM Study of Adsorption Structures Formed from a Family of Oligo(phenylene ethynylene)s on Au(111)

Mechanisms of Vapor Permeation Through Multilayer Thin-Films

Multi-layered ITO and SiO₂ Thin Films Deposited on Plastic Substrates by Vacuum Arc Plasma Evaporation

Mechanical Performance of Thin Films in Flexible Displays

Structural and Mechanical Properties of Dendrimer-mediated Thin Films

Gas Diffusion Barriers on Polymer Films Using Al₂O₃ Atomic Layer Deposition

Atomic Layer Deposition of Tungsten Disulphide Solid Lubricant Coatings

Molybdenum Atomic Layer Deposition Using MoF₆ and Si₂H₆

Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials

High Reflectivity X-Ray Mirrors from W/Al₂O₃ Nanolaminates Fabricated by Atomic Layer Deposition

Atomic Layer Deposition of Nickel Oxide Films Using Ni(dmamp)₂ and Water