AVS1998 Thursday Morning

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Session Thursday, November 5, 1998
8:20 AM 9:20 AM 10:20 AM 11:20 AM
Resolution Enhancement of XPS Spectra by Maximum Entropy Deconvolution
Evaluation of Calculated and Measured Electron Inelastic Mean Free Paths
Development of Well Defined Reference Samples for ARXPS Depth Profiling Studies
Trajectory Projection Factor Analysis
Quantitative High-Resolution Imaging with Sputter-Initiated Resonance Ionization Spectroscopy
Quantitative Detection of Metals in Organic Matrices by Laser-SNMS
Air-Stable Sulfur-Based Passivation of III-V Compound Semiconductor Surfaces
Development of Surface Morphology During H2 Plasma Processing of GaAs(001)
Thermal Chemistry and Photochemistry of Organothiols Chemisorbed on GaAs(110)
The Surface Structures of InxGa1-xAsyP1-y (001) Films Grown by Metalorganic Vapor-Phase Epitaxy
Low Induced Damages Dry Etching of III-V Materials for HBT Applications using ICP in Chlorinated Plasma
Variable Substrate Temperature for Precise Growth of II-VI Interfaces
Effect of Surface Interactions on Band Offsets at Buried Semiconductor-Insulator Interfaces
Comparison of Morphology and Interfacial Composition of Pd Ultra-thin Films on 6H- and 4H-SiC at Different Annealing Temperatures
Field Emission Studies of BN Overlayers on Various Substrates
Influence of Ammonia Surface Reactions in GaN Chemical Vapor Deposition
Optimization of the Nitridation of Sapphire Substrates Using a Fractional Factorial Designed Experiment
Growth and Characterization of Ba0.6√sub 0.4TiO3 Thin Films on Si with Pt Electrodes
Synthesized Single Crystalline Ba(1-x)√sub xTiO 3 Thin Films for DRAM Application
Scanning Capacitance Imaging for Evaluation of High-k Dielectric Oxide Materials
Characterization of Thermal Annealing of Tantalum Pentoxide for High-k Dielectric Applications
Structural Properties of Ultrathin Films of High Dielectric Constant Materials on Silicon
Etching of High Dielectric Constant Materials for DRAMs and Ferroelectric Materials for FeRAMs
Patterning of Reactively Sputtered Tantalum Pentoxide, a High Epsilon Material, by Plasma Etching
The High Temperature Platinum Etching Using Titanium Layer
Removal of Sidewall Re-depositions Formed by Reactive Ion Etching of Platinum for Embedded DRAM Applications
Study on Surface Reaction of (Ba,Sr)TiO3 Thin Films by High Density Plasma Etching
Magnetic Characterization from Polarized Soft X-ray Scattering
Magnetic Structure of Cr Layers in Fe/Cr(001)Superlattices from X-ray Magnetic Dichroism
On the Nature of Resonant Photoemission in Gd
Combined Spin Polarized Photoemission and Inverse Photoemission of Rare Earth Surface States
X-ray Dichroism Studies of Induced Magnetism in Magnetic Multilayers
A Controversy Over the Magnetic Structure of Mn Overlayers on Fe and the Role of Oxygen Impurities1
Morphology of Mn Films on Fe(001)1
Light Scattering Cross Section for Mode Crossing of Spin Waves in Magnetic Films
RF Monitoring of PECVD Tools in a Manufacturing Environment
Advances in Broadband RF Sensing for Real-time Control of Plasma-Based Semiconductor Processing
NOVA In-Line CMP Metrology and Its Use for Lot-to-Lot Process Control
In Situ CD Measurement during Post Exposure Bake
Process Environment Monitoring of Plasma Etching for Advanced Process Control
Improvement of Process and Equipment Performance Using Online and Real Time Optical Emission Spectroscopy
Multivariate Spectral Analysis of Optical Emission Spectroscopy for use in Low-Open Area Endpoint Detection
Simulations of the Performance of Novel Ion Current Sensors
Fabrication of Nanometer Size Photoresist Wire Patterns with a Silver Nanocrystal Shadowmask
Fabrication and Structuring of Ordered Two-Dimensional Nanopore Arrays in Anodic Alumina
Chemically Assisted Ion-Beam Etching of Submicrometer Features in GaSb-based Quantum Wells
Nanometer-scale Sputter-Induced Rippling of the SiO2 Surface Characterized with Real-Time X-ray Scattering
Materials Considerations for Optical Lithography at the Nanometer Scale
Nanofabrication of Organic Thin Film Materials Using Scanning Probe Lithography
Proximity X-ray Lithography of Siloxane and Polymer Films Containing Benzyl Chloride Functional Groups
Nanofabrication of Apertures for Single Quantum Dot Spectroscopy
Nanolithography and Macromolecular PMMA
Indium Phosphide Nanocrystals formed by Sequential Ion Implantation into Fused Silica
Plasma Processes for Copper Dual Damascene Interconnect in Advanced CMOS Technologies
Low k Dielectric Etching in High Density Plasmas
High Density Plasma Patterning of Organic Low Dielectric Constant Materials
Plasma Deposition of Low-Dielectric-Constant Fluorinated Amorphous Carbon Interlayer Dielectrics
Sources of Asymmetry in Ionized Metal PVD Reactors1
Simulations for Process Optimization Issues in Ionized Metal PVD
Modeling of IMP Copper for Electroplating Seed Layer Application
Metal Flux Ionization Fraction in Copper Ionized Physical Vapor Deposition1
Scattering and Sputtering Processes of Energetic Ar+ and Cu+ Ions on Cu Surfaces: Molecular Dynamics Simulations
Low Energy Electron Microscopy of SEED Growth of GaN Layers
Observation and Nucleation Control of Ge Growth on Si Surfaces using Scanning Reflection Electron Microscopy
Wurtzite GaN Surface Structure Studied by Scanning Tunneling Microscopy and Total Energy Calculations
Low-Energy Electron Microscopy of (0001) Surfaces of GaN Films1,2
Defect-Driven Nucleation Kinetics of GaN Growth on Sapphire(0001)
Site-Selective Reaction of Br2 with the Second Layer Ga Atoms on the As-rich GaAs(001)-2x4 Surface
Peter Mark Memorial Award Address - Morphology of Epitaxial Films during Low Temperature Growth
The Influence of Dislocations on the Intermixing Kinetics of Pd-Au Monolayer Films
The Kinetic Nature of Slope Selection during Unstable Growth
Growth on Cu(100) Using Improved Simulation Algorithm1
The Atomistics of Homoepitaxial Growth on bcc(110)-Surfaces
Probing the Forces Stabilizing Self-Assembled Structures: Dynamics of Vacancy Island Lattices in Ag films on Ru(0001)
STM Study of Ultrathin NaCl(111) Layers on Aluminum
Three-Dimensional SiGe Island Density on Si(001) and Morphology After Si Overgrowth1
Effects of Ion Pretreatments on the Nucleation of Silicon on Silicon Dioxide
Coadsorption Studies with Water: a Small Step Toward Understanding the Surface Chemical and Photochemical Properties of TiO2
HCl Adsorption and Desorption on a Single-Crystal α-Al2O3(0001) Surface
Dissociative Adsorption and Electron Stimulated Desorption of Cl on TiO2(110) Studied by STM, AES and ISS
Photocatalytic Dehydrogenation of 2-Propanol on TiO2(110)
Photo-stimulated NO Adsorption on Metal Oxides
The Reaction of H2S, S2 and SO2 with ZnO and Cu/ZnO Surfaces
Methanol Adsorption and Reactivity at U and UO2 Surfaces
The Chemistry of CeO2(001) and Ce1-xZrxO2(001) Studied by Mass-Spectroscopy of Recoiled Ions
Reduction of Trace Element Contaminants in Aqueous Solution by Iron and Iron Oxides
Formation of Nitro-PAH on Flyash Particle Surfaces: The Significance of Particle Substrate on PAH Nitration
New Dry Etch Applications for Amorphous TFTs in Flat Panel Displays(FPD)
Field Emission and Photo Emission from Si Micro Tip Arrays Coated with Bias-Grown Diamond Films
Hydrogen Concentration Distribution in Plasma Deposited Hydrogenated Amorphous Silicon and Silicon Nitride Films
Poly-Si Thin Film Transistors Fabricated on Low Temperature Plastic Substrates
Stability of Very Low Temperature Amorphous Silicon Thin Film Transistors on Flexible Plastic Substrates
Advanced Deposition Technique for Producing Thin Films of Polycrystalline Silicon
Polycrystalline Silicon Films Deposited Directly on Glass by Reactive Magnetron Sputtering Using a Microcrystalline Silicon Nucleation Layer
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