An Overview of the Applications of Surface Analysis Techniques in Semiconductor Technology

An Evaluation of SIMS Analytical Capabilities For Sub-0.25 Micron Implant Technology

Accurate Dynamic Secondary Ion Mass Spectrometry (SIMS) and Auger Electron Spectroscopy (AES) Characterization of SiGe Stoichiometry and Hetero-Junction Bipolar Transistor (HBT) Dopant Levels

A Comparison Auger and TOF-SIMS Depth Profiling of Silicon Oxide Nitride Multilayers Using Low Incident Ion Energy

A New High Performance TOF-SIMS Instrument for 300 mm Wafer Inspection

Automated Process Monitoring Using ESCA and Numerical Methods

Measurement of Carrier Concentration and Lattice Absorption in Bulk and Epitaxial Silicon Carbide Using Infrared Ellipsometry

Si Dopant Site Within Ion Implanted GaN Lattice

Laser Assisted Etching of InP Studied with XPS

Optical, Structural, and Morphological Properties of Epitaxial Al_xGa_(1-x)N(0001) Films Grown by Gas-Source Molecular Beam Epitaxy

Investigation of High Temperature Characteristics of Metal-Insulator-Semiconductor Diode Structures Fabricated Using BN Layers Grown on GaN and SiC

Chemical Beam Epitaxy of GaAsN on GaAs (100)

InP Photocathode Surface Preparation by Atomic Hydrogen Cleaning

Deposition and Electroluminescent Properties of Sputter Deposited Zn(x)Mg(1-x)S:Mn

Small Area XPS Analysis of Silicon Wafers Employing Cu Line Technology

Epitaxial Ferroelectric Ba_{(1-x)√sub x}TiO₃ Thin Films for Tunable Microwave Devices

Reaction Pathways/Energetics for Chemical Attack of Amorphous Si-O-F and C-F-(H,OH) Low-k Dielectric Thin Films by Water Molecules

Carbon Incorporation in SiGeC Alloys Grown by UHV/CVD

XPS Study of the Role of Ti and TiN Caps on the Cobalt / SiO₂ Interface

Magnetization Dynamics: A Study of the Ferromagnet/Antiferromagnet Interface and Exchange Biasing

Switching Field Measurements of Longitudinal Magnetic Recording Media

Magnetic Properties of Submicron Magnetic Wires Fabricated by e-beam Lithography Investigated by using GMR Effect

Magnetic Reversal on Vicinal Surfaces

Magneto-optics: Science and Technology

Magnetism of Oxide NiO/αFe₂O₃ Multilayers Studied by Magneto-Optical Faraday Effect

Magnetooptical Characterization of Layered Structures using Variable Angle of Incidence Generalized Magnetooptical Ellipsometry (VA-GME)

Magnetization Induced Optical Second Harmonic Generation as a Readout of Thin Film Magnetic Memories

Nanoscale Variations in Surface Potentials at Interfaces

Noncontact Measurement of Electrical Dissipation using Ultrasensitive Cantilevers

Nanocalorimetry for Thermodynamic Measurements of Nanostructures

Recent Advances in Scanning Capacitance Microscopy

Nanometer-scale Electrical Characterization of Semiconductor with a Scanning Capacitance Microscope

A Study on the Post-stress Charges in SiO₂ Films on Si by Scanning Capacitance Microscope

Imaging Buried Interfacial Lattices with Quantized Electrons

Nanoparticle Near-Field Spectroscopy by a Microscopically Narrow (Subnanometer) Electron-Beam

Challenges for Real-Time Control in Reactive Semiconductor Manufacturing Process Environments

Reaction Analysis and Rate Metrology of Selective Area Silicon PECVD using In-Situ Real-time Mass Spectroscopic Sensing and Mass Balance Modeling

Sensor Integration on a W-CVD Cluster Tool for Real-Time Process Monitoring and Control

In situ Measurement of Moisture Contamination in Reactive Process Atmospheres

RGA Process Monitoring in Semiconductor Manufacturing

Process Monitoring of Chemical Vapor Deposition Systems by In-situ Gas Analysis

Large Enhancement of Silicon Etch Rate by Metal Contamination

Laser Detection of Chlorinated Neutral Etch Products During Cl₂ / Ar⁺ Etching of Si(100)

Recombination of Halogen Atoms on Surfaces

Removal of Si-O, Si-C and Si-F by Hydrogen Bake after Reactive Ion Etching on the Silicon Surface

Characterisation of Self-aligned Contact Etch Processes using X-ray Photoelectron Spectroscopy, Time-Of-Flight SIMS, and Optical Emission Spectroscopy

Experimental Investigation of the Respective Roles of Oxygen Atoms and Electrons in the PECVD Deposition of SiO₂ in O₂/TEOS Helicon Plasmas

Surface Chemistry Mechanism of Oxide Etching by High Density C₂F₆ Plasma

Large Positive Silicon Ion Clusters in a Remote Silane Plasma

Surface Chemistry of NF₃ Plasma and Si Surface Interaction

Operating High Density Plasmas in a Low Density Range : Applications to Metal Etch Processes

Ultrathin Metal Films on W(111) and W(211): Nanoscale Faceting, Structure, Electronic Properties, and Reactivity¹

Determination of Thin Film Interface Structure by the Quantum Size Effect in Electron Reflectivity

Interaction of Dislocations on Strained Metal Films

Low Energy Electron Microscope Measurements of Oxygen-Induced Strain Relief on Si(001)

The Strain Effect on Ge-covered Si(001) Surface

Spontaneous Domain Formation on Ge(001)

New Results for Analytical Approximants of Terrace-Width Distributions on Vicinal Surfaces, and Some Consequences¹

Enantiospecific Adsorption of Chiral Hydrocarbons on Naturally Chiral Pt and Cu Surfaces

Xe Adsorption Sites on Metal Surfaces

A NIXSW Study of the InP(001)-(4x2) and InP(001)-(1x1)-Cl Surfaces

Dielectric Response and Ionization of Water Adlayers in High Electric Fields: Calculations and Experiments

Crystallization Kinetics of Amorphous Solid Water: The Effect of Underlying Substrate

A Study of Amorphous Solid Water (ASW) Morphology using N₂ Gas Adsorption and Thermal Desorption

Origin of Non-Zero-Order H₂O Desorption Kinetics from Crystalline Ice Multilayers on Ru(001)

Low Energy Dynamics through the Verwey Transition : Water Adsorbed on Fe₃O₄(100)/MgO(100)

Surface Restructuring of Magnesium Oxide at the Interface with Water

Interaction of Water and Dimethyl Sulfoxide with Gold Surfaces

Coadsorption of Water and Hydrogen on Pt(110)

Equilibrium Water Structures at Well-Defined Organic Surfaces

Effect of Boron on the Surface Chemistry of Single Crystal Ni₃(Al,Ti)

Interactions of 50-2500 eV Electrons with Ice

Annealing of Copper Electrodeposits

Polymerized C-Si Films on Metal Substrates: Cu Adhesion/Diffusion Barriers for ULSI?

Ultra High Rate, Wide Area, Plasma Polymerized Films from High Molecular Weight/Low Vapor Pressure Liquid or Solid Monomer Precursors

Effects of Temperature (350 - 25°C) on OH Incorporation and Electrical Performance of Plasma Deposited Silicon Dioxide Thin Films for Applications on Plastic Substrates

Structural and Electrical Properties of SrTiO₃ Thin Films Prepared by Plasma Enhanced MOCVD

Thermal Stability of MOCVD TiN/PECVD SiOF Interface for Cu Metallization

Assessment of As-deposited Polycrystalline Silicon Films on Polymer Substrates using ECR-PECVD

A Novel Method For Determining Kinetic Rate Expressions For CVD Processes Using a Combination of Step Coverage Measurements and Computer Simulation