AVS1998 Friday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Friday, November 6, 1998 | ||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|
| 8:20 AM | 9:20 AM | 10:20 AM | 11:20 AM | ||||||||
| AS+ |
An Overview of the Applications of Surface Analysis Techniques in Semiconductor Technology
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An Evaluation of SIMS Analytical Capabilities For Sub-0.25 Micron Implant Technology
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Accurate Dynamic Secondary Ion Mass Spectrometry (SIMS) and Auger Electron Spectroscopy (AES) Characterization of SiGe Stoichiometry and Hetero-Junction Bipolar Transistor (HBT) Dopant Levels
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A Comparison Auger and TOF-SIMS Depth Profiling of Silicon Oxide Nitride Multilayers Using Low Incident Ion Energy
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A New High Performance TOF-SIMS Instrument for 300 mm Wafer Inspection
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Automated Process Monitoring Using ESCA and Numerical Methods
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Measurement of Carrier Concentration and Lattice Absorption in Bulk and Epitaxial Silicon Carbide Using Infrared Ellipsometry
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Si Dopant Site Within Ion Implanted GaN Lattice
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Laser Assisted Etching of InP Studied with XPS
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| EM-FrM |
Optical, Structural, and Morphological Properties of Epitaxial AlxGa(1-x)N(0001) Films Grown by Gas-Source Molecular Beam Epitaxy
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Investigation of High Temperature Characteristics of Metal-Insulator-Semiconductor Diode Structures Fabricated Using BN Layers Grown on GaN and SiC
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Chemical Beam Epitaxy of GaAsN on GaAs (100)
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InP Photocathode Surface Preparation by Atomic Hydrogen Cleaning
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Deposition and Electroluminescent Properties of Sputter Deposited Zn(x)Mg(1-x)S:Mn
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Small Area XPS Analysis of Silicon Wafers Employing Cu Line Technology
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Epitaxial Ferroelectric Ba(1-x)√sub xTiO3 Thin Films for Tunable Microwave Devices
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Reaction Pathways/Energetics for Chemical Attack of Amorphous Si-O-F and C-F-(H,OH) Low-k Dielectric Thin Films by Water Molecules
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Carbon Incorporation in SiGeC Alloys Grown by UHV/CVD
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XPS Study of the Role of Ti and TiN Caps on the Cobalt / SiO2 Interface
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| MI-FrM |
Magnetization Dynamics: A Study of the Ferromagnet/Antiferromagnet Interface and Exchange Biasing
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Switching Field Measurements of Longitudinal Magnetic Recording Media
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Magnetic Properties of Submicron Magnetic Wires Fabricated by e-beam Lithography Investigated by using GMR Effect
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Magnetic Reversal on Vicinal Surfaces
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Magneto-optics: Science and Technology
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Magnetism of Oxide NiO/αFe2O3 Multilayers Studied by Magneto-Optical Faraday Effect
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Magnetooptical Characterization of Layered Structures using Variable Angle of Incidence Generalized Magnetooptical Ellipsometry (VA-GME)
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Magnetization Induced Optical Second Harmonic Generation as a Readout of Thin Film Magnetic Memories
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| NS+ |
Nanoscale Variations in Surface Potentials at Interfaces
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Noncontact Measurement of Electrical Dissipation using Ultrasensitive Cantilevers
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Nanocalorimetry for Thermodynamic Measurements of Nanostructures
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Recent Advances in Scanning Capacitance Microscopy
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Nanometer-scale Electrical Characterization of Semiconductor with a Scanning Capacitance Microscope
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A Study on the Post-stress Charges in SiO2 Films on Si by Scanning Capacitance Microscope
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Imaging Buried Interfacial Lattices with Quantized Electrons
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Nanoparticle Near-Field Spectroscopy by a Microscopically Narrow (Subnanometer) Electron-Beam
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| PC-FrM |
Challenges for Real-Time Control in Reactive Semiconductor Manufacturing Process Environments
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Reaction Analysis and Rate Metrology of Selective Area Silicon PECVD using In-Situ Real-time Mass Spectroscopic Sensing and Mass Balance Modeling
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Sensor Integration on a W-CVD Cluster Tool for Real-Time Process Monitoring and Control
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In situ Measurement of Moisture Contamination in Reactive Process Atmospheres
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RGA Process Monitoring in Semiconductor Manufacturing
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Process Monitoring of Chemical Vapor Deposition Systems by In-situ Gas Analysis
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| PS-FrM |
Large Enhancement of Silicon Etch Rate by Metal Contamination
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Laser Detection of Chlorinated Neutral Etch Products During Cl2 / Ar+ Etching of Si(100)
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Recombination of Halogen Atoms on Surfaces
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Removal of Si-O, Si-C and Si-F by Hydrogen Bake after Reactive Ion Etching on the Silicon Surface
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Characterisation of Self-aligned Contact Etch Processes using X-ray Photoelectron Spectroscopy, Time-Of-Flight SIMS, and Optical Emission Spectroscopy
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Experimental Investigation of the Respective Roles of Oxygen Atoms and Electrons in the PECVD Deposition of SiO2 in O2/TEOS Helicon Plasmas
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Surface Chemistry Mechanism of Oxide Etching by High Density C2F6 Plasma
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Large Positive Silicon Ion Clusters in a Remote Silane Plasma
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Surface Chemistry of NF3 Plasma and Si Surface Interaction
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Operating High Density Plasmas in a Low Density Range : Applications to Metal Etch Processes
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| SS1-FrM |
Ultrathin Metal Films on W(111) and W(211): Nanoscale Faceting, Structure, Electronic Properties, and Reactivity1
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Determination of Thin Film Interface Structure by the Quantum Size Effect in Electron Reflectivity
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Interaction of Dislocations on Strained Metal Films
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Low Energy Electron Microscope Measurements of Oxygen-Induced Strain Relief on Si(001)
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The Strain Effect on Ge-covered Si(001) Surface
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Spontaneous Domain Formation on Ge(001)
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New Results for Analytical Approximants of Terrace-Width Distributions on Vicinal Surfaces, and Some Consequences1
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Enantiospecific Adsorption of Chiral Hydrocarbons on Naturally Chiral Pt and Cu Surfaces
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Xe Adsorption Sites on Metal Surfaces
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A NIXSW Study of the InP(001)-(4x2) and InP(001)-(1x1)-Cl Surfaces
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| SS2-FrM |
Dielectric Response and Ionization of Water Adlayers in High Electric Fields: Calculations and Experiments
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Crystallization Kinetics of Amorphous Solid Water: The Effect of Underlying Substrate
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A Study of Amorphous Solid Water (ASW) Morphology using N2 Gas Adsorption and Thermal Desorption
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Origin of Non-Zero-Order H2O Desorption Kinetics from Crystalline Ice Multilayers on Ru(001)
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Low Energy Dynamics through the Verwey Transition : Water Adsorbed on Fe3O4(100)/MgO(100)
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Surface Restructuring of Magnesium Oxide at the Interface with Water
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Interaction of Water and Dimethyl Sulfoxide with Gold Surfaces
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Coadsorption of Water and Hydrogen on Pt(110)
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Equilibrium Water Structures at Well-Defined Organic Surfaces
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Effect of Boron on the Surface Chemistry of Single Crystal Ni3(Al,Ti)
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Interactions of 50-2500 eV Electrons with Ice
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| TF-FrM |
Annealing of Copper Electrodeposits
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Polymerized C-Si Films on Metal Substrates: Cu Adhesion/Diffusion Barriers for ULSI?
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Ultra High Rate, Wide Area, Plasma Polymerized Films from High Molecular Weight/Low Vapor Pressure Liquid or Solid Monomer Precursors
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Effects of Temperature (350 - 25°C) on OH Incorporation and Electrical Performance of Plasma Deposited Silicon Dioxide Thin Films for Applications on Plastic Substrates
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Structural and Electrical Properties of SrTiO3 Thin Films Prepared by Plasma Enhanced MOCVD
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Thermal Stability of MOCVD TiN/PECVD SiOF Interface for Cu Metallization
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Assessment of As-deposited Polycrystalline Silicon Films on Polymer Substrates using ECR-PECVD
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A Novel Method For Determining Kinetic Rate Expressions For CVD Processes Using a Combination of Step Coverage Measurements and Computer Simulation
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