AVS1997 Wednesday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
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| Session | Wednesday, October 22, 1997 | ||||||||||
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| 2:00 PM | 3:00 PM | 4:00 PM | 5:00 PM | ||||||||
| AS-WeA |
Radiation Damage in Zirconium Oxide
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Ion Scattering Studies of Epitaxially Grown Iron Oxide Films on MgO and Al2O3 Substrates
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Valence Band X-Ray Photoemission Investigation of Surface Cleanliness of Aluminum Metal and its Alloys.
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The Valence Region in Photoelectron Spectroscopy: A New Approach to Chemical Information for Non Conductive Systems
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Self Texture in the Initial Stages of Zinc Oxide Film Growth
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Surface Structure and Dynamycs of KTaO3 by Helium Atom Scattering.
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SIMS Measurements of Mobile Ion Concentration Depth Profile in Insulating Layers
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High Resolution XPS Investigations of the Interactions of a Resole Phenolic Resin Matrix with Silanised E-glass Surfaces
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Surface Characterization of Passivation Films on Aluminum
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| BI-WeA |
The Neuron-Silicon Junction and Beyond.
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Reagentless Biosensors Based on Molecular Recognition and Transduction at Self-Assembled Monolayers
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Reversible Blocking of Ligand Binding to Streptavidin with Stimuli-Responsive Polymers.
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A New Method for Patterning Antibodies onto a Surface
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Grafting Polyethylene Glycol on Surfaces to Create Biocompatible Coatings
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Diffusion in Microfluidic Systems
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Stabilization of Self-Assembled Monolayers on Glass and Silicon
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In situ Two-Color Surface Plasmon Resonance Spectroscopy of Biopolymer Film Formation at Solid/Liquid Interfaces
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| EM+ |
Light Emitters Based on Organic Thin Films Deposited in Vacuum
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Enhancing the Brightness, Efficiency and Color Purity in Organic Electroluminescent Devices with Al Cathode.
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New Developments in the Photonic Applications of Conjugated Polymers
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Recent Progress of Organic Electroluminescent Materials and Devices
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Conjugated Oligothiophenes, a New Class of Organic Semiconductors and Laser Crystals
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High-Mobiilty and Liquid-Phase-Processable Organic TFT Semiconductors
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Analysis of a Nanoscopic Field Effect Transistor based on Metallization of a Molecular Layer
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Photoemission Spectroscopy Analysis and Organic Light Emitting Material*
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| MI+ |
Sigma's and Cpk's - Process Challenges in Thin-Film Disk Technology
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Interfacial Interactions of Perfluoropolyether Lubricants with Amorphous Carbon Surfaces
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Processing Issues in Magnetic Recording Technology
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Development of ECR and ICP High Density Plasma Etching for Patterning of NiFe and NiFeCo
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Reactive Plasma Etching of Magnetic Head Materials
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Macromagnetic Properties of CoPt12Cr13 Thin Films
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Thin-Film, Extreme-High Vacuum System
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| MM+ |
Antistiction Processes in Surface Micromachines
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Friction and Durability of Silicon Surfaces Treated with Silane-Based Coupling Agents1
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Diamond Surface Modification for MEMS
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Contact Resistance Performance of Electrostatically Actuated Microswitches
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Advances in Systems Integration
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Electroosmotic and Electrophoretic Integrated Fluidics
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A Micromachined Differential Scanning Calorimeter
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| NS-WeA |
Temperature Controlled INCISIVE Tips on Piezoresistive Atomic-Force-Microscope Cantilevers
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Nano-Mechanical Structures in Single Crystal Silicon
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Using Nanoscale Science with Micromechanics as Ultimate Limit Sensors
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Design, Fabrication and Testing of a Wafer-Scale Manufactured Tunneling Infrared Sensor.
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| PS-WeA |
High Density Plasma Oxide Etching: Expectations Versus Reality
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Photoresist Erosion Characteristics in Low Pressure, High Density Plasmas used for Selective Etching of Silicon Dioxide
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Oxide Etch Rate and Photoresist Selectivity in a High Density, Inductively Coupled Plasma Reactor
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Aspect Ratio Independent Etching of Dielectrics
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Chemical Topography of Selfaligned Contact Structures Etched in a Magnetically Enhanced Reactive Ion Etching System using C4F8/CO Gas Mixtures.
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Selectivity Change in Self Aligned Contact Ethcing
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Contact Etch Scaling with Contact Dimension
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Mechanistic Studies of Highly Selective Etching of Silicon Dioxide Over Silicon Nitride in Inductively Coupled Fluorocarbon Plasmas
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Flow Rate Rule for High Aspect Ratio SiO2 Hole Etching
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| SS-WeA |
Resonant Photoelectron Spectroscopy of K-intercalated MoS2
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The Cs/MoS2(0002) Electron Donor-Acceptor Complex: Element-, Orbital- and Site Specific Information Obtained by High Resolution X-ray Photoemission Spectroscopy
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Theory of Silica Surfaces and Processes
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New Method for the Observation of Interface States: XPS Measurements under Biases
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Surface Metallic Behaviour in Icosahedral Quasicrystals
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Thickness Dependence of Work Function for Pd/Cu(111) and Au/Cu(111) Studied by STM
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Fermi Surface and Electronic Structure of a Surface Charge-Density-Wave: Pb/Ge(111)
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Novel Electronic and Magnetic Properties of Ultra-thin Chromium Oxide Films Grown on Pt(111)
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Molecular Adsorption and Defect Creation on Thin Metal Oxide Films Studied with MIES and UPS(HeI)
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| SS1-WeA |
Synthesis of Ammonia over a Ruthenium Single Crystal
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The Catalytic Chemistry of Small Hydrocarbons on Palladium and Oxygen-Modified Molybdenum.
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Mechanism and Kinetics of Methanol Synthesis over a Zn-promoted Cu(111) Surface
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CO Oxidation Over Model Au/TiO2 Catalysts
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Realistic Surface Science Models of Industrial Catalysts
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Nanofabrication of Model Catalysts
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Preparation of Supported Nanoparticles on Thin Oxide Substrates.
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Reaction-induced Surface and Structural Changes in Perovskite Catalysts for Oxidative Dehydrogenation of Alkanes
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Synthesis and Characterization of Nickel Sulfide Catalysts
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| SS2-WeA |
Accurate Cluster-Based Methods of Modeling Photoelectron Diffraction Data: Comparisons and Applications to Adsorption and Epitaxial Growth
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Interaction of Se with Si(111): A Photoelectron Diffraction Study
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Atomic Structural Model of Ga:Si(112): Theory and Experiment
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Alkali Metal Adsorption on Cleaved Si(111): A LEED and Photoemission Study of New Surface Phases
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Magnetic Surface-Alloy Structure Determination by Photoelectron Holography, Surface X-ray Diffraction, and Quantitative Photoelectron Diffraction
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Photoelectron Diffraction as a Contrast Mechanism and a Crystallographically-Sensitive Tool in Electron Microscopy
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Genetic Algorithms and Parallel Computing for the Global Search in Complex Surface Structure Determination by LEED
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Adsorption Structures on Co(0001)
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| TF1-WeA |
New Observations on the Effect of HF Exposure on the Mechanical Properties of Polysilicon Thin Films
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Synthesis and Characterization of BN and BCN Thin Films
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A Hardness Enhancement by Compositionally Modulated Structure of TiN/Ti Multilayer Films
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Morphological Instability in InAs/GaSb Heterostructures
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Surface Characterization of Single Crystal ZnO and Nanocrystlline ZnO Thin Films Using Atomic Force Microscopy and Lateral Force Microscopy.
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Effects of Ta Crystallites at the TaAl/Al-Cu Interface of Hyper-Texture Aluminum
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Micromechanical Properties of Silicate-Glass Films on Sapphire Substrates
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Residual Stress Effects on Adhesion and Fracture of Thin Electronic Ceramic Films.
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Microstructural Effects on the Strength of Diamond Thin Films
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| TF2-WeA |
Application of In-Situ Mass Spectroscopy of Recoil Ions for MBE Growth of GaN Thin Films
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In Situ Real-Time Studies of AlN and GaN Growth by Low-Energy Electron Microscopy (LEEM)
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Determination of Slowly Varying Refractive Index Profiles from In Situ Spectrophotometric Measurements
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In Situ Sputter Deposition Plasma Charaterization for Tailoring Ceramic Film Growth
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Characterization by Real Time Spectroscopic Ellipsometry of Carbon and SiC Thin Films Grown by Pulsed Laser Deposition
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Metalorganic Chemical Vapor Deposition of Tin Oxide in the Environmental Scanning Electron Microscope Chamber
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Quantitative Analysis of Real Time In Situ Infrared Spectra for the Study of Surface Reactions: Theory and Experiments.
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Temperature Induced Phase Transitions in Polystyrene Films and Colloid Particles Studied with a Quartz Crystal Microbalance
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| VT-WeA |
A Miniature Quadrupole RGA For Process Monitoring At Millitorr Pressures
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Response Time and Sensitivity Optimization of Faraday Cup Equipped Miniature Quadrupole Mass Spectrometers
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High Resolution Quadrupole Mass Spectrometry Through Operation Using Alternate Mathieu Stability Regions
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Advances In Partial Pressure Measurements for Semiconductor Processes
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Stable Cancellation of X-Ray Errors in Bayard-Alpert Gauges
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A New Standard for Low-Pressure Gauges
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Orifice Flow Calibration of Ion Gages for Industrial Use
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Pushing the Spinning Rotor Gauge Sensitivity by a Compression Stage
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Application of Calculated Physical Adsorption Isotherms to a Radon Sensor
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