ALD/ALE 2024 Wednesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Wednesday, August 7, 2024 | |||||||||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
8:00 AM | 9:00 AM | 10:00 AM | 11:00 AM | |||||||||||||
AA1-WeM |
Ferroelectric Doped HfO2: From Ald Processing to Device Applications
|
Interfacial Layer Engineering by Tungsten Oxide for Ferroelectric La-Doped Hf0.5Zr0.5O2 Layer
|
Ultrathin HfO2–ZrO2 Multilayers Structures by ALD for Embedded Ferroelectric Non-Volatile Memories
|
Effects of Gamma Radiation on the Electrical and Structural Properties of Ferroelectric Hafnium Oxide-Based Capacitors
|
Enhancement of Ferroelectric Phase Formation of HfO2/ZrO2 Nanolaminate Films by Tuning HfO2 and ZrO2 Thicknesses Using Atomic Layer Deposition
|
Investigating the Impact of Process Parameters on the In-plane Strain of Ultra-Thin HfxZr1-xO2 Films
|
Thermal ALD IGO Channel Layer with High-thermal Stability (> 800 oC) for New Hybrid (Poly-Si/IGO) Vertical 3D NAND Application
|
Break & Exhibits
|
||||||||
AA2-WeM |
Towards Neuromorphic Computing Using ALD Grown HfO2 Based Memristive Devices
|
Novel Carbon-Doped HfOx Memristor with Born-ON Characteristics Synthesized via ALD/MLD Combined Technique
|
Evolution of Structural Order in Doped Hafnia Thin Films by Atomic Layer Deposition for Emerging Device Applications
|
ALD HfZrO2 Films from Ferroelectric to High-k Applications
|
||||||||||||
AA3-WeM |
Tunable Superconducting NbxTi1-xN by Fast Plasma-enhanced ALD for Quantum Applications
|
Atomic Layer Deposited Metal Nitrides (TiN and InN) and Metal Semiconductor Heterojunctions for Quantum Applications
|
Ceramic Thin-Film Composite Membranes with Tunable Subnanometer Pores for Molecular Sieving by Atomic Layer Deposition
|
Recent Developments and Emerging Applications in Atmospheric-Pressure Atomic Layer Deposition of High-Porosity Materials
|
Modulation Acceptor Doping of Silicon Nanowires using a SiO2-shell doped with ALD Metal Oxide Monolayers
|
|||||||||||
AF1-WeM |
Conformality of Ternary Oxides by Spatial ALD: Monte Carlo Simulations and Experimental Study
|
Reusable Macroscopic HAR Test Kit Enabling Fast, Routine Characterization of Film Conformality
|
Superconformal ALD Using a Heavy Inert Diffusion Additive
|
Ald of Alumina-Silica Multilayers on Carbon Microfiber Fabrics: Microstructure and Potential as Refractory Oxygen Diffusion Barriers
|
Pillarhall Lateral High Aspect Ratio Assisted Unveiling of Secondary Growth Front and Background Reaction Mechanism in Atomic Layer Deposition
|
Helium Ion Microscopy on ALD Thin Films
|
Understanding the Amorphous Structure of Al- and Zn- Doped TiO2 with an Automated 4D-STEM Analysis Pipeline
|
Non-Destructive Characterization of ALD Thin Films Using Angle-resolved XPS and Structure Modeling
|
Break & Exhibits
|
|||||||
AF2-WeM |
Low-Temperature ALD of Metallic Cobalt for 3D Structures
|
Towards Deposition of Metallic Molybdenum Films from Molybdenum Hexacarbonyl in a Process Involving an Intermediate ALD Step and Subsequent Reduction
|
Growth of Metallic Ru Film by Oxidant-Free Atomic Layer Deposition Below 100 °C
|
Unveiling the Effect of the Starting Precursor on Ge2Sb2Te5 Atomic Layer Deposition
|
Atomic Layer Deposition Equipment Vendors Market and Technology
|
|||||||||||
ALE1-WeM |
Anisotropic and Isotropic Plasma-Enhanced Atomic Layer Etching Processes for Metals and Dielectric Materials for Semiconductor Devices
|
Plasma Atomic Layer Etching of Titanium Nitride with Surface Fluorination or Chlorination and Ar Ion Bombardment
|
Isotropic Plasma Atomic Layer Etching of Nickel Aluminide Binary Intermetallic Using a Super-Cycle Sequence Based on Hhfac and Al(CH3)3
|
Surface Effects in Quasi-ALE of Si: A Correlation with Ar+ Ion Energy
|
Atomic Layer Etching Study of Polycrystalline, Epitaxial and Doped ZnO Films Using in Situ Spectroscopic Ellipsometry
|
Atomic Layer Etching of Diamond for Epitaxy Preparation
|
Break & Exhibits
|
|||||||||
ALE2-WeM |
Interest and Potential of Atomic Layer Etching for Selective Deposition
|
Insight into SF6/H2 Plasma Mixtures to Expand the Capabilities of ALE
|
Retarding-Field Energy Analyzer as a Tool to Find the Process Window for Plasma-Assisted Atomic Layer Etching and Quasi-Atomic Layer Etching
|
|||||||||||||
EM-WeM |
Resolving Composition and Crystal Structure of Fundamentally Novel MOF-Like Fe-Terephthalate Thin Films
|
Molecular Layer Deposition of Metal Organophosphonate Thin Films
|
Europium-Organic Luminescent Thin Films for Bioimiging Applications
|
ALD Young Investigator Award Finalist Talk: Inverted Living Molecular Layer Deposition: An Empowering Technique for Biomedical Applications
|
Hybrid Multilayer EUV Photoresist with Vertical Molecular Wire Structure
|
Chemical Transformations Mediated by Low-Energy Electrons within Vapor Phase Synthesized Al-based Hybrid Thin Films for Advanced Resist Applications: An In-Situ Investigation
|
Molecular Layer Deposition of Phosphorus Thin Films Using Bis-α-aminophosphine Chemistry
|
Break & Exhibits
|