ALD/ALE 2024 Monday Afternoon

Enabling Fast Charging of Lithium-ion Batteries at Sub-Zero Temperatures with ALD coatings

Atomic Layer Deposition of Lithium Borate and Borophosphate Thin Films for Lithium-ion Battery Applications

Fluorine-free ALD Process Produces Fluorine-rich Cathode Electrolyte Interphase for Lithium Batteries

Atomic Layer Deposition of Interface-Engineered Li₄Ti₅O₁₂: Toward High-Capacity 3D Thin-Film Batteries

ALD for Advanced Lithionic Devices: Hybrid Ultrathin Solid-State Electrolytes

Low Temperature ALD of Vanadium Sulfide (Ultra)thin Films for Nanotubular Supercapacitors

Boosted Zn²⁺ Storage Performance of Hydrated V₂O₅ by Defect and Heterostructure

High Throughput Atomic Layer Deposition of Niobium Oxide Thin Film for Lithium-ion Battery Application

Thermal Atomic Layer Deposition of Boron Containing Oxide Films as Solid Sources for Doping of Advanced Memory Devices

Plasma-Enhanced ALD of Thin Conductive Cu Films

Selective Atomic Layer Deposition of Ultra-Thin Ru on W for Metal Contact

Effect of High Precursor Dose on the IZO Film Property Uniformity Within Wafer Deposited by Thermal ALD

Development of ALD Gate Dielectrics for TMD Nanosheet FETs

ALD in Semiconductor Logic Manufacturing: Challenges Met and Opportunities Ahead

ALD of Copper and Bismuth Using Pinacolborane as a Reducing Agent

Ligand Optimization of Volatile Cobalt-Alkoxide ALD Precursor

Expanding the tert-Butylimido Framework Beyond Molybdenum: New Refractory Metals and Ligands

Alkoxide Complexes as Precursors for Coinage Metal and Main Group Element Thermal ALD

Fluorinated Silver Alkoxides as Precursors for Atomic Layer Deposition

Atomic Layer Deposition of Niobium Carbonitride Thin Films

Using ALD Precursors as Inhibitors During Area-selective ALD

ALD Student Award Finalist Talk: Gas Phase Deposition of ALF-MOF for Selective CΟ₂ Capture: A Molecular Layer Deposition Study

ALD Student Award Finalist Talk: Surface Functionalization of Poly-Si and SiO₂ Nongrowth Surfaces with Small Inhibitor Molecules to Enable Area-Selective Atomic Layer Deposition of Al₂O₃

ALE Student Award Finalist Talk: Precursor Mobility Through W Thin Films and sub-Surface Etching of Patterned TiO₂ via Atomic Layer Etching

ALD Student Award Finalist Talk: Unravelling the Role of Stoichiometry of ALD Nickel Cobalt Oxides on their Electrocatalytic Activity

ALD Student Award Finalist Talk: First-Principles Screening of Precursor Reactivity for ALD of GeAsSe Thin Films for OTS Applications

ALE Student Award Finalist Talk: Investigating Patterning of MgZnO by Atomic Layer Etch mode, used For Compute and Memory Applications

ALD Student Award Finalist Talk: In-situ FTIR Study of Oxygen Source Mixing for Hafnium Oxide Atomic Layer Deposition on Titanium Nitride

ALD Student Award Finalist Talk: A New Low Temperature ALD Process for Magnesium Oxide

Highly Selective Si Vertical Etching Enabled by Atomic-Level Process Utilizing SiCl₄ Plasma-Induced Selective Deposition

Quasi-ALE Process Transfer from Lab to 300mm Line and Its Optimisation

Deposition and Etchback Approach for Ultrathin ZrO₂ Coatings on TiO₂/ZrO₂ Core/Shell Nanoparticles

Study of Depositing Si₃N₄ on Si Wafers Using PEALD and Atomic Scale Removal of Underlying Native Oxide Using PAALE in the Same Chamber Without Ion Bombardment Damage

N-Heterocyclic Carbenes for Area Selective Atomic Smoothing

Revealing New AS-ALD Chemistries with Ab Initio Approaches: From Interpretation to Prediction

Area Selective Atomic Layer Deposition Using a Size Cutter

ALD Young Investigator Award Finalist Talk: ALD Grown Self-Assembled Monolayers: Using Area-Selective Deposition to Characterize Molecular Scale Pinholes

Area-Selective Etching of Poly(lactic acid) via Hydrogenolysis for Self-Aligned ALD

Selective Surface Fluorination to Enable ASD of Polymer and Metal Oxide on SiN vs. SiO₂