3D Integrated Device Applications of ALD-Grown Ferroelectric and Oxide-Semiconductor Materials

Cross-Point Metal-Ferroelectric-Metal Capacitors Array for Compute-in-Memory Applications

Using ALD to Precisely Place Multiple Transition Metal Impurities to Defect Engineer MIM Diode Performance

The Impact of Oxygen Source on the Formation of TiN Interface at the Initial Stage ALD process of Hafnia-based Ferroelectrics: An in-situ Analysis

Performance Enhancement in HZO Based Ferroelectric Memory Devices

Stabilization of Tetragonal Phase of Ti-doped ZrO₂ Deposited by ALD

Three Terminal Synaptic Devices Employing ALD Grown Dual Dielectrics and Their Linear Learning Process

Opportunity of Atomic Scaled Materials in Revolutionary Memory Technologies

Ultra High-k HfZrO₄ Thin Films Grown by Atomic Layer Deposition using Metal-Organic and Brute HOOH Precursors

Achieving Ultra-High Mobility and Reliability of ALD-IGZO TFTs via Selective N2O Plasma Reactant for BEOL Applications

Ultrathin and Highly Crystalline Indium Oxide Thin Films Using Novel Liquid In Precursor as a New Channel Material

Measuring the Time-Resolved Heat of ALD Surface Reactions

HfO₂ ALD on Si(111) - A Mechanistic in-Situ Study through Time-resolved APXPS

In Situ Reflection High Energy Electron Diffraction Investigations of Epitaxial Growth and Crystallization of Gallium Oxide Thin Films

Surface and Film Stress during ALD of Al₂O₃ and ZnO: In Situ Measurements Using Wafer Curvature Techniques

Chemisorption Mechanisms of Aminosilane Precursors during ALD of SiO₂: in situ Characterization and ab initio Study

Seeing It Happen: Insights Into the Surface Chemistry of HfO₂ and TiO₂ ALD from Operando Ambient Pressure X-ray Photoelectron Spectroscopy

Preparation and Characterization of Well-Defined Mixed-Oxide and Metal-Oxide Interfaces in Porous Catalysts using ALD

A Toolbox for Characterization of Film Penetration Depth in High Aspect Ratio Structures

Understanding Process Parameters of ALD on Silica Aerogels and Their Effects on Mechanical Properties

Tuning Properties of ZnO Deposited via ALD for Applications in Sensing and Porous Material Development

Plasma-Enhanced Atomic Layer Etching for Metals and Dielectric Materials

Controlling the Hole Profile of High Aspect Ratio Structures in Atomic Layer Etching of SiO2 by Utilizing Dc-Superposition in Capacitively Coupled Plasmas

Damage Analysis of Reactive Ion and Quasi-Atomic Layer Etched Silicon

Atomic Layer Etching of SiO₂ via H₂/SF₆ Plasma and TMA

Learnings and Mitigations of Nonuniformity in Oxide Quasi Ale Applied to Contact Patterning

Adopting a Low Global Warming Potential Fluorocarbon Precursor (C₆F₆) to Atomic Layer Etching of Sio₂ with Fluorocarbon Plasmas

Thermal ALE Reactants for Semiconductor Processing

Isotropic Plasma-Thermal Atomic Layer Etching of Aluminum Nitride Using SF₆ Plasma and Al(CH₃)₃

Gan Atomic Layer Etching Using SF₆ and Ar Plasmas Controlled by RFEA and Langmuir Probe Measurements

Speedy and Smooth Atomic Layer Etching for Silicon Carbide with DC Bias-Pulsing

Thermal Atomic Layer Etching of MoS₂ Films

Atomic Layer Technologies for III-V Nitride Epitaxy, High-K/Metal Gate, Ferroelectric Negative Capacitance, and Area-Selective Deposition

Optimizing Vessel Design for Pulsed Delivery of Solid Precursors

Accurate Precursor Dose Delivery with Realtime Closed Loop Control

Fast and Efficient Large Format ALD

Mechatronic Spatial Atomic Layer Deposition for Closed-Loop Process Control

Spatial Atomic Layer Deposition: A New Revolution in Ultra-Fast Production of Conformal Optical Coatings

Spatial ALD of Iridium Oxide Electro-Catalyst Layers for PEM Electrolysis

Novel Organic-Inorganic Hybrid Thin Films Deposited by Molecular Atomic Layer Deposition (MALD) for EUV Resist Applications

Inorganic Cluster Synthesis and Characterization via Atomically Precise ALD in Polymers

Molecular Layer Deposition of Al- and Hf-Based Hybrid Resists for Electron-Beam and EUV Lithography

High-resolution EUV Lithographic Patterning Characteristics of InO_x-PMMA Hybrid Photoresist Generated by Vapor-phase Infiltration