ALD/ALE 2021 Wednesday Morning

Welcome, Thank Yous & Instructions

Another Opportunity in Area Selective Atomic Layer Deposition using Precursor Inhibitors

Direct Deposition of High-resolution 3D Nanostructures by Atomic-Layer Additive Manufacturing (ALAM)

The Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition

Diffusion-Mediated Ruthenium Area-Selective Atomic Layer Deposition in Nanopatterns

Area-Selective CVD of Metallic Films on Oxide Substrates With Acidic or Basic Hydroxyl Groups

Inhibiting Plasma Enhanced Atomic Layer Deposition of SiO₂ on Cu using Thiol Multilayers in an ABC Cycle

Sequential Area Selective Deposition of Poly(3,4-ethylenedioxythiophene) (PEDOT) and Tungsten on SiO₂/Si-H Substrates

Atomic Precision Advanced Manufacturing and Lessons for Area-Selective Deposition

The Role of Precursor-Inhibitor Interactions in Area-Selective Atomic Layer Deposition

Spatially Controlled Atomic Layer Deposition within Polymer Templates for Multi-Material Nanorods and Nanowires Fabrication

Maskless Patterned Spatial ALD for Thin-Film Encapsulation

Y₂O₃ Atomic Layer Deposition Process Scale-Up to Very Large Batch Size

Low Temperature Thermal Atomic Layer Deposition of Elemental Tellurium Using and a Novel Tellurium Precursor and Nitrogen-Based Coreactants

When Complex Becomes Complicated – Strategies for Succeeding with Arduous Ternary Oxide Processes

Announcement of ALD and ALE Student Awardees, Closing Remarks & Thank Yous