Welcome, Thank Yous & Session Instructions

Atomic Layer Deposition of Amorphous/Nanocrystalline Phase-Composite Nanolayers

Density Functional Study on ALD Precursors for Hexagonal Boron Nitride Deposition

A Novel co-Precursor Approach for Atomic Layer Deposition of Various Semiconductor Thin Films

Tuneable YAlOx Protective Coatings Against Plasma Damage to Meet the Requirements in Future Semiconductor Fabrication Processes

ALD of Boron Nitride by Polymer Derived Ceramics chemistry

Process Parameter and Substrate Dependence of Sticking Coefficients in Atomic Layer Deposition Processes

Volatile Cerium and Ytterbium Precursors for Atomic Layer Deposition: Synthesis, DFT and Application

Predicting Precursor Volatility With Machine Learning

Surface Chemistry of Deposition and Etch from First Principles Simulations

Atomic Layer Deposition of Functional Dielectrics and Metals for the Emerging Non-Volatile Memories

Crystallinity Control via Atomic Level Scaffolding

Plasma-Enhanced Atomic Layer Deposition of Copper Oxide Semiconductors With Tunable Phase, Oxidation State, and Morphology for P-Type Thin Film Transistors

Tuning Coercive Field and Polarization in Inherently Ferroelectric HZO Film Deposited Using HfD-04 and ZrD-04

Ferroelectric Devices: From Applications to Microstructures

Closing Remarks & Thank Yous