Design of Advanced Photocatalytic Materials by Atomic Layer Deposition (ALD)

Atomic Layer Deposition of Manganese Oxide Ultra-Fine Clusters on Titanium Dioxide Nanoparticles for Photocatalytic Hydrogen Production: Experiments & Simulations

In situ Electrochemical APXPS Analysis of ALD Grown Cu Catalyst for CO₂ Reduction

Atmospheric-Pressure Atomic Layer Deposited Bimetallic MCu/CeO₂ Catalysts for Enhanced Removal of CO from Fuel-Cell Hydrogen by Preferential Oxidation

ALD Fabrication of BN Membranes: Environmental Applications

Highly Stable and Active Catalyst for Dry Reforming of Methane via Molecular Layer Deposition Approach

Using ALD to Probe Support and Promoter Effects for Syngas Conversion Catalysts

Laterally Resolved Low Energy Ion Scattering Study of Selective ALD Model Samples

In situ Characterization of Quantum Dot Photoluminescence during Atomic Layer Deposition: Towards Stable Cd-Free QD-Based Devices

Capturing the Dynamic Atomic Structure in ALD Reactions with In situ XANES, ab initio Simulations, and Machine Learning

Atomic Layer Deposition of Erbium Oxide, Erbium Fluoride and Stoichiometrically-Tunable Erbium Oxyfluoride Films

From the Noise: Measuring Atomic Structure in Amorphous Thin Films Grown by Atomic Layer Deposition

Effects of Gas Phase Reaction Chemistry on Electronic Conductivity of ALD Grown TiO₂ Films

In Situ Reflection High Energy Electron Diffraction in Atomic Layer Deposition for Monitoring the Epitaxial Transformations

In Situ Detection of the Reaction Heat Produced by ALD on High-Surface-Area Substrates

Realizing Selective Material Removal in Plasma-Based Atomic Layer Etching (ALE)

Atomic Layer Etching of SiO₂ and Si₃N₄ with Fluorocarbon, Hydrofluorocarbon, Fluoroether and Fluoroalcohol Compounds

Strategies to Enhance the Etch Selectivity During Plasma‑Assisted Atomic‑Scale Etching of SiO₂ over SiN_x

Cryo-ALE of SiO₂ with C₄F₈ Physisorption: Process Understanding and Enhancement

Interpretation of SiO₂ Atomic Layer Etching via a Simple Analytic Model

Novel Chemistries for Layer-by-Layer Etching of 2D Semiconductor Coatings and Organic-Inorganic Hybrid Materials

Atomic Layer Deposition from Dissolved Precursors ― ‘solution ALD’ or sALD

An Atomic-Layer 3D Printer

Reducing Precursor Cost in PE-ALD SiO₂ Processes

Plasma Enhanced Spatial ALD of Metal Thin Films at Atmospheric Pressure

Plasma Enhanced Spatial Atomic Layer Deposition of Silicon Nitride Using Di(isopropylamino)silane and N₂ Plasma

Realization and In-situ OES Characterization of Saturated 10-100 ms Precursor Pulses in a 300 mm CCP Chamber Employing de Laval Nozzle Ring Injector for Fast ALD

Advanced Materials for the Next Generation: ALD a Scalable Manufacturing Process for Powders

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ALD Precursor Chemistry: Synthetic Routes, Purification and Evaluation of Precursors

Atomic Layer Engineering: Hardware Considerations for ALD System Design and Process Development

ALD on High Aspect Ratio and Nanostructured Materials: from Fundamentals to Economics

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