ALD2020 Tuesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Tuesday, June 30, 2020 | ||||||||||||||
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8:30 AM | 9:30 AM | 10:30 AM | 11:30 AM | ||||||||||||
AA-TuM |
Atomic Layer Deposition Enabling Higher Efficiency Solar Cells
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Atomic Layer Deposition of Zn1-xMgxO and Zn1-xMgxO: Al as Transparent Conducting Films for Chalcopyrite Solar Cells
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Tuning Properties of ALD Oxide and Sulfide Materials for Photovoltaic Applications
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Solar Cells Based on Phase-Pure Sb2S3 by Atomic Layer Deposition Forming Planar and Coaxial Heterojunctions
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Metal Oxide Infilling of Quantum Dot Thin Films: Charge Separation, Stabilization, and Solar Cell Formation
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ALD of Al2O3 on Perovskite Solar Cells: Role of Active Interfacial Engineering
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AA2-TuM |
Ultrathin TiN by Thermal ALD as Electrically Conducting Li-ion Diffusion Barrier for Integrated 3D Thin-Film Batteries
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Atomic Layer Deposition of Nitrogen Doped Al- and Ti-Phosphate for Li-ion Battery Applications
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Passivation of Lithium Metal Anodes with ALD Aluminum Fluoride
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Next-Generation Li-ion Batteries Enabled by Large-Area Atmospheric-Pressure Spatial Atomic Layer Deposition
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ALD Al2O3 and MoS2 Coated TiO2 Nanotube Layers as Anodes for Lithium Ion Batteries
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Molecular Layer Deposition for Stabilization of Electrochemical Materials
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AF1-TuM |
Automated Design of Thermally Stable Heteroleptic Precursors by Computational Screening
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Unravelling the Reaction Mechanisms of Trimethyl Borate for the Atomic Layer Deposition Boron- and Hydrogen-Doped Alumina Films with Non-uniform Transversal Doping Profiles
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AF2-TuM |
Role of Ions in Film Conformality and Quality during Plasma-Assisted ALD of SiO2 and TiO2
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ALD Conformality: Effects of Process Parameters on the Simulated Saturation Profile
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ALE1-TuM |
Highly Selective Atomic Layer Etching for Semiconductor Application
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Aspect-Ratio Dependence of Isotropic Thermal ALE and Mitigation Thereof
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Precise Ion Energy Control with Tailored Waveform Biasing for Atomic Layer Etching
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ALE2-TuM |
GaN Damage Evaluation After Conventional Plasma Etching and Anisotropic Atomic Layer Etching
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Analysis of Ion Energy Dependence of Depth Profile of GaN by In-situ Surface Analysis
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Atomic Layer GaN Etching by HBr Neutral Beam
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LI2-TuM |
Welcome and Introduction
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Thermal Atomic Layer Deposition of Noble Metal Films Using Non-Oxidative Coreactants
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Mixing It Up: Tuning Atomic Ordering in 2-D Mo1-xWxS2 Alloys by ALD
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Deposition of Conductive PEDOT Thin Films with EDOT and ReCl5 Precursors
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Break
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Resistless Lithography Based on Local Surface Modification of Halogenated Amorphous Carbon
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Mimicking Chitin and Chitosan Type of Functionality with Novel Thin Films Grown by Molecular Layer Deposition
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Closing Remarks & Sponsor Thank You
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