ALD2019 Tuesday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Tuesday, July 23, 2019
1:30 PM 2:30 PM 3:30 PM 4:30 PM
Atomic Layer Deposition of Indium Gallium Zinc Oxide (IGZO) Semiconductor Thin Films: From Precursor to Thin Film Transistor Application
ALD Growth of Ultra-thin Co Layers on the Topological Insulator Sb2Te3
Modifying Interfacial Chemistry of Cellulose-Reinforced Epoxy Resin Composites using Atomic Layer Deposition (ALD)
Atomic Layer Deposition of Au Nanoparticles on Titania
Multi-layer Protective Coatings on Silver for Protection of Historic Silver Artifacts
Nonlinear Optical Properties of TiO2-Based ALD Thin Films
Atomic Layer Deposition to Alter the Wetting and Thermal Properties of Lumber
Tunable Electrical Properties of Lithium Fluoride Thin Films using Different Fluorine Sources
The Role of Al2O3 ALD Precursor Chemistry on the Electrochemical Performance of Lithium Ion Battery Cathode Mmaterials
Spatial Atomic Layer Deposition of Hybrid Nanolaminates for High Capacity Li-ion Battery Electrodes
Lithium Organic Thin Films for Various Battery Components
ALD Infiltration of LiCoO2 for High Rate Lithium Ion Batteries
ALD Al2O3 and MoS2 Coated TiO2 Nanotube Layers as Anodes for Lithium Ion Batteries
Doped Hi-K ALD Films of HfOX and ZrOX for Advanced Ferroelectric and Anti-Ferroelectric Memory Device Applications:
ALD of La-Doped HfO2 Films for Ferroelectric Applications
Characterization of Multi-Domain Ferroelectric ZrO2 Thin Films for Negative Capacitance and Inductive Responses
Scaling Ferroelectric Hf0.5Zr0.5O2 on Metal-Ferroelectric-Metal (MFM) and Metal-Ferroelectric-Insulator-Semiconductor (MFIS) Structures
Interface Characteristics of MIM Capacitors using Vanadium Nitride Electrode and ALD-grown ZrO2 High-k Dielectric Film
Low Temperature High Quality Silicon Dioxide by Neutral Beam Enhanced Atomic Layer Deposition
Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality
A Robust Method for In-situ Gas Monitoring of ALD Processes using Optical Emission Spectroscopy of a Pulsed Remote Plasma
Near Room Temperature Plasma Enhanced Atomic Layer Deposition of Gold Metal
Low-Temperature Deposition of Gallium Oxide and Aluminum Oxide with Arrays of Microcavity Plasma Enhanced Atomic Layer Deposition
The Effects of Varying Plasma Conditions on Plasma Assisted Atomic Layer Epitaxy
Plasma-Enhanced Atomic Layer Epitaxy of Ultra-wide Bandgap Ga2O3 and (AlxGa1-x)2O3 Films
Atomic Layer Etching of Nanostructures
Selectivity during Plasma ALE of Si-Compounds: Reaction Mechanism Studied by in-situ Surface Spectroscopy
Chamber Vacuum Strategies to Enable High Productivity ALE
Mechanistic Study of the Thermal Atomic Layer Etch of Cobalt Metal Using Propene and CO
Selective Quasi-ALE of SiO2 over Si3N4 via Bottom-up Si3N4 Passivation: A Computational Study
Insights of Different Etching Properties between CW and ALE Processes using 3D Voxel-Slab Model
First-principles Understanding of Atomic Layer Etching of Silicon Nitride using Hydrofluorocarbons
An Extended Knudsen Diffusion Model for Aspect Ratio Dependent Atomic Layer Etching
Thermodynamics-Based Screening Approach for Atomic Layer Etching
Always in Competition: Self-limiting Versus Continuous Reactions in ALD and ALEt
Variation of Etched Depth per Cycle and Removal of Reactive Species in Atomic-Layer Etching (ALE) : Molecular Dynamics Study
Elucidating Mechanisms of Selective ALD of Al2O3 by a Comparative Study of Precursors
Area-Selective Atomic Layer Deposition using Dodecanethiols: Comparison of Monolayer versus Multilayer
Mechanism for Breakdown in Selectivity During Area-Selective Atomic Layer Deposition of ZrO2 on a SiO2 Surface Functionalized with a Blocking Layer
Area Selective Chemical Vapor Deposition of Co from the Co (CO) Precursor: Use of Ammonia to Afford Dielectric-Dielectric Selectivity
Area-Selective ALD of Silicon Oxide using Inhibitors in Four-step Cycles for Metal/Dielectric Selectivity
Selective Area Growth of Deactivating Polymers
Area-Selective ALD of ZnO Films Patterned by Electrohydrodynamic Jet Printing of Polymers with Sub-Micron Resolution
Selective Deposition of Silicon Nitride
Area-Selective Deposition and Smoothing of Ru by Combining Atomic Layer Deposition and Selective Etching
Single Batch Strategies for the Development of an Area Selective Deposition Process with the Deposition/Etch Approach
Surface Halogenation of Amorphous Carbon for Defect-free Area-Selective Deposition of Metal Oxides
Real-time Grazing Incidence Small-angle X-ray Scattering Studies of Indium Aluminum Nitride Growth
Expanding the Materials Library of Sequential Infiltration Synthesis: Conductive Indium and Gallium Oxides Grown in Polymers
Highly Efficient and Stable Organic – Inorganic Halide Perovskite Solar Cells with ALD-grown Charge Transport Layers
Sessions | Time Periods | Topics | Schedule Overview