ICMCTF2008 Session G7: Advances in Industrial Deposition Equipment and Metrology for Coatings and Thin Films
Time Period WeA Sessions | Abstract Timeline | Topic G Sessions | Time Periods | Topics | ICMCTF2008 Schedule
Start | Invited? | Item |
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1:30 PM |
G7-1 Characteristics of a New Filtered Pulse Cathodic Arc Source
R.K.Y. Fu, L.H. Li, P.K. Chu (City University of Hong Kong) A new filtered pulse cathodic arc source (FPCAS) has been developed for materials fabrication. The intense and highly ionized plasma source produces dense films with little defects and pinholes. It is capable of operating at controllable plasma transport efficacy and long running time with high pulse arc stability. The novel source has wide applications in nanoscience, microelectronics, biomedical engineering, tribological applications, and so on. The effects of the pulse trigger and geometric factors on the arc discharge and cathode erosion with self-compensation are described. In addition, the electromagnetic field can be effectively adjusted to cater to the desired conditions in order to precisely control the film thickness and growth. Applications pertaining to ultra thin film with low growth rate and thick film with high plasma transport efficacy are discussed. The relationship between the film growth rate and pulse parameters and the electromagnetic field strength is described and the surface morphology of films with different thickness is also discussed. |
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1:50 PM |
G7-2 New Machine Concepts for Triple Coatings
M. Jilek, J. Jilek, P. Holubar (Pivot a. s., Czech Republic); O. Coddet, M. Morstein, M. Luemkemann, T. Cselle (Platit AG, Switzerland) Triple Coatings are built from 3 layer blocks: - Adhesion layer (usually pure Ti-N, Cr-N) - Conventional core layer(s) with monolayer, gradient, or nanolayer structures (usually CrTiN, AlTiN, AlCrN or AlTiCrN) and - Superhard nanocomposite toplayer (usually TiAlN/SiN or AlCrN/SiN) The paper introduces and compares different coating machine concepts to realize different Triple Coatings in the range of Ti-Cr-Al-C-Si-N by rotating cathodes without target exchange. The comparison of the different configurations will be carried out according to the following criteria: - Flexibility and modularity for using the machines in small and medium size enterprises - Deposition rate with the help of computer simulation - Micro and nano structure of the deposited layers with the help of computer simulation The results of the computer simulation will be compared to practical deposition rates and structures realized by existing machine configurations. |
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2:10 PM | Invited |
G7-3 Recent Developments in Magnetron Sputtering
D.G Teer (Teer Coatings Ltd, United Kingdom) Recent Developments in Magnetron Sputtering. D.G.Teer Teer Coatings Ltd., West Stone House, Berry Hill Industrial Estate, Droitwich,Worcs WR9 9AS. UK. Magnetron sputtering is the most flexible of PVD techniques offering stability, repeatability, and uniformity of defect free coatings with the ability to deposit at low temperatures. However the technique has suffered from two major disadvantages. The deposition rate is lower than that for other PVD techniques and the adhesion of the sputtered coatings has not been sufficient for highly stressed applications. Recent developments will be described that enable magnetron sputter coatings to be deposited at rates as high as those using cathodic arc sources with no droplet type defects and with excellent adhesion. Applications using the new high rate magnetron technique will be described. Also the properties and use of magnetron sputter coatings on coining dies will be given which demonstrate the the excellent adhesion now achieved. |
2:50 PM |
G7-5 Innovative Technologies and Processes as Approach to Novel Industrial PVD Coaters
J. Mueller, G. Erkens, J. Vetter (Sulzer Metaplas GmbH, Germany) Advanced coating devices have to provide at least high productivity and flexibility, should be modular designed and render latest high performance coating solutions. The factors to success are innovative technologies and processes on one platform as well as most advanced coatings; one platform many choices, various opportunities and many solutions. Latest approaches to a new industrial PVD coating system resulted in a symbiosis of form and function to meet all these requirements. An attempt towards application tailored arc, sputtering and hybrid technologies and an advanced modular coating equipment to synthesize the next generation of high performance PVD coatings will be illustrated. The technological key element is a new generation of arc evaporators combined with the optimization of the target material. Recent developments on these APA (Advanced Plasma Assisted) evaporators that led to significant higher deposition rates, higher target life and utilization and less micro particle emission will be shown. Novel high performance coatings were tailored by plasma enhancement, composition, design and process parameters. Unique micro alloyed coatings deposited as nano-composites or nano-laminates will be presented. Coating solutions from latest approaches to hybrid processes that combine sputtering and arc technology underline the leading edge technology illustrated. |
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3:30 PM |
G7-7 Recent Improvements in CVD-Diamond Deposition
T. Leyendecker, O. Lemmer, W. Reichert, R. Cremer (CemeCon AG, Germany) CVD-diamond coated cutting tools are widely established for machining of challenging composite materials such as carbon fiber reinforced plastics (CFRPs), metal matrix composits (MMCs), printed circuit boards (PCBs), and highly abrasive Al-Si alloys. With increasing demand for diamond coated tools in the electronics, automotive and aerospace industries delivering highest coating quality is no more enough to meet the customers’ needs. The coating process must be cost efficient as well. CemeCon’s new CC800/9 Dia coating machine combines the quality and cost efficiency requirements in an unprecedented way. The recent developments in CVD-diamond coating technology will be demonstrated by showing performance data of the CC800/9 Dia coating unit and presenting cutting performance results in new composite materials. |
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3:50 PM |
G7-8 The Hauzer Flexicoat 850 Platform
C. Strondl, D. Doerwald, T. Krug (Hauzer Techno Coating BV, Netherlands) The new Flexicoat 850 platform is a very flexible concept offering arc and sputter combinations as well as PA-CVD capabilities. The Flexicoat 850 can be dedicated for tool coatings in the form of the Rapid Tool Coater (RTC), which offers a high quality and cost effective deposition of the standard tool coatings like AlTiN. In an another configuration, the Flexicoat 850 can be configured into a Rapid Ring Coater (RRC), dedicated for extreme high efficiency and low cost deposition of piston rings. A newly developed arc evaporator with very high target utilisation has been developed for this purpose. As a third possibility, the Flexicoat 850 platform can be used for R&D purposes with very flexible configuration options, where arc, sputter and PA-CVD capabilities can be combined into one machine. As a detailed example, the Rapid Ring Coater (RRC) is studied and technical data and performance of the machine concept is presented. |
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4:10 PM |
G7-9 Innovative Equipment for the Production of PVD Oxide and Nitride Based Coatings for Industrial Tool Coating Production
J. Gwehenberger, S. Krassnitzer (OC Oerlikon Balzers AG, Liechtenstein); T. Michalke (Oerlikon Balzers Germany GmbH, Germany); D. Kurapov, W. Kalss (OC Oerlikon Balzers AG, Liechtenstein) For many years intensive research work was done to deposit hard and wear resistant alumina based coatings by physical vapor deposition. However most research groups focused on conventional reactive sputtering technology with the drawbacks of poor productivity, poor reproducibility and difficult process control. A breakthrough was achieved by Oerlikon Balzers with the development of the P3e (tm) Technology (Pulse Enhanced Electron Emission), which overcomes the difficulties of reactive sputtering for the formation of oxide based coatings. Already at deposition temperatures below 600°C hard alumina coatings can be deposited at a deposition rate comparable to nitride based coatings. A new batch type coating system (INNOVA) was presented end of 2006, which is the first eqiupment for industrial scale production of alpha alumina based coatings (P3eTM technology). In this discourse an experience report on more than one year production with this coating system will be given. |
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4:30 PM |
G7-10 A Universal PVD Coater to Deposit W-DLC and C-DLC
W.-D. Münz, S. Kunkel, T. Zufrass, M. Schenkel (SVS Vacuum Coating Technologies, Germany) IMPAX 1200 4/HPM is designed to deposit both W-DLC and C-DLC employing the combined HIPIMS/Unbalanced Magnetron sputter deposition technique. Ion-etching and ion-implantation is achieved in a plasma generated by HIPIMS using a WC target. OES analyses reveal in the wavelength range of 200 to 250 nm up to threefold positively ionised W and singlefold ionised C atoms. The ions are accelerated towards the substrate by -1200 V to allow etching and ion implantation. Both coatings utilise the identical WC 0,5 µm intermediate layer consisting of a non-reactively deposited HIPIMS layer followed by a layer deposited from WC targets using HIPIMS and UBM simultanously. The actual carbon coating is grown in case of W-DLC sputtering WC in a atmosphere of Ar and a high partial pressure of C2 H2 in the well known manner. C-DLC is deposited sputteing high purity graphite in a gently reactive atmosphere of Ar and C2 H2. The plasma expands through the whole inside of the vacuum chamber by the installation of a central anode.The well adherent intermediate layer shows a hardness of approx. 30 GPa, the W-DLC roughly 15 to 20 GPa and the C-DLC between 40 and 50 GPa. The latter coating can be produced with coefficient of friction of 0,07. |
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4:50 PM |
G7-11 Aspects of Flexibility and Efficiency of Industrial Coating Machines
J. Anklam (VACOTEC S.A., Switzerland); G. Keiren, M. Lartz, Y. Jeannerot, A. Rogozin, W. Schröder, E. Voß (Consultant) Independent of the development of new coatings a continuous development of the coating technique is strived for by most of the machine manufacturer. After the full automation of the machines and monitoring of all important process data was accomplished, a higher flexibility - to be prepared for the deposition of new coatings and for the implementation of new or improved technologies - as well as a better efficiency - to do the whole coating procedure more economic - is now in the centre of interest. By means of the dual cathode technique (two neighboring circular cathodes) introduced in 1995 in indus-trial coating machines by EIFELER, the deposition of multilayered coatings could be done without loss of deposition rate. By that way, also the design of gradual transitions between two film compositions be-came easily possible. In comparison with large area rectangular cathodes that are considered to be domi-nant in the future, the circular cathodes seem to be the more cost effective ones. Especially when consid-ering the change of coating material for development purposes (e.g. when investigating new coating compositions) the material costs are much less. Also regarding the rate of deposition, a set of circular cathodes can usually be run at much higher currents than the appropriate large area rectangular cathodes what results in a higher rate of deposition. The circular cathodes have even essential future potential. So in the new configuration of machines, it will be possible to use pure metals to be evaporated from and mixed in front of the cathodes to generate the desired composition of the coating. This technique reduces the target costs essentially and leads additionally to improvements of the wear protecting properties of the coatings. Other minor developments are related to the deposition of basically smoother coatings. By well-directed poisoning of the cathodes a remarkable reduction in droplet emission can be reached resulting in a very smooth and dense coating. As a side effect, a reduced consumption of target material can be recognized what gives rise to an appropriate reduction in target costs per cycle. Another advantage of that technique is the increased rate of deposition. First tests with taps coated by that technique resulted in 30 - 50% higher performance due to the improved smoothness and density of the coatings. Techniques related to the in-situ preparation of the substrates help also to improve flexibility and effi-ciency as well as the performance of tools. A special kind of in-situ plasma nitriding technology developed in the last years preserves the smoothness and shininess of the tool surface when increasing the surface hardness and corrosion resistance of the substrate material. |