ICMCTF2005 Tuesday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Tuesday, May 3, 2005
8:30 AM 9:30 AM 10:30 AM 11:30 AM
Intriguing Prospects for Using Pt-Modified γ'- Ni3 Al Bondcoats +γ-Ni Bondcoats in Next-Generation TBC Systems
NASA's Experience with Low Conductivity/Sintering Resistant Combustor and Turbine Section Thermal Barrier Coatings
Improving the Phase Stability of TBCs with Yb Additions
Microstructural and Mechanical Property Characterization of TBC Bond Coats
High Temperature and Room Temperature Erosion Testing of Gadolinia Doped EB PVD TBCs
A Platinum-Enriched γ+γ' Two-Phase Bond Coat on Ni-base Superalloys
Processing and Mechanical Properties of Ultra-Thick Thermal Barrier Coatings Deposited using the Solution-Precursor Plasma-Spray Method
Luminescence Sensing of Temperature in Pyrochlore Zirconate Materials for Thermal Barrier Coatings
DVD Processing of Sm2Zr2O7 with/out Substrate Rotation
Microstructure and Properties of Direct Current Magnetron Sputtered NiAl Coatings Containing up to 1 at% Hf addition
Nanostructured Coatings and Polymer Surface Modfications by Filtered Cathodic Vacuum Arc and Plasma Immersion Ion Implantation (Plll)
High-Temperature Oxidation Resistance of Nanostructured Chromium-Silicon Nitride Coatings Obtained by an Hybrid Reactive Arc-Magnetron Deposition Process
(TiAlV)N Films Grown by using a Repetitive Pulsed Arc Discharge
Properties and Cutting Performance of (Ti,V)N Coatings Prepared by Cathodic Arc Ion Plating
Thin Films of Super-Hard Cubic Zr3N4 Stabilized by Stress
Structural and Mechanical Property of Si Incorprated (TiCrAl)N Coatings Deposited by AIP
Deposition of Superhard TiAlSiN Thin Films by Cathodic Arc Plasma Deposition
Synthesis and Mechanical Evaluation of New Quaternary Ti-Cr-Si-N Coatings Deposited by a Hybrid Method of Arc Ion Plating and Sputtering Techniques
Oxidation of Arc-Evaporated AlxCr1-xN Coatings
The Effect of Multilayers on the Residual Stress in Chromium Nitride Coatings Deposited on Cemented Carbide by Physical Vapour Deposition
CrN-Ag Self-Lubricating Hard Coatings
Magnetron Sputtered Nanocrystalline Metastable f.c.c. (Cr,Si)N Coatings
Oxidation Behavior and Morphology of CrxAlyYzN, CrxAlyBzN, CrxAlySizN - PVD Coatings
Nanocomposite AlTiNCO Coatings Deposited by the Reactive Cathodic Vacuum Arc Evaporation
Real-Time In-Situ Growth Study of TiN and TiCxNy Based Superhard Nanocomposite Coatings using Spectroscopic Ellipsometry
Syntheses and Mechanical Properties of TiAlCxN1-x Coatings Deposited by Arc Ion Plating
Characterisation and Applications of Cr-Al-N Coatings
A Concept for Measurment and Design of Optical Films in Respect to their Mechanical Strength
Structural and Mechaincal Properties of ITO Films - Effect of Energetic Conditions
Improvement of Mechanical Properties of Photo-Spacer for TFT LCD
Assessment of the Toughness of Thin Coatings using Nanoindentation Under Displacement Control
The Influence of Deposition Parameters on the Structure and Properties of Magnetron Sputtered Titania Coatings
Optical and Mechanical Properties of Tantalum Oxynitride Thin Films Deposited by Reactive Magnetron Sputtering
Improved Properties of Optical Coatings Through Substrate Pre-Treatment
Stress Induced Delamination Methods for the Study of Adhesion of Pt Thin Films to Si Substrates
The use of Raman Spectroscopy to Identify Strain and Strain Relaxation in Strained Si/SiGe Structures.
Response to Loading and Stiffness of Coated Substrates Indented by Spheres
Material Properties Extracted from Indentation Experiments by Inverse Finite Element Calculations
Atomic Level Modeling of the Interface Bonding Between the Aluminum and Silicon Surfaces
Developments in Nano-Impact Testing: A Comparison of Static and Dynamic Measurements of Hardness and Fracture Toughness
Impact Test on PVD-Coatings and on Various Substrates at Elevated Temperatures
Thin Film Stress Measurement by Instrumented Optical Fibre Displacement Sensor
Processing of Chromium Tungsten Nitride Hard Coatings for Glass Molding
Deposition of AlN on Substrates by Reactive Magnetron Sputteing
Plasma and Ion Sources in Large Area Coatings: A Review
Flexible Displays and Stable High Efficiency Four Terminal Solar Cells using Thin Film Silicon Technology
Properties of Ag-Based Low-E Films Deposited by High Power Pulse Magnetron Sputtering
Plasma Treatment of Metallurgical Surfaces
Transparent Abrasion Resistant Layers on Plastic and Metal Substrates by Plasma Activated High Rate Deposition
On-Line Process Control by X-Ray Fluorescence
Properties of TiO2 Layers Deposited onto Large Areas by Reactive Plasma-activated High-Rate Electron Beam Evaporation
Sessions | Time Periods | Topics | Schedule Overview