ICMCTF2005 Tuesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Tuesday, May 3, 2005 | |||||||||||
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| 8:30 AM | 9:30 AM | 10:30 AM | 11:30 AM | |||||||||
| A3-1 |
Intriguing Prospects for Using Pt-Modified γ'- Ni3 Al Bondcoats +γ-Ni Bondcoats in Next-Generation TBC Systems
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NASA's Experience with Low Conductivity/Sintering Resistant Combustor and Turbine Section Thermal Barrier Coatings
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Improving the Phase Stability of TBCs with Yb Additions
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Microstructural and Mechanical Property Characterization of TBC Bond Coats
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High Temperature and Room Temperature Erosion Testing of Gadolinia Doped EB PVD TBCs
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A Platinum-Enriched γ+γ' Two-Phase Bond Coat on Ni-base Superalloys
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Processing and Mechanical Properties of Ultra-Thick Thermal Barrier Coatings Deposited using the Solution-Precursor Plasma-Spray Method
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Luminescence Sensing of Temperature in Pyrochlore Zirconate Materials for Thermal Barrier Coatings
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DVD Processing of Sm2Zr2O7 with/out Substrate Rotation
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Microstructure and Properties of Direct Current Magnetron Sputtered NiAl Coatings Containing up to 1 at% Hf addition
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| B2-1 |
Nanostructured Coatings and Polymer Surface Modfications by Filtered Cathodic Vacuum Arc and Plasma Immersion Ion Implantation (Plll)
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High-Temperature Oxidation Resistance of Nanostructured Chromium-Silicon Nitride Coatings Obtained by an Hybrid Reactive Arc-Magnetron Deposition Process
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(TiAlV)N Films Grown by using a Repetitive Pulsed Arc Discharge
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Properties and Cutting Performance of (Ti,V)N Coatings Prepared by Cathodic Arc Ion Plating
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Thin Films of Super-Hard Cubic Zr3N4 Stabilized by Stress
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Structural and Mechanical Property of Si Incorprated (TiCrAl)N Coatings Deposited by AIP
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Deposition of Superhard TiAlSiN Thin Films by Cathodic Arc Plasma Deposition
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| B7-3 |
Synthesis and Mechanical Evaluation of New Quaternary Ti-Cr-Si-N Coatings Deposited by a Hybrid Method of Arc Ion Plating and Sputtering Techniques
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Oxidation of Arc-Evaporated AlxCr1-xN Coatings
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The Effect of Multilayers on the Residual Stress in Chromium Nitride Coatings Deposited on Cemented Carbide by Physical Vapour Deposition
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CrN-Ag Self-Lubricating Hard Coatings
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Magnetron Sputtered Nanocrystalline Metastable f.c.c. (Cr,Si)N Coatings
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Oxidation Behavior and Morphology of CrxAlyYzN, CrxAlyBzN, CrxAlySizN - PVD Coatings
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Nanocomposite AlTiNCO Coatings Deposited by the Reactive Cathodic Vacuum Arc Evaporation
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Real-Time In-Situ Growth Study of TiN and TiCxNy Based Superhard Nanocomposite Coatings using Spectroscopic Ellipsometry
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Syntheses and Mechanical Properties of TiAlCxN1-x Coatings Deposited by Arc Ion Plating
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Characterisation and Applications of Cr-Al-N Coatings
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| C2/E6 |
A Concept for Measurment and Design of Optical Films in Respect to their Mechanical Strength
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Structural and Mechaincal Properties of ITO Films - Effect of Energetic Conditions
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Improvement of Mechanical Properties of Photo-Spacer for TFT LCD
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Assessment of the Toughness of Thin Coatings using Nanoindentation Under Displacement Control
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The Influence of Deposition Parameters on the Structure and Properties of Magnetron Sputtered Titania Coatings
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Optical and Mechanical Properties of Tantalum Oxynitride Thin Films Deposited by Reactive Magnetron Sputtering
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Improved Properties of Optical Coatings Through Substrate Pre-Treatment
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| E3/F1 |
Stress Induced Delamination Methods for the Study of Adhesion of Pt Thin Films to Si Substrates
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The use of Raman Spectroscopy to Identify Strain and Strain Relaxation in Strained Si/SiGe Structures.
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Response to Loading and Stiffness of Coated Substrates Indented by Spheres
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Material Properties Extracted from Indentation Experiments by Inverse Finite Element Calculations
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Atomic Level Modeling of the Interface Bonding Between the Aluminum and Silicon Surfaces
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Developments in Nano-Impact Testing: A Comparison of Static and Dynamic Measurements of Hardness and Fracture Toughness
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Impact Test on PVD-Coatings and on Various Substrates at Elevated Temperatures
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Thin Film Stress Measurement by Instrumented Optical Fibre Displacement Sensor
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Processing of Chromium Tungsten Nitride Hard Coatings for Glass Molding
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Deposition of AlN on Substrates by Reactive Magnetron Sputteing
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| G5 |
Plasma and Ion Sources in Large Area Coatings: A Review
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Flexible Displays and Stable High Efficiency Four Terminal Solar Cells using Thin Film Silicon Technology
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Properties of Ag-Based Low-E Films Deposited by High Power Pulse Magnetron Sputtering
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Plasma Treatment of Metallurgical Surfaces
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Transparent Abrasion Resistant Layers on Plastic and Metal Substrates by Plasma Activated High Rate Deposition
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On-Line Process Control by X-Ray Fluorescence
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Properties of TiO2 Layers Deposited onto Large Areas by Reactive Plasma-activated High-Rate Electron Beam Evaporation
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