ICMCTF2001 Wednesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Wednesday, May 2, 2001 | |||||||||||
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8:30 AM | 9:30 AM | 10:30 AM | 11:30 AM | |||||||||
A3-3 |
Microstructural Evaluation of Thermally Cycled TBCs
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Influence of Substrate Material on Oxidation Behavior and Cyclic Lifetime of EB-PVD TBC Systems
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The Effect of Bond Coat Surface Treatment on the Oxidation Induced Failure of EB-PVD Thermal Barrier Coatings
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Microstructural Characterization of Thermal Barrier Coatings on High Pressure Turbine Blades
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Influence of Substrate Composition on the High-Temperature Stability of EB-PVD TBCs
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Growth and Adherence of Alumina Scales Within TBC Systems wWth Aluminide Bond Coatings
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Thermal Conductivity of Zirconia- and Hafnia-Based Thermal Barrier Coatings
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B2-1 |
CVD Oxides Mechanisms,Characterisation, Applications and Much Else
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Ti-W-C and Ti-W-C-N Thin Films Deposited by CVD
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Growth and Microstructure of the Quaternary Ti-Si-C-N Coatings by CVD
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Deposition Characteristics of Ru Thin Films by Metal-Organic Chemical Vapor Deposition at Low Temperature
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Kinetics And Mechanism Of The Thermal Decomposition Of Tetrakis(dimethylamino)titanium
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Chromium Diffusion Coatings by CVD in Fluidized Bed Reactors (CVD-FBR)
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Chromising of Stainless Steels by the Use of CVD-FBR Technique
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Chromium and Aluminium Diffusion Coatings Deposited by CVD-FBR and Slurry Into Iron
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B6-1 |
Structure and Properties of Novel Functional Diamondlike Carbon Coatings Produced by Laser Ablation
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The Effect of Microstructure on Hardness Enhancements in Ti-Si-C and Ti-W-C Thin Films Deposited by MSPLD
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Effect of Grain Size of Pb(La,Ti)O3 Thin Films Grown by Pulsed Laser Deposition for Memory Device
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Influence of Deposition Pressure on the Composition and Structure of Carbon Nitride Films by Direct Current Plasma Assisted Pulse Laser Deposition
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New Developments and Applications in Laser Build-Up Welding
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Characterization of Plume Fluence for Laser Ablation of YSZ in Mixed Oxygen and Argon Environments
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Optical Properties of ZnO Thin Films Fabricated by Pulsed Laser Deposition
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Surface Modifications Using Advanced Precursor Technology
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C3-1 |
The Fluorescent Properties of ZnO Thin Film Prepared by RF Magnetron Sputtering
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Electrochromic Behaviour of Nickel Oxide Thin Films Deposited by Thermal Evaporation
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Comparative Study of Amorphous and Nanostructured Tungsten Tri-Oxide Produced by RF-Magnetron Sputtering Assisted by Oxygen Ion-Beam
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High Quality Ta2O5 Layers for Electrochromic Applications
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Electroluminescence Study of Si Doped Glass Light Emitter
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Infrared Transparent Spinel Films With p-Type Conductivity
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Synthesis and Characterization of Chemical Solution Derived Aluminum Doped Zinc Oxide Thin Films for Transparent Conducting Electrodes
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Variation of the Mechanical Properties of Indium Tin Oxide (ITO) Transparent Thin Films as a Function of Processing Conditions
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Transparent Conducting Impurity-Co-Doped ZnO:Al Thin Films Prepared by Magnetron Sputtering
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Characterization of Sputtered WO3 Thin Films for Electrochromic Devices
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Effects of Doped Tin Concentration on the Properties of Indium Tin Oxide Thin Films Deposited at Low Temperature
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D2-1 |
Growth, Characterization and Mechanical Properties of Nanodiamond Films Deposited from Ar/CH4 Microwave Plasma
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Gas-Phase and Plasma-Surface Reactions in Radiofrequency Discharges of C2H2-N2-Noble Gas Mixtures
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Nitrogen-Doped Plasma Enhanced CVD Amorphous Carbon: Processes and Properties
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Technological Maps for ta-C Deposition by Subplantation Modelling
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Strucutre and Properties of Si Incoporated Tetrahedral Amorphous Carbon Films Prepared by Hybrid Filtered Vacuum Arc Process
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Dual Plasma Hot-Filament and Hollow Cathode CVD Technique of Diamond Growth
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Nanostructured, Nitrogen Doped, Carbon Materials for Hydrogen Storage
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High Quality Diamond Materials by Chemical Vapor Deposition
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Effects of rf Power Burst Modulation of Magnetron Sputtering on the Properties of Amorphous Carbon Films
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E1-1 |
Studying Friction in MEMS: Test Structure, Metrology and Lubrication Choices
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Physical and Chemical Polishing of Steel by Ceramic Coatings
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The Influence of Surface Roughness on Friction and Wear of DLC Coatings
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Hydrogen Effects on the Friction Mechanism of Diamond-Like Carbon Films
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Preparation by Pulsed Vacuum arc Deposition and Characterization of DLC/MoS2 Nanocomposite Thin Films
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Tribochemical Effects Between Diamond-Like Carbon Coatings and Antiwear and Friction-modifying Additives
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Vacuum Tribology Studies of WC-Ag and TiC-Ag Composite Coatings Deposited by Sputtering and Laser Ablation
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Wear Reduction- and Self-Lubrication Properties Of Substoichiometric Vanadium and Tungsten Oxide and Superstoichiometric Zirconium and Hafnium Carbide Coatings
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The Role of Hydrogen in Tribological Properties of Hard Carbon Films
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Composite Coatings with Improved Mechanical and Tribological Properties, Obtained by Implantation-Plasma Methods
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F1/E4-1 |
Predictive Modelling of the Hardness of Single and Multilayer Coatings
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A New Systematic Method of Characterization for the Mechanical Strength of Thin Films on Substrates
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Investigation of Threshold Load for Yield Initiation in Coating-Substrate Systems
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Mechanical Properties of Fluorocarbon Polymer Thin Films Grown by PECVD
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Quantified Small-Scale Dynamic Mechanical Testing
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Comparison of Thin Film Adhesion Techniques
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Buckling Study of Thin Films on Substrate Under Compressive Stresses by Atomic Force Microscopy
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Accurate Determination of Young's Modulus and Poisson's Ratio of Thin Films by a Combination of Acoustic Microscopy and Nanoindentation.
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Evaluating Interfaces and Adherence by Laser-Acoustics
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H1-1 |
Ultra Low k Mesoporous Silica Dielectrics
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Porous Materiasl as Low-k Dielectrics for Electronic and Optical Interconnects
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Detection of Reactive Ion Etch Damage in Low k Dielectrics Using Electric Force Microscopy
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Enhancing the Resistance of Low k Hydrogen Silsesquioxane (HSQ) to Wet Stripper Damage
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Porous Dielectrics for On-Chip Applications
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From Tribolotical Coatings to Low-k Dielectrics for ULSO Interconnects
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Characterization and Reliability of Low Dielectric Constant Fluorosilicate Glass and Silicon Rich Oxide Process for Sub-0.15 Micron Device Application
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