ICMCTF2001 Monday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Monday, April 30, 2001
10:30 AM 11:30 AM
A1-1
The Effects of Platinum Concentration on the Oxidation Resistance of Superalloys Coated with Single Phase Platinum Aluminide
Reactive Element Modified CVD Low Activity Platinum Aluminide Coating
A Comparative Study of Nickel Aluminide Coatings by PVD Techniques.
Synthesis and High-Temperature Corrosion Behavior of CVD Aluminide Coatings on Iron-Base Alloys
B1-1
Critical Requirements for the Successful Industrial Deposition of Nanolayered Hard Coatings
Mechanical Properties of Superhard Nanocomposites
C-N/MeNx Nanocomposite Coatings Used as Hard Solid Lubricants
Synthesis and Characterization of Multilayered TiC / TiB2 Coatings Deposited by Ion Beam Assisted, Electron Beam-Physical Vapor Deposition (EB-PVD)
D1/D5-1
Deposition Mechanism of Fullerene-Like Carbon (FLC)
Nano-Scale Property Measurments of Individual Carbon Nanotubes
Effects of Nitrogen on the Formation of Carbon Nanotubes
Controlling Steps During Early Stages of the Aligned Growth of Carbon Nanotubes by Microwave Plasma Enhanced Chemical Vapor Deposition
Effect of NH3 Environment Gas on the Growth of Aligned Carbon Nanotube in Catalytically Pyrolyzing C2H2
E3-1
TiN Coating Improves the Corrosion Behavior of a Superelastic NiTi Surgical Alloy
Control of Porosity through Plasma Induced Polymerization or Deposition
Corrosion Resistance of Boroaluminized Layers on Steel
Dissolution and Soldering Behavior of Nitrided Hot Working Steel with Multilayer LAFAD PVD Coatings
Microstructural Analysis of Corrosion in a Nitrided AISI-SAE 4140 Steel.
Corrosion Behavior of Zirconium Nitrides Film Coated on 304 Stainless Steel
T1-1
Diagnostics and Control in the Thermal Spray Process
Two Methodologies for Controlling Thermal Spray Processes
T2-1
Understanding Pulsed DC Magnetron Plasmas Through Time Resolved Electrical Probe Measurements
Degree of Ionization and Sputtering Efficiency for Different Cathode Materials in High Power Pulsed Sputtering
Characterization of Pulsed dc Magnetron Discharges for High-Rate Sputtering
Diagnostic of a Pulsed CH4-H2 Plasma to Improve MWPA-CVD Process for Diamond Synthesis
Time-Resolved Investigation of Pulsed-dc Reactive Sputtering of Dielectrics
Sessions | Time Periods | Topics | Schedule Overview