ICMCTF2000 Tuesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Tuesday, April 11, 2000 | |||||||||||
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| 8:30 AM | 9:30 AM | 10:30 AM | 11:30 AM | |||||||||
| A3 |
Laser Rig Testing of Thermal Barrier Coatings
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Two-source Jumping Beam Evaporation for Advanced EB-PVD TBC Systems
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Two New Candidates for Thermal Barrier Coatings
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EB-PVD-Thermal Barrier Coatings on Laser Drilled Surfaces for Transpiration Cooling
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Oxide Scale Growth on MCrAlY Bond Coatings After Pulsed Electron Beam Treatment and Deposition of EBPVD-TBC.
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Spalling Failure of EB-PVD Thermal Barrier Coatings
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Effects of Interfacial Oxidation and Residual Stresses on the Failure Mechanisms in Thermal Barrier Coatings
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Measurement of Interfacial Toughness Loss in Thermal Barrier Coating and Oxide Systems
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| B1-3 |
Recent Progress in Large Scale Manufacturing of Multilayer/Superlattice Hard Coatings
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Low-temperature Magnetron Sputter-deposition, Hardness and Electrical Resistivity of Amorphous and Crystalline Alumina Thin Films
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About the Characterization of Oxides and Oxide Containing Hard Coatings Deposited by High Ion Sputtering (H.I.S.) Process Technique
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Deposition of CrN Coatings by Pulsed Cathodic Arc Evaporation Process
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Structure Modification of Magnetron-sputtered CrN Coatings by Intermediate Plasma Etching Steps
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Production and Characterization of Single and Multilayered Chromium Nitride (CrN- CrN + Cr2N) Coatings
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Unbalanced Magnetron Sputter Deposited CrN Coatings with Enhanced Hardness Properties.
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Growth of TiO2 and TiN Thin Films Using New High Power Magnetron Sputtering Source
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Qualitative/Quantitative Model to Study the Deposition of Aluminium Nitride in a High Energy Plasma Assisted Processing
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High Intensity Plasma Assisted Deposition of Aluminium Nitride and Silicon Nitride
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| C3 |
A Comparison of Spectrophotometry and Ellipsometry for Determining the Surface Roughness of a Single Layer Film
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The Resistance Lowering Effect of an Additional ZnO-layer in a Low-E System on Glass
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Study of ZrO2-Y2O3 Films Prepared by rf Magnetron Reactive Sputtering
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Anode Effects on Energetic Particle Bombardment of the Substrate in Pulsed Magnetron Sputtering
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Substrate Effects During Mid-Frequency Pulsed DC Biasing
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Influence of Process Parameters on the Structure and the Mechanical Properties of ZrO2 Coatings Deposited by Reactive Pulsed Magnetron Sputtering (PMS)
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The Influence of Finite Size Effects on the Optical Properties of Discontinuous Gold Films
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Reactive Sputtering of Titanium Dioxide Films: Optical and Mechanical Properties.
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Optical, Micro-mechanical and Structural Characteristics of High Index PECVD Optical Coatings: the Titanium Dioxide
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| D1-3 |
Nanoindentation and FEM Study of the Effect of Internal Stress on Micro/Nano Mechanical Property of Thin CNx Coating
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Investigation of the Thermal Stability of Nitrogen-Rich Amorphous Carbon Nitride Films
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Optical, Electrical and Mechanical Properties of Nitrogen-Rich Carbon Nitride Films Deposited by ICP-CVD
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Characterization of CNX Thin Films Prepared by Hot Filament CVD
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Microwave and DC-plasmajet CVD Synthesis of Si-C-N Coatings
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Preparation of Silicon Carbonitride Phases by Means of RF Magnetron Sputtering and Ion Implantation
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Depositions and Characterizations of Boron Nitride Thin Films
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A Concept for the Deposition of Adherent Cubic Boron Nitride Films
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Cubic Boron Nitride Deposition in Large Scale Reactor Investigation of Deposition Conditions
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Growth of Cubic Boron Nitride Films by Triode Sputtering and IBAD : Development of Intrinsic Stress
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| E1 |
Mechanisms of Vapor Phase Lubrication with Organo-Phosphate Lubricants
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Low Friction and Wear Thin Films from Inortanic Fullerene-like (IF) MoS2 Nanoparticles
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MoS2 -Metal Mixtures: Wear Mechanisms and Film Structure
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Correlation of Plasma Conditions to Structural Properties for a MoS2/TiN Solid Lubricated Coating System Deposited by Unbalanced Magnetron sputtering
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Tribological Properties under Vacuum of Metal Doped MoS2 Magnetron Sputtered Films
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Properties of MoS2/Metalllic, Non Metallic Composite Coatings Deposited by Closed Field Unbalanced Magnetron Sputter Ion Plating
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Properties of Rubbed and Unworn Bulk MoS2 Material, MoS2 and MoS2 /Titanium Composite Coatings Deposited by Closed Field Unbalanced Magnetron Sputter Ion Plating
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Enhancement of Abrasive Ability of Diamond Film Coated with Solid Lubricant Film
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No Title Listed
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| F1/E4 |
Analysis of Sub-Micron Indentation Testing with Spherical Indenters
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Determination of Mechanical Film Properties of a Bilayer System due to Elastic Indentation Measurements with a Spherical Indenter
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Determining the Accuracy of Film Properties Computed with the Finite Element Method
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Nanoindentation of a-C and a-C:N Thin Films Prepared by Shielded Arc Ion Plating
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An Investigation of Small Scale Repetitive Impact Testing of Surfaces and Thin Films.
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Porous Chiral Thin Films: Characterization and Mechanical Properties
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Dynamic Stiffness and Creep Behavior of Magnetic Tapes
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Microstructure-property Relationships in Arc-Evaporated Cr-N Coatings
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The Importance of Temperature as a Nano-scale Mechanical Testing Parameter
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| G5 |
Principles of Pulsed Power Discharges for Plasma Processing
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Emergent Technologies for Large Area PVD Coating
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Design of a Magnetic Pole Enhanced Inductively Coupled Plasma Source
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Improving the Durability of Optical Coatings Through Pulsed Magnetron Sputtering
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The Pulsed-plasma Activated Treatment (PAT) Process - Fundamentals and Applications
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Comparison of Microstructure and Properties of SiO2 Coatings Deposited by Reactive Pulsed Magnetron Sputtering (PMS) and by Hollow Cathode Activated EB-Evaporation (HAD)
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Deposition of Oxide Films for Optical Applications by Reactive Gas Flow Sputtering (RGFS)
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PVD Coatings onto Metallic Sheets and Strips - New Developments and Results
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Coatings on Glass
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Fundamental Understanding of Materials Issues in Ferroelectric Thin Films
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Structural and Electrical Properties of Sr1-xBaxBi2Ta209 Films
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Influence of Excess Lead and Oxygen Contents on the Microstructure and the Feroroelectric Properties of Pb(Zr0.52 Ti0.48 )O3 Thin Films
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Oxidation Resistant Diffusion Barrier Layers for Integration of Ferroelectric Capacitors on Si
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Leakage Current Mechanism in (Ba,Sr)TiO3 Thin Films with Oxide Electrodes
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Studies of Hydrogen-Induced Degradation Processes inSrBi2Ta2O9 Thin Films Using Complementary In Situ Mass Spectroscopy of Recoiled Ions and Cross Section TEM Analysis
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Recovery of Forming Gas Damaged Pb(Nb,Zr,Ti)03 Capacitors
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