ICMCTF2000 Thursday Afternoon

New trends in DECR Plasma Technology : Applications to Novel Duplex Treatments and Process Combinations with Extreme Plasma Specifications

The Use of Intensified Plasma-assisted Processing to Produce m Phase in AISI 316 Stainless Steel

Characterization of Carburized Tantalum Layers Produced by Inductive RF Plasma

Filtered Arc Plasma Immersed Ion Nitriding and Duplex Processing of Large Area Complex Shape Articles

PCVD Coated Cemented Carbides - 10 years Experience in Industrial Practice

Preparation of SiC_xN_y Films by Microwave Plasma from Two Precursors : Comparison of the Incorporation of Carbon and Nitrogen

Deposition of Multicomponent Coatings Including Elements of B, C, N, O, Al, Si, Ti and Zr on Cemented Carbides Using Plasma Enhanced CVD

CVD of TiC_x/a-C-layers Under DC-pulse Discharge

Tungsten and Tungsten Carbon Multilayers Deposited by Inductively Coupled Plasma Source

Energy-Assisted Deposition of Hard Thin Film Coatings

Textured Titanium Oxide Thin Films Produced By Vacuum Arc Deposition

High Energy Metal Ion Beam Assisted Deposition of Cr_xN on Aluminum Substrates

PBII Processing of Dielectric Layers : Physical Sspects, Limitations and Experimental Results

Titanium Nitride and Titanium Carbo-nitride Coatings Deposited by a Novel PIIP-MOCVD Process

Low Energy Ion-Beam-Assisted Deposition of Transition Metal Nitride Thin Films on Silicon

Thin Film Fabrication of SiO₂ and SiN by Ion-Beam Assisted Deposition (IBAD)

Trimming the Thickness Gradients of Gas Permeable SiO₂ Layers with Different IBAD Conditions

Nanocrystalline Silicon Carbide Films Deposited by ECRCVD

Effects of the Addition of Helium on the Synthesis of Diamond Films

Optimization of Process Parameters in Hot Filament Chemical Vapor Deposition of Diamond and Carbon Nitride Thin Films

Influence of Different Physical Factors on Microstructure and Properties of Magnetron Sputtered a-C Films

Synthesis and Characterization of Pulsed-laser Deposited Amorphous Carbon Films

Chemical Vapour Deposition of Diamond Films from CH/H2/N2 Mixtures - Experiment and Modelling

Effect of Substrate Biasing on Magnetoplasmadynamic Accelerator Assisted Synthesis of Diamond

Deposition of Undoped and Doped Textured Diamond Layers

Adherent Diamond Coatings on Stainless Steel Substrates using Multilayers

Effects on the Deposition and Mechanical Properties of Diamond-like Carbon Film Using Different Inert Gases in Methane Plasma

Issues Related to Tribological Characterization of DLC films

Tribochemical Effects on CN_x Films

Non Wetting Properties of Modified DLC and Chromium Nitride Films

Comparative Study of the Tribological Moisture Sensitivity of Different Diamondlike Carbon Films

Invited - Missing - Ohmae

Synthesis, Characterization and Properties of: Nanocomposite DLC Films

Use of Diamond like Carbon and Diamond Coatings in Forming and Cutting of Aluminium

Trial Fabrication and Cutting Performance of c-BN-Coated Taps

Effect of Composition Modulation on the Tribological Performance of Metal Containing Diamond Like Carbon Coatings

Fluorocarbon Film Growth From Polyatomic Ions: Implications for Plasma Polymerization

Etching SiO₂ Aerogel of Film using CF₄/H₂ Plasma in Reactive Ion Etching

Nucleation and Growth of Metal Oxide Deposited by PVD on Surfaces of Poly(ethylene terephthalate) and Oriented Polypropylene

Microstructural and Chemical Characterization of Compositionally Modified Metal Oxide Gas Barrier Films.

Micro-disperse Particles as Probes for Plasma Surface Interaction

The Bilayer Structure of Al-0.5 wt.%Cu Film Induced by Ar Sputtering Pretreatment

The Growth Process of some Metallic Films Deposited by Sputtering

A Numerical Model of Nitrogen Diffusion-precipitation in Low Alloy Iron

High Rate and process Control of Reactive Sputtering by Gas Pulsing: Tthe Ti - O Syste,

Characterization of 9,10-anthraquinone and 1,4-/1,8-dihydroxy-9,10-anthraquinone Films