ICMCTF1998 Wednesday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Wednesday, April 29, 1998
1:30 PM 2:30 PM 3:30 PM 4:30 PM 5:30 PM
Influence of the Surface Roughness on the Oxide Scale Formation on MCrAlY Coatings Studied In Situ by High Temperature X-ray Diffraction
Molten Aluminum Corrosion Resistance of Ceramic Thermal Spray Coatings
Oxide Scale Growth on MCrAly Coatings After Pulsed Electron Beam Treatment
Relation Between the Oxidation Protection of Stabilised ZrO2 Coatings at High Temperatures and Residual Coating Stress
CVD Mullite Coatings for Corrosion Protection of Si-Based Ceramics
Deposition of Functional Oxide Layers for High Temperature Applications by Filtered Cathodic Arc Plasma Deposition
Thermal Stability of Al-O-N PVD Diffusion Barriers
Life Time Modeling at the High Temperature Oxidation of Coatings and Alloys for Gas Turbine Blades
Corrosion Behaviour of Plasma-Spray Coated Functionally Gradient Materials
Oxidation Behaviour of Plasma-Spray Coated Functionally Gradient Materials
Understanding Gas-Phase Reactions in the Thermal CVD of Hard Coatings Using Computational Methods
LPCVD and PACVD (Ti,Al)N Films: Morphology and Mechanical Properties
Low Temperature MOCVD of V-C-N Coatings Using Bis(arene)vanadium as Precursors
Deposition and Characterization of Zirconium-Based MOCVD Coatings
LPCVD, PACVD and PVD (Ti,Al)N Films : Comparison Between PCV and CVD Processes
Mechanical Properties, Structure and Oxidation Behaviour of (Ti1-xAlx)N-hard Coatings Deposited by Pulsed dc Plasma-assisted Chemical Vapor Deposition (PACVD)
Low Resistivity Tungsten CVD Using B2H6 Additions
Combinations of Coating and Heat Treating Processes: Establishing a System for Combined Processes and Examples
Chromazing and Aluminizing Processes Performed by CVD-Fluidized Bed Reactor in Iron Base Materials
Advances in the Characterisation of Multilayered and Related Coatings Using Electron Energy Loss Spectroscopy in the TEM
Microstructure and Electronic Properties of the Refractory Semiconductor ScN Grown on MgO(001) by Ultra-High Vacuum Reactive Magnetron Sputter Deposition
Growth and Properties of Epitaxial CrN(001) Layers Deposited by UHV Reactive Magnetron Sputtering
Tribological Properties of Graded Cr-N Coatings Deposited by Cathodic Arc Evaporation
Residual Stress in Coated Cemented Carbide Following Post Ion Implantation into the Coating
The Influence of the Ion Bombardment on the Optical Properties of TiNx and ZrNx Coatings
Structure and Properties of Compositionally Graded Aluminum Oxynitride Thin Films
Physical, Structural and Mechanical Characterization of Ti1-xSixN Films
Improving the Properties of TiN by Incorporation of Silicon
The Influence of Yttrium Distribution in the Growth Direction on the Structure and Properties of TiAlCrYN Coatings
Microstructural Changes in CVD Coated Cutting Tools During Turning Operations.
Tribological and Mechanical Properties of CNx Thin Films
In Situ Diagnostics of c-BN Film Gowth by IR Reflection Spectroscopy
Influence of Water Vapour and Oxygen on the Tribological Behaviour of Diamond Coatings / Steel Couple
Characteristics of Carbon Nitride Films Synthesized by Chemical Vapor Deposition
Cutting Applications of DLC, Hard Carbon and Diamond Films
Stress Issues in Wafer-Scale CVD Diamond Fabrication
Use of Pulsed High Power Ion Beams to Enhance Tribological Properties of Stainless Steel, Ti, and Al
Characterisation of the Failure of Thin Hard Coatings Under Pure Bending
A Laser-acoustic Method for Testing and Classifying Hard Surface Layers
Fatigue-Corrosion Behavior of a Heat Treated AISI 1045 Carbon Steel Coated with Ni-P Electroless
Nanoindentation of Atomically Modified Surfaces
Mechanical Properties of SiO2 and Si3N4 Coatings: A BAM-NIST Cooperative Project
Modelling Microhardness of Electroplated Nickel on Copper Substrates
Finite Element Modeling of Contact Stresses in Monolayer Thin Films
Nano- and Micro- Tribology of Molybdenum Oxide Thin Films Having Controlled Microstructure
Progress in Pulsed Plasma Technologies
Pulse Duration in Pulse-power Reactive Sputtering of Dielectrics
Deposition of Functional Layer Stacks on Web by Pulse Magnetron Sputtering
Reactive Sputtering of Oxides with Dual Magnetrons for Large Area Applications
Comparison of SnO2 Films Prepared by DC and MF Reactive Sputtering
Better Aluminum Mirrors by Integrating Plasma Pretreatment, Sputtering, and Plasma Polymerization for Large Scale Car Headlight Production
Economic Aspects and Potential of Large-Area Sol-Gel Coatings
High Speed Pretreatment of Plastic Webs
Pulse-power Hollow Cathode
Electrochemical Deposition for High-Performance Semicondutor Interconnects
Selective Electroplating of Gold Films on Silicon Seeded with Sb+ Ion Implantation
Tantalum Silicide Sputtering Target Material for Amorphous Ta-Si-N Diffusion Barrier for Cu Metallization
Characterization of a PECVD W2N Process Using N2, H2 & WF6
TiN Reactive Sputter Deposition Studied as a Function of the Pumping Speed
Optimal Programmed Rate Chemical Vapor Deposition of Tungsten
Synthesis and Processing of a Cu-In-Ga-Se Sputtering Target
Determination of Phase Formation Sequences and Activation Energies of Copper, Indium, Gallium, and Selenium Thin Films.
GaAs MESFETs Fabricated With Pd/Sn and Pd/Sn/Au Ohmic Contacts - A Preliminary Investigation
Sessions | Time Periods | Topics | Schedule Overview