ICMCTF1998 Wednesday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
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Click a Session in the first column to view session papers.
| Session | Wednesday, April 29, 1998 | |||||||||||||
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| 1:30 PM | 2:30 PM | 3:30 PM | 4:30 PM | 5:30 PM | ||||||||||
| A1-2 |
Influence of the Surface Roughness on the Oxide Scale Formation on MCrAlY Coatings Studied In Situ by High Temperature X-ray Diffraction
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Molten Aluminum Corrosion Resistance of Ceramic Thermal Spray Coatings
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Oxide Scale Growth on MCrAly Coatings After Pulsed Electron Beam Treatment
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Relation Between the Oxidation Protection of Stabilised ZrO2 Coatings at High Temperatures and Residual Coating Stress
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CVD Mullite Coatings for Corrosion Protection of Si-Based Ceramics
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Break
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Deposition of Functional Oxide Layers for High Temperature Applications by Filtered Cathodic Arc Plasma Deposition
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Thermal Stability of Al-O-N PVD Diffusion Barriers
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Life Time Modeling at the High Temperature Oxidation of Coatings and Alloys for Gas Turbine Blades
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Corrosion Behaviour of Plasma-Spray Coated Functionally Gradient Materials
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Oxidation Behaviour of Plasma-Spray Coated Functionally Gradient Materials
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| B2-2 |
Understanding Gas-Phase Reactions in the Thermal CVD of Hard Coatings Using Computational Methods
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LPCVD and PACVD (Ti,Al)N Films: Morphology and Mechanical Properties
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Low Temperature MOCVD of V-C-N Coatings Using Bis(arene)vanadium as Precursors
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Deposition and Characterization of Zirconium-Based MOCVD Coatings
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LPCVD, PACVD and PVD (Ti,Al)N Films : Comparison Between PCV and CVD Processes
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Mechanical Properties, Structure and Oxidation Behaviour of (Ti1-xAlx)N-hard Coatings Deposited by Pulsed dc Plasma-assisted Chemical Vapor Deposition (PACVD)
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Low Resistivity Tungsten CVD Using B2H6 Additions
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Combinations of Coating and Heat Treating Processes: Establishing a System for Combined Processes and Examples
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Chromazing and Aluminizing Processes Performed by CVD-Fluidized Bed Reactor in Iron Base Materials
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| B3/F4 |
Advances in the Characterisation of Multilayered and Related Coatings Using Electron Energy Loss Spectroscopy in the TEM
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Microstructure and Electronic Properties of the Refractory Semiconductor ScN Grown on MgO(001) by Ultra-High Vacuum Reactive Magnetron Sputter Deposition
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Growth and Properties of Epitaxial CrN(001) Layers Deposited by UHV Reactive Magnetron Sputtering
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Tribological Properties of Graded Cr-N Coatings Deposited by Cathodic Arc Evaporation
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Residual Stress in Coated Cemented Carbide Following Post Ion Implantation into the Coating
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The Influence of the Ion Bombardment on the Optical Properties of TiNx and ZrNx Coatings
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Structure and Properties of Compositionally Graded Aluminum Oxynitride Thin Films
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Physical, Structural and Mechanical Characterization of Ti1-xSixN Films
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Improving the Properties of TiN by Incorporation of Silicon
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The Influence of Yttrium Distribution in the Growth Direction on the Structure and Properties of TiAlCrYN Coatings
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Microstructural Changes in CVD Coated Cutting Tools During Turning Operations.
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| D4/E5 |
Tribological and Mechanical Properties of CNx Thin Films
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In Situ Diagnostics of c-BN Film Gowth by IR Reflection Spectroscopy
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Influence of Water Vapour and Oxygen on the Tribological Behaviour of Diamond Coatings / Steel Couple
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Characteristics of Carbon Nitride Films Synthesized by Chemical Vapor Deposition
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Cutting Applications of DLC, Hard Carbon and Diamond Films
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Stress Issues in Wafer-Scale CVD Diamond Fabrication
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| E4-F1-2 |
Use of Pulsed High Power Ion Beams to Enhance Tribological Properties of Stainless Steel, Ti, and Al
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Characterisation of the Failure of Thin Hard Coatings Under Pure Bending
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A Laser-acoustic Method for Testing and Classifying Hard Surface Layers
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Fatigue-Corrosion Behavior of a Heat Treated AISI 1045 Carbon Steel Coated with Ni-P Electroless
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Nanoindentation of Atomically Modified Surfaces
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Mechanical Properties of SiO2 and Si3N4 Coatings: A BAM-NIST Cooperative Project
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Modelling Microhardness of Electroplated Nickel on Copper Substrates
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Finite Element Modeling of Contact Stresses in Monolayer Thin Films
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Nano- and Micro- Tribology of Molybdenum Oxide Thin Films Having Controlled Microstructure
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| G6 |
Progress in Pulsed Plasma Technologies
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Pulse Duration in Pulse-power Reactive Sputtering of Dielectrics
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Deposition of Functional Layer Stacks on Web by Pulse Magnetron Sputtering
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Reactive Sputtering of Oxides with Dual Magnetrons for Large Area Applications
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Comparison of SnO2 Films Prepared by DC and MF Reactive Sputtering
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Better Aluminum Mirrors by Integrating Plasma Pretreatment, Sputtering, and Plasma Polymerization for Large Scale Car Headlight Production
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Economic Aspects and Potential of Large-Area Sol-Gel Coatings
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High Speed Pretreatment of Plastic Webs
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Pulse-power Hollow Cathode
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| H1-2 |
Electrochemical Deposition for High-Performance Semicondutor Interconnects
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Selective Electroplating of Gold Films on Silicon Seeded with Sb+ Ion Implantation
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Tantalum Silicide Sputtering Target Material for Amorphous Ta-Si-N Diffusion Barrier for Cu Metallization
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Characterization of a PECVD W2N Process Using N2, H2 & WF6
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TiN Reactive Sputter Deposition Studied as a Function of the Pumping Speed
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Optimal Programmed Rate Chemical Vapor Deposition of Tungsten
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Synthesis and Processing of a Cu-In-Ga-Se Sputtering Target
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Determination of Phase Formation Sequences and Activation Energies of Copper, Indium, Gallium, and Selenium Thin Films.
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GaAs MESFETs Fabricated With Pd/Sn and Pd/Sn/Au Ohmic Contacts - A Preliminary Investigation
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