ICMCTF1998 Thursday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Thursday, April 30, 1998
1:30 PM 2:30 PM 3:30 PM 4:30 PM
B1-4
Hybrid Processes - A Versatile Technique to Match Process Requirements and Coating Needs
Graded TiAlN/Al2O3 and (Ti,Al)O-N CoatingsDeposited by High Ion Sputtering (H.I.S.TM) PVD-process Technique
Mechanical and Electrical Properties of FCC TiO1+x Thin Films Prepared by RF Reactive Sputtering
PVD Hard Coatings for High Speed Dry Cutting of Hard Materials
Coatings in the Chromium-Carbon System.
Cratering Behavior in Single- and Poly-crystalline Copper Irradiated by an Intense Pulsed Ion Beam
High Purity Nano-crystalline Carbon Nitride Films Prepared at Ambient Temperature by Ion Beam Deposition
Effects of Ionization Power to Ion Energy Distribution in Ionized Sputtering Measured by an Energy-resolved Mass Spectrometer
E3-2
The Effect of Nitrogen Pressure on Structure and Molten Aluminum Resistance of Arc Ion Plated Cr-N Coatings
Corrosion Tests of PVD Coatings with Die Dressing Used for Al High Pressure Die Casting Dies
Friction and Wear Behavior of Self Lubricating Polymer/Steel Plasma Sprayed Coating Systems
Characterisation of Unbalanced Magnetron Sputter Deposited Chromium Diboride Coatings
On the Corrosion Behavior of TiN-coated AlSl D2 Steel
Hot Gas Erosion Resistance of a Vapor-deposited Cu-Cr Coating
Some Properties of Boronized AISI 440C and AISI 316L Stainless Steels
Chloride Induced Pitting Corrosion of Zirconium
Galvanic Protection and Friction Properties of High Strength Steel Fasteners Sputter Coated with Aluminium or Zinc Alloys
E5/D4-2
Tribological Properties of Carbon Nitride Coating by Ion Beam Assisted Deposition
Friction Mechanism of Diamond-like Carbon: Effect of Gas and Temperature
Tribological Fundamantals and Potential Applications of c-BN Films
Fretting Wear Behavior of Diamondlike Carbon (DLC) Coated Ti-6Al-4V
Nanostructure and Photoconductivity Studies of a-DLC Films Deposited by RF Plasma
Auto-lubrication of Diamond Coatings at High Sliding Speed
Industrial Applications of Diamond Coated Cutting Tools with Adapted Surface Morphologies Coated in an Innovative Hot-Filament Production Unit
A Study of the Tribological Properties of Thick Sputtered Carbon Films.
Cylindrical CVD Diamond for High Performance Small Abrading Devices
F3
Characterization of Metal Coatings and Thin Films Using a Synchrotron Light Source
Reaction of CO with the Ion-Bombarded Ni(111) Surface
Depth-Profiling of Nonconductive Oxidic Multilayers with Plasma-based SNMS in HF Mode
In Situ Analysis of the Nucleation and Initial Growth of Multi-Component Oxide Films Using Mass Spectroscopy of Recoiled Ions
Break
Growth of C60 Films on Metal Surfaces
FIB Machined Sub-Micron Thickness Cantilevers for the Study of Thin Film Properties
Electrodeposition of Ni-P-SiC Composites in Replacement of Chromium Six Valance (Cr+) Coating
Electrical and Microwave Characterization of Kanthal Thin Films: Temperature and Size Effect
G5-2
Application of Advanced Surface Engineering Treatments to Multi-Point Cutting Edges
Dry Punching with Dies Coated with Multilayer and Autolubricant PVD Coatings
Performance of Oxygen-rich TiAlON-coatings for Dry Cutting Applications
Duplex Tin + MOS2 Based PVD Coated Hobs for Dry and High Speed Machining
High Speed Cutting of Dies and Moulds with Ti0.43Al0.52Cr0.03Y0.02N Coated Cemented Carbide Tools
Surface Modification of Hard Metal Cutting Tools for Improved Adhesion of Diamond Coatings
Smart Tools: Direct Measurement of Wear and Temperature by Novel Hard Coating Systems with Integrated Thin Film Sensors
Deposition of Ti-C-N Coatings Onto Large-diameter Tip Saw at Low Substrate Temperature
TiAlN by Low Cost Dual Electron Beam Evaporation Using Optical Spectroscopic Control
H3
Advanced Applications of Orbital CMP Technology
Non-Contact Post-CMP Cleaning
Assessment of Post-CMP Cleaning Mechanisms Using Statistically-Designed Experiments
A Modified Multi-Chemicals Spray Cleaning for Post STI CMP Cleaning Application
Summary of Recent Developments in CMP Modelling
Chemical-Mechanical Polishig for Current-in-Plane Giant Magnetoresistance Device Integration
Material Characteristics and Chemical Mechanical Polishing of Aluminum Alloy Thin Films.
Copper CMP for Damascene Patterned Cu-Polymer Interconnects
Sessions | Time Periods | Topics | Schedule Overview