ICMCTF1998 Friday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Friday, May 1, 1998
8:30 AM 9:30 AM 10:30 AM 11:30 AM
High IntensePulsed Ion-beam Sources and their Industrial Application
Carbon, Nitrogen and Oxygen Implantation Into TiN Coatings
Processing of Metals by Plasma Immersion Ion Implantation for Improved Mechanical Properties
Formation of Hard Coatings for Tribological and Corrosion Protection by Dynamic Ion Mixing
Deposition of Metal Nitrides by IBAD
Non-Uniform SiO2 Membranes Produced by Ion Beam Assisted Chemical Vapor Deposition To Tune WO3 Gas Sensor Microarrays
Intrinsic Stress in Ion Synthesized Materials
Formation of Carbon Nitride Films by Means of Simultaneous Positive and Negative Ion Beam Deposition
Optical Thin Film Coatings: Influence of Ion-Mass and Energy During the Ion-Beam-Assisted Deposition
Structural Investigations of Chromium Nitride Films Formed by Ion Beam Assisted Deposition
Hexagonal Ntride Coatings:Electronic and Mechanical Properties of V2N, Cr2N and MoN
Surface- and Microanalytical Characterization of Silicon-Carbonitride Thin Films Prepared by Means of RF Magnetron Co-Sputtering
Fundamental Characterization of Carbide and Nitride Coating Materials: Correlation of Surface Composition and Frictional Properties
Corrosion of Titanium-nitride Encapsulated Silver Films Exposed to a Hydrogen-sulfide Ambient.
Sputter Deposited Chromium Nitride Based Ternary Compounds for Hard Coatings
Atomistic Simulations of the Generation of a New Kind of Hydrocarbon Thin Film Through Molecular Cluster-Solid Surface Collisions
Change in Residual Stresses of TiN Films with Annealing Treatments.
Effect of External Magnetic Field on c-Axis Orientation and Residual Stress in AlN Films
The Status and Future of Diamond Thin Film FED
Carbon Cathode Requirements and Emission Characterization for Low-voltage Field Emission Displays
Electron Field Emission from Amorphous Carbon Thin Films
Field Electron Emission from Ultrathin Diamond-Like Carbon Films Deposited Using an RF Inductively Coupled Plasma (ICP) Source
Field Emission Spectroscopy on Carbon Thin Films
Work Function of Transparent Conducting Multicomponent Oxide Thin Films Prepared by Magnetron Sputtering
Application of High Temperature Deposited Aluminum Gate Electrode to the Fabrication of a-Si:H TFT
Sessions | Time Periods | Topics | Schedule Overview