AVS 72 Friday Morning

Environmental Radioactivity at the Department of Energy’s Hanford Site: Sources and Sinks

Reaching the Monolayer Limit in a van der Waals Actinide Magnet

Theory of High-Resolution X-Ray Absorption and Resonant Inelastic X-Ray Scattering: Focus on Intermediate Valency

Electronic Structure Studies of Tetravalent Actinides by Solid State NMR Spectroscopy

High-Resolution X-ray Spectroscopic Studies on Protactinium and Actinium

Manufacturing to Performance: Advanced Characterization of Nuclear Fuels

Cooperative Phenomena in Locally Non-Centrosymmetric Heavy-Systems and Raman Effect in Cecosi

Statistical Enhancement of Fissile Isotope Discrimination via Superposition of Fission-Track Clusters

Accelerating Discovery and Design for Thin Film Polymer Self-Assembly through Machine Learning

Autonomous Discovery of PFAS-Free Low Surface Energy Thin Films

Process Informatics Framework for Optimizing Thin-Film Deposition in Advanced Semiconductor Manufacturing

Physics-Informed AI for Semiconductor Equipment Status Estimation and Process Quality Prediction: Equipment Manufacturer's Perspective

Multi-Objective Optimization of the Operational Durability of Meniscus-coated Perovskite Solar Cells

In the Design of Thin Charge-Transport Films for Perovskite Solar Cells, Predictions from Machine Learning and Physics Only Partially Overlap

Closed-Loop Ai Workflow for Literature-Guided Perovskite Thin-Film Discovery

Multimodal AI Meets Materials Characterization

Building Informative Materials Datasets Beyond Targeted Objectives

Panel: Funding Agencies

Machine Learning for Electronic Materials Discovery and Synthesis

Exploration of Limiting Factors for c-BN Growth by Ion-Beam Assisted Molecular Beam Epitaxy

Tuning the Physicochemical Properties of Polymer-like a-C:H Thin Films via Ultraviolet C (UV-C) Irradiation

Aerosol–Assisted CVD of NbN Using Novel Thermally Stable Niobium Imido Single–Source Precursors

Ta Doping in MBE Grown WSe₂ 2D Semiconductor

Multilinear Regression Modeling of SiO₂ PECVD Deposition Based on Full Factorial Experiments

Transition Metal-Doped Sodium Niobate Thin Films: Microstructure, Ferroelectric Phase Stabilization, and Implications for Plasma-Assisted Catalysis

Development of Metallic Gate Stacks at Atomic Scale : Application to Advanced FD-SOI Transistors

Towards Ordered Growth of Complex Oxide Thin Films for Memristive Devices

Electron beam lithography enabled nano EC-RAM development and fabrication

Limitations of Layered Dielectrics

Analyzing Plasma-Enhanced ALD of III-Nitrides via Experimental and Theoretical Studies

Optical Bandgap and Thermal Stability Driven High–κ Engineering of HfAlO Dielectrics on a 200 mm ALD Platform

Atomic Layer Deposition Metal and Barrier Layers Enabling Next Generation Interconnects

Tuning the Mechanical Properties of Silica Aerogels Using Atomic Layer Deposition

Multilayer FUV Coatings Using ALD-Grown LaF₃ and ZrF₄

Controlling the Crystallinity of V₂O₅ Deposited by Plasma-Enhanced Atomic Layer Deposition

Epitaxial Growth of VN on Si₃N₄(0001)/Si(111) Using Molecular Beam Epitaxy

Plasma-Enhanced ALD of SiO₂ with an Alternative Precursor: From Mechanistic Insight to Area-Selective Deposition

Temperature-Dependent Growth Behavior of Aluminum Oxide Using Dimethylaluminum Isopropoxide and Water

Void-free Thermal ALD BaTiO3 Thin Films Prepared by Removing Water Dose after Ba Precursor

Optimizing Molybdenum Pentachloride Delivery for Vapor Deposition Processes

Atomic Layer Modulation of Ru-Ir Alloy Thin Films for Low-Resistivity Interconnect Applications

Pulsed Thermal Etching of Amorphous TiO₂ Thin Films Using MoCl₅

Grain Structure Control of Evaporated Li Metal Films for Optimized Solid State Batteries

Unravelling the Mechanism of Al2O3 Atomic Layer Deposition on Li₆PS₅Cl for All-Solid-State Batteries

Engineered Cathode Chemomechanics Enables Ultra-Low Stack Pressure Solid-State Batteries

Pulsed Laser Deposition of Solid Electrolytes: How Limited Thermal-Budget Processing Relates to Li-ion Conductivity

Open-Circuit Energy Band Alignment at NMC/LLZTO and LLZTO/Li Interfaces for Solid-State Microbattery Applications

LiPON-Enabled Reduction of V2O5 during Fabrication of Thin-Film Ionic Devices

Semiconductor Manufacturing Metrology

High Performance Computing and Artificial Intelligence Enabled Materials Characterization and Experimental Automation

Challenges in Real-Time Plasma-Surface Diagnostics

Gaede Langmuir Award Talk: Investigation of Solid-Solid and Solid-Liquid Interfaces under Electrical Potential via XPS and EIS 

in Situ Molecular Imaging of Ion Clusters Reveals the Acid Gas Capture Capacity and Mechanism of Water-Lean Ionic Liquids

Modulating Active Site for Water Electrolysis

Synthesis and in Situ Characterization of Simulated Hanford Tank Waste Models in Aqueous Solution

Accessing Surfaces and Interfaces in the Modern Scientific Era: An Overview of Important Instrumentation Advances

Studying Electrified Catalysis at the Laboratory and at Synchrotron End Stations

Energy Flux from Non-Thermal Discharges Measured via Nanocalorimetry: Toward Plasma Standard Development

Advances Packaging Approaches for Chiplet Solutions

Advanced Packaging Enables the Future of the Semiconductor Industry

Heterogeneous Integration Enabled by Fanout Wafer Level Packaging Prototyping Facility and Activities at Arizona State University

Maskless Lithography for Wafer and Panel-Level Advanced Packaging: Enabling Adaptive Patterning Beyond Reticle Limits

Development of a Domestic Fan-Out Wafer-Level Packaging Platform for Advanced Heterogeneous Integration

SCAPEx: Status of Onshoring Secure 300mm Wafer Bumping and TSV Wafer Finishing

On-Shore Sustainable Organic IC Substrate (ICS) Fabrication

Impact of Formic Acid Distribution on Fluxless Reflow: Enhancing Process Uniformity and Performance

Bilayer Liners for Through Glass Vias with PVD and ALD Deposited Seed Layer and Fully Copper Plated Vias

Thin Film Characterization and Mechanisms EnablingExtreme Laser Lift-off (LLO)

Plasma Surface Engineering for Low Distortion Wafer Bonding

Low Energy Remote Plasma and Non-Plasma Methods for Highly Selective Etching of Advanced Nanodevices

A Novel Si Etch Chemistry for CFET Fin Definition

Creation and Recovery of Defects in Lead Zirconate Titanate Thin-Films introduced by Inductively Coupled Plasma Reactive Ion Etching

Plasma-Surface Interactions of Polyurea Deposited on SiO2 and SiNx with HF Plasmas

Long-Term Influence of Fluorine Containing Plasmas and Gases on Sapphire (Single-Crystal Al2O3) and Ni-Based Alloy Surfaces

Investigations of Oxygen-Containing Plasma Etching of Diamond

The Effect of Remote Ar Plasma Exposure on the Crystalline Structure of VO₂

Real-Time Control of Interfacial Dynamics Enables Electrocatalytic C-H and C-C Bond Transformation and Fuel Formation

Exploring Non-Thiol DDQ Self-Assembly on Au(111) through Cyclic Voltammetry, AmbientSTM, and XPS

Substrate Electrochemical Inertness as a Prerequisite for Reliable Electrocatalytic Characterization: Cu-Doped CNT Films Assessed by SECCM

Atomic-Scale Investigation of Li/Ag(111) Interfaces: New Phases, Li-Ag Alloy Formation and Lithiophilicity

Tracking Conducting Oxygen Ions in Solid Oxide Fuel CellElectrolytes by NAP-XPS

Enhancing Hydrogen Evolution via Cation-Regulated Interfacial Proton Transfer on Single-Atom Catalysts

Translating Interfacial Ion Activity to Electrochemical Reactivity

Caught in the Act: Correlating Chemical Transformations and Structural Evolution Under Reaction Conditions

The Importance of Interfacial Water for Achieving Long-Range Ordered Assemblies

Surface Hydration and Antifouling Activity of Zwitterionic Polymers

Energetics of Water and Methanol Adsorption on CO-Precovered Pt (111) Surfaces: Solvent - Adsorbate Interactions

High Vacuum MEMS Devices – Advances in Vacuum Technology in Microscale

Cassini - A MEMS Pirani with Range of 9 Order of Magnitude

AVS History Committee-Sponsored Talk: From Mercury Columns to Quantum-Based Standards: The Evolution of Vacuum and Pressure Metrology at NIST

Fast, Optimal Readout of a Tethered Optomechanical Pressure Sensor

Recent Updates to the NIST Helium Leak Calibration Service