AVS 69 Friday Morning

Stochastic Computing Enabled by 2D Memtransistors

Electrical Characteristics of Semi-Metallic 2H-NbSe₂ for Scalable Interconnects

Magneto-Transport Measurement and Maximum Entropy Mobility Spectrum Analysis in Semiconductor Substrates for Graphene Growth

What Are 2D Materials Good for?

The Study of Internal Ion Transport in Ionic CuInP₂S₆

Atomic Layer Etching of SiO₂ via H₂/SF₆ Plasma and TMA

Area Selective Deposition of HfO2 on Oxide and Nitride Surfaces

Surface Functionalization of SiN_x over SiO₂ with Aldehydes to Enable Area-Selective Atomic Layer Deposition

Surface Reactions During Atomic Layer Etching of Platinum by High-Density Nitrogen-Oxygen Plasma and Organic Acid Vapor

Isotropic Plasma-Thermal Atomic Layer Etching and in-Situ Atomic Layer Deposition Passivation of Aluminum Films for Superconducting Quantum Devices

Correlative Analysis Using Time-of-flight Secondary Ion Mass Spectrometry for Beam Sensitive Samples

Secondary Ion Mass Spectroscopy of Battery Surface and Interface Chemistry – Metrology and Applications

Characterizing Ion Distribution at the Solid-Electrolyte Interface in Solid-State Lithium Ion Batteries with ToF-SIMS

A Perspective on X-ray Photoelectron Spectroscopy (XPS) Peak Fitting, and Reporting of XPS Data Acquisition and Peak Fitting Parameters in the Literature

Unsupervised and Supervised Machine Learning Applied to ToF-SIMS of an Organic Matter-Rich Mudstone with Molecular Biomarker

Probing Thin Film Interfaces at the Nanoscale by Low Energy Ion Scattering

The Effect of Instrument Settings, Sample Distance, and Tilt on TofsimsSecondary Ion Intensities

Evaluation of Unaltered and Irradiated Nuclear Graphite Surfaces through Integrated Traditional XPS and HAXPES Techniques

Thin Film Challenges and Opportunities in a 3D-Evolving Memory Landscape

Patterning Challenges in the Era of Vertical Scaling

Plasma Etch Challenges and Innovations to Enable sub-26nm Pitch L/S Patterning with High-NA EUV

Area-Selective Deposition with Carborane and Aromatic Self-Assembled Monolayer Blocking Layers

Enabling Novel Infrared (IR) Materials for Next-Generation Applications

CO Characterized Pt/Cu(111) Single Atom Alloy (SAA) for the Hydrogenation of Unsaturated Aldehydes

Efficient Catalyst and Protection Layer of Ni/α-Al₂O₃ Catalysts for Improved H₂O/CO₂ Reforming Reaction of CH₄via Atomic Layer Deposition

Complementary Outer Atomic Layer Analysis of Catalyst Materials Using LEIS

Size-Selected Pt_n Cluster Electrocatalysts for Alcohol Oxidation

Calorimetric Energies of Metal Atoms within Nanoparticles on Oxide and Carbon Supports: Improved Size Dependencies, Adhesion Energies and Trends versus Metal Element with the Spherical Cap Model

An Air-Free Transfer Mechanism For FIB SEM

Correlative and In Situ TEM/APT Technique Reveals Insights into Early Oxide Film Formation in a High Entropy Alloy

Applications of Advanced Focused Ion Beam System to Energy Storage Materials

The Fabrication of Ruthenium single crystal specimen with Focused Ion Beam and Field Ion Microscopy for Atom Probe Tomography

Modeling and Experimental Demonstrations of Ion-Solid-Gas and Photon Beam Interactions During Nanoscale Synthesis

Displacement Damage and Total Ionizing Dose Response of Ga₂O₃ MOSFETs

Helium Ion Microscopy for Morphological Analysis of Thrombi Extracted via Thrombectomy for Acute Stroke

Energy Efficient Scaling in Microelectronics: Enabling a New Era in Computing for a Sustainable Future

Improving Asic Energy Efficiency from Systems to Silicon

Atomic Precision Advanced Manufacturing for Tunnel Field Effect Transistors

Materials, Devices, and Packaging Opportunities Towards a Super Energy Efficient Future

EUV Lithography Patterning towards Devices Nano Scaling

Break Healing and LER Mitigation for Low Dose EUV Exposure

Carbon Resist Microlens Etching in DF-CCP CF₄ Plasmas: Comparison between Modeling and Experiments

Investigations of Surface Reaction Mechanisms in Euv Induced Hydrogen Plasmas

Area Selective Processing Based on Physisorption to Improve Functions of Extreme Ultraviolet Resist

Recent Advances in Ga₂O₃ Material Development at AFRL

Reverse Lift-Off Process to Avoid Sidewall Artifacts Resulting from Dry Etching “Challenging” Materials

Control of Ge/Si Core/Shell Nanoparticles Growth In Pulsed Nonthermal Plasmas

Electrolyte Engineering for Nitrogen Fixation by Plasma Electrolysis

Two Atmospheric Pressure Plasma Jets Driven by Phase-Shifted Voltages: A Method to Control Plasma Properties at the Plasma–Surface Interface

Plasma Chemistry in Atmospheric Pressure Gases and Liquids: Fundamentals and Novel Applications

Increasing Adhesion of Polyurethane Painting on Aluminum by Atmospheric Pressure Plasma Jet Treatment

Fundamentals of Atmospheric Pressure Discharges for Plasma Catalytic Applications

Atmospheric Pressure Inductively Coupled Torus Torch System for 3D Printing the Silicon-Nanofiber (Si/CNF) Anodes for Li-ion Batteries

Design and Functionality of a Low-Frequency Pulsed Plasma System

Membrane Design by Atomic Layer Deposition

Ultrathin Transferable MOF/Polymer Janus Thin Films with Tunable Turing Morphologies

Growth of Metal-Organic Framework Thin Films by a Vapor-Assisted Conversion Method

Enhancing the Electrical and Optical Properties of Thermochromic VO₂: The Impact of Nanostructuring and Gold Nanoparticles

Atomic Layer Deposition of Sn-doped MoO₂ Electrode Films with Distorted Rutile Structure for High-performance TiO₂-based DRAM Capacitors

Area Selectivity and Crystallographic Orientation of Zif-8 Films Deposited by Molecular Layer Deposition

Electron-Beam Assisted Solvent-Free Bottom-Up Patterning of Zeolitic Imidazolate Frameworks

Al₂O₃ Atomic Layer Deposition on a Porous Matrix of Carbon Fibers (FiberForm) for Oxidation Resistance

Mesoporous UiO-66-NH₂ Thin Film Growth on TiO₂ Coated Fabrics Using Atomic Layer Deposition (ALD) for Enhanced Organophosphate Degradation