This talk will describe some recent results of a methodology called combinatorial substrate epitaxy (CSE), which we have used to understand the preferred epitaxial orientations (PEOs) of a wide range of heteroepitaxial structures and to fabricate various novel metastable materials. In this approach, the target compound is deposited on polished polycrystalline substrates, rather than commercial single crystals or buffer layers. The primary hypotheses underpinning CSE is that the each grain surface in the polycrystalline substrate can be treated as the equivalent of a single-crystal surface in a traditional DOE experiment, therefore providing every combination of substrate orientation in a single experiment. The local structure is probed in a scanning electron microscope using electron backscatter diffraction and automated orientation assignments. The method not only allows for hundreds of experiments to be carried out in a single growth run, it has the unique advantage of not being restricted to the use of commercially available single crystals.

This talk will focus on three important observations. First, when a film is grown on a polycrystal, the growth occurs by grain-over-grain epitaxy. In other words, films can grow on microcrystalline substrates in the same way they grow on millimeter scale substrates, or every grain is in an independent observation of growth. Second, there are PEOs, regardless of the substrate surface plane, and these can be easily predicted. For many of the cases we have observed, the PEO is the one that aligns the closest packed planes and directions in the eutactic (nearly close packed) arrangement of oxide ions in different structures. Third, we have already fabricated new and novel metastable coatings using this methodology, where novel substrates provide the epitaxial template to control phase formation. Observations relative to functional ceramics, including examples from the BO₂, B₂O₃, ABO₃, A₂BO₄, and A₂B₂O₇ families, will be described.

fluxes modulated with sub-monolayer resolution [1], deterministic growth simulations and nanoscale microstructure probes. Using this research concept we study structure formation within the archetype immiscible Ag-Cu binary system showing that atomic arrangement and morphology at different length scales is governed by diffusion of near-surface Ag atoms to encapsulate 3D Cu islands growing on 2D Ag layers [2]. Moreover, we explore the relevance of the mechanism outlined above for morphology evolution and structure formation within the miscible Ag-Au binary system. The knowledge generated and the methodology presented herein provides the scientific foundation for tailoring atomic arrangement and physical properties in a wide range of miscible and immiscible multinary systems.

[1] “A METHOD OF CONTROLLING IN-PLANE COMPOSITIONAL MODULATION”, Patent Pending Application, PCT/EP2014/052831.

[2] V. Elofsson, G.A. Almyras, B. Lü, R.D. Boyd, and K. Sarakinos, “Atomic arrangement in immiscible Ag-Cu alloys synthesized far-from-equilibrium”, Acta Mater. 110, 114 (2016).

Preventing materials failure and improving the performance of materials in nuclear reactors demand novel materials to serve under extreme environment conditions. For nuclear applications, tungsten (W) has been alloyed in the past with La and Re to improve its performance and properties including low fracture and high ductile to brittle transition. In this work, molybdenum (Mo) solute atoms were added to W matrix with the intention of creating interstitial point defects in the crystals that impede dislocation motion, increasing the hardness and young modulus of the material. Nanostructured W-Mo thin films with variable Mo content were deposited by the sputter-deposition. W-Mo films were stabilized in bcc structure of W. Studies showed that as grain size formation increases the residual stress distribution will reach the maximum and stabilize after a deposition temperature of 350 °C. The residual stress still continues to follow a parabolic pattern, indicating that the stresses mainly depend on grain organization rather than atomic packing. From Nano-scratch testing, it is found that depth penetration decreases with increasing sputtering temperature. The effect of Mo on the overall mechanical properties improvement in W-Mo nanostructured thin films will be presented and discussed.

Keywords: Tungsten-Molybdenum Thin Films, Mechanical Properties, Nano-Indentation

Nanostructured and amorphous coatings play an important role in today’s industrial applications. This is the case both in applications for cutting tools, as well as in applications for components.

In cutting tools nanostructured coatings with high hardness, including hot hardness, and ductility have been extremely helpful to increase the productivity of the machining process. On one hand superlattice multilayers have shown here great benefits and on the other hand nanocrystallites in the material have been created to give the coating materials an inherent high hardness and ductility.

In automotive coatings these material properties were leading to technological breakthroughs as well. First coatings on the market were nanostructured WC-C:H sputtered coatings, developed by Prof. Dimiggen of Fraunhofer IST. These developments were soon followed by hybrid a-C:H coatings, combining the WC-C:H developments with a multilayered structure to achieve a gradual adaptation of the Young’s modulus of the relatively soft steel as base material to the very hard a-C:H-DLC top layer. In this way it has been possible to produce coatings with a very high ductility, despite the high hardness. Hardness values as applied today on components are ranging from 2000-2500 HV for a-C:H coatings up to 4000-7000 HV for ta-C coatings.

The importance of petreatment and post treatment steps for cutting tools and components, being as important as the actual coating step, will be addressed in this talk.

The outstanding oxidation resistance, thermo-mechanical stability and chemical inertness of Al₂O₃ attracts particular attention in various industrial applications. Especially, in the field of protective barrier coatings there are many research activities focusing on the synthesis of the different polymorphs α- and γ-Al₂O₃ (corundum and cubic), respectively. Apart from the fact that the deposition of the thermodynamically stable α-Al₂O₃ is strongly limited by the depositing temperature, the formation of electrically isolating Al₂O₃ at the target surface leads to massive arcing processes and destabilizes the deposition process. These problems could be overcome by varying the powering method to pulsed DC and especially RF sputtering, but at the cost of decreased deposition rates and plasma densities.

Therefore, we study in detail the influence of small amounts of transition metals such as M = Cr, Nb, Mo, and W on the process stability and coating properties of reactive DC sputter deposited (Al_1-xM_x)₂O₃ thin films. To keep the influence of the alloying elements on the outstanding properties of alumina as low as possible only targets with alloying contents of x = 2 and 5 at.% are investigated. All micro-alloyed targets allow for significantly improved process stability and massively reduced arcing processes at the target as compared to the non-alloyed Al target. The morphology of all coatings deposited is highly dense, smooth and partly columnar with cubic γ-Al₂O₃ crystalline structure. The mechanical properties of the Cr, Mo, and W containing coatings are slightly enhanced by solid solution hardening in comparison to pure Al₂O₃ obtaining e.g. hardness values of about 25 GPa. In contrast, alloying contents of about 1 at.% Nb are already degrading the mechanical properties of alumina thin films. The significantly enhanced process stability when using Cr, Mo, and W alloyed Al targets, leads to coatings with improved thin film quality. Therefore, the oxidation resistance of these films even outperform the Al₂O₃ DC sputtered film.