Synchrotron-based techniques, such as X-ray absorption spectroscopy (XAS) and variable energy X-ray photoemission spectroscopy (XPS) are increasingly applied to the characterization of surfaces and interfaces of advanced materials. This presentation will introduce the XAS and variable energy XPS capabilities in the study of thin films and nanomaterials at the Canadian Light Source—the third generation synchrotron in Canada. Advantages of these techniques over the conventional techniques (such as lab-based XPS) will be demonstrated using examples in studies of two types of materials: (1) Gate oxide development on SiC and (2) heterogeneous nanocatalysts. In particular, examples using the recently commissioned high energy XPS at the SXRMB beamline (up to 10 KeV) will be highlighted.

Nowadays, the great challenge in materials science is the incorporation of complex systems in the area of the nano-technologies. A fundamental aspect is the production of materials with specific and controlled properties. Many of these materials are aggregates of different components, frequently multilayer thin films where the interface and the surface play a key role. Therefore, it is very important to develop an experimental set-up capable to investigate different aspects under identical experimental conditions, in particular to differentiate between surface and bulk properties.

Hard X-ray photoelectron spectroscopy (HAXPES) is a powerful novel emerging technique for bulk compositional, chemical and electronic properties determination in a non-destructive way. It benefits from the exceptionally large escape depth of high kinetic energy photoelectrons enabling the study of bulk and buried interfaces up to several tens of nanometres depth. At SpLine, the Spanish CRG beamline at the European Synchrotron Radiation Facility (ESRF), we have developed a novel and exceptional set-up that combine HAXPES and X-ray diffraction ( X-ray Reflectivity, Surface X-ray Diffraction, Grazing Incidence X-ray Diffraction and reciprocal space maps ). Both techniques can be operated simultaneously on the same sample and using the same excitation source. The set-up includes a robust 2S+3D diffractometer with its main axis vertical hosting an UHV chamber equipped with a unique photoelectron spectrometer (few eV < Ekin < 15keV), X-ray tube (Mg/Ti), 15 keV electron gun and auxiliary standard surface facilities: MBE, ion gun, LEED, sample heating/cooling system, leak valves, load-lock port, etc.. The photon energy ranges between 7 and 45 keV. The HAXPES analyzer is an electrostatic cylinder-sector (FOCUS HV CSA), with a compact geometry and high transmission due to second order focusing. The analyzer is capable to handle kinetic energies both up to 15 keV and down to a few eV with the same analyzer setup and power supply. The SpLine station offers a unique opportunity to obtain, on a same sample and under identical experimental conditions, simultaneous information about the electronic properties, chemical composition and geometric/crystalline structure of bulk, buried interfaces and surfaces. This novel tool for non-destructive characterization of bulk and buried interfaces is available to the scientific community.

A new class of electron microscope, vector potential photoelectron microscopy (VPPEM) has been developed. This microscope will enable the chemical microanalysis of a wide range of samples using photoelectron spectroscopy (PES). The microscope is a full field spectroscopic imaging technique with a very large equivalent depth of focus. The unique imaging properties of this method opens up many experimental opportunities incuding the chemical microanalysis of a wide range of real world samples. Highly structured, three dimensional samples, such as fiber mats and fracture surfaces can be imaged, as well as insulators, and magnetic materials. The new microscope uses the vector potential field from a solenoid magnet as a spatial reference for imaging. A prototype instrument has demonstrated imaging of Au grids, uncoated silk, magnetic steel wool, and micron sized single strand tungsten wires.

The fields of Hard X-ray Photoelectron Spectroscopy (HAXPES) and High Pressure Photoemission (HiPP) are growing fast. In this contribution we present instrument development and results within HAXPES and HiPP as well as the merged field of HiPP-HAXPES.

Photoelectron spectroscopy (PES) is an excellent tool in surface science due to the possibility to probe electronic and geometric structure. During the past decade Angle Resolved Photoelectron Spectroscopy (ARPES) has had a remarkable upswing, due to the development of parallel angular detector analyzers, and is today used routinely for band mapping, depth profiling and X-ray diffraction (XPD) in the Ultra Violet (UV) and soft X-ray regime. With higher energies (hard X-rays), in combination with improvements in PES detection techniques, this tool can be extended to the HAXPES regime, enabling studies of bulk materials. Here we demonstrate new development of analysers capable of measuring angular resolved spectra in the High Energy regime as well as results obtained using such analyzers.

Experiments done under normal surface science conditions (Ultra High Vacuum) are of limited use in some applications, e.g catalysis, due to the pressure gap problem. This motivates the study of systems at ambient pressures. Here we present a HiPP instrument developed in collaboration with Advanced Light Source (ALS). This instrument allows standard PES measurements as well as spatial and angle resolved spectra at HiPP conditions. Some recent results include spatially resolved investigations of solid oxide electrochemical cells (SOC:s) and electrochemical properties of junctions.

Finally, we report on recent advances in constructing a new generation of instrumentation combining HiPP and HAXPES. A novel electron analyser, designed for optimal transmission in combination with very efficient differential pumping, will be presented together with preliminary results.