AVS2006 Tuesday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Tuesday, November 14, 2006
2:00 PM 3:00 PM 4:00 PM 5:00 PM
BI-TuA
Substrate Rigidity Regulates the Formation and Maintenance of Tissues
Compartmentalized Bioreactor: In Vitro Model for Osteogenesis and Breast Cancer Metastasis
Bio-Microactuator using Cultured Cardiomyocytes
Integrin-Ligand Affinity Affects Neuron Outgrowth
Electronically Controlled Biointerface for Neuron Growth
Surface Chemical Gradients to Optimise Substrata for Self-Renewal of ES Cells
Tunable Biomimetic Artificial Extracellular Matrix Coatings
Plasma Polymer Gradients and Their Use for Cellular Guidance
BI+
Disposable Molecular Diagnostics: Microfluidic Laboratories for the Field
Surface Modification of Microfluidic Devices for Biological Applications
Study of FET Flow Control and Electrostatic Response of Charged Molecules in Nanofluidic Channels
Soft-state Biologic ASICs and nSERS for Quantitative Medicine
Challenges in Microfluidic Technology Development and Commercialization
Biomolecule Assembly and Functionality in Completely Packaged Microfluidic Devices
A Bio-MEMS Device for Modeling the Reflex-arc
EM-TuA
Processing of High-k Oxide Thin Films for High Energy Density Capacitors
Growth of Epitaxial γ-Al2O3 Films on 4H-SiC
SiC/SiO2 Interface and Near Interface Traps in SiC Based MOSFETs
Diffusion Barriers for High-Temperature Reliability of SiC Junction Field Effect Transistors
Boride-based Schottky Contacts to p-GaN
Materials Issues in Power Electronics: Silicon to Silicon Carbide
Optimized RIE Process for High Performance SiC BJTs
IPF-TuA
Future Nanosystems: Towards Systems Biology of the Individual Cell
Accelerating in the Future with Laser-Plasma Accelerators
Wireless "Non-Radiative" Energy Transfer
Neutron Stars and Black Holes
MI-TuA
Spin-Polarized Quantum-Well States in Ni/Cu Thin-Film Structures
Element-Resolved Phase and Amplitude of Magnetization Dynamics in Thin Magnetic Films
The Electronic Band Structure of CoS2
Magnetic Properties of the Thin Cr1-x Vx Films
Angle-Resolved Photoelectron Spectroscopy Study of Epitaxial CrO2 Films Grown on TiO2 Substrates
Growth and Magnetic Properties of Ferrimagnetic Mn4N(111) Films on GaN(0001)
Anisotropic X-Ray Magnetic Linear Dichroism at the Fe L2,3 Edges in Fe3O4 Thin Films
MN-TuA
Fabrication and Testing of NEMS Components Made from Nanocomposite Al-Mo Films
Chemical Mechanical Planarization of BCB Polymer Films: Effect of Cure Temperature
Borosilicate Glass Deep Etching in NLD Plasma by using Low GWP Gases
Molded Electromechanical Shift-Register Memories
Molecular Vapor Deposition Integration with MEMS Manufacturing
MS-TuA
Physics of Stress-Induced Performance Gain in Advanced MOSFET Devices
Defect Engineering by Short-Annealing-Time Methods for Ultrashallow Junction Formation
Virtual Integrated Processing for IC Manufacturing
Semiconductor Materials Challenges and Opportunities for Energy Efficient Power Conversion Technologies
Electrochemical Planarization of Copper Surfaces with Sub-Micron Features
Large-Scaled Line Plasma Production by Evanescent Microwave in a Narrow Rectangular Waveguide
Innovative Studies for Ultra High Aspect Ratio Deep Trench Etch
NS-TuA
Magnetization Reversal by Spin Injection: Ultra-fast and Ultra-small
Single-Crystal/Amorphous Si-SiO2 Multilayer Systems and Devices based on Si Nanomembranes
Characterization of Ga-Acceptor Nanoscale Wires in Si
Towards Nanowire-Based Thermocouple Arrays
Electrical Properties of Graphene Ribbon Transistors
Superconducting Proximity Effect In Graphene
Catalytic Nanodiode; Chemical Sensing of Gas Phase Catalytic Reaction by using Hot Electron Flows at Metal-Oxide Interface
Hydrogen Detection NEMS Devices Fabricated from Tunable Microstructure Pd-Ta-X Nanocomposites
PS1-TuA
Formation of Gas Barrier Films for Polymer Sheets with Metal Ion Source
Room Temperature Crystallization of ITO Films on Glass and PET Substrates using RF Plasma
Novel Technique for Processing Biomass by way of Atmospheric Pressure Plasma Processing
PS2-TuA
Highly-Selective and Low-Damage, Damascene Processes in Robust Porous Low-k/ Cu Interconnects
Plasma Confinement in Multi-frequency Plasma Process Chamber
Scaling of Dual Frequency Capacitively Coupled Plasma Etching Tools Above 100 MHz*
Patterning of Narrow SiOCH Trenches using the Late Porogen Removal Process
Profile Control and Sidewall Modifications of Narrow Porous ULK Trenches after Plasma Etching and Pore Sealing Treatments
Three-Dimensional Control of Interconnect Features: Sidewall Roughness Transfer During Patterning Processes
Dry Etch Process of Contact holes using Multi-Functional Hard Mask
SS1-TuA
Interfacial Strains in Nanocrystals Revealed by Coherent X-ray Diffraction
Binding Distances of Pi-conjugated Molecules on Cu(111) Studied by X-ray Standing Waves
Surface Segregation in a Polycrystalline Palladium-Copper Alloy
Sub-monolayer Sn/Cu(001) and Sn/Si/Cu(001) Structures
Epitaxial Growth of Gd Silicide Nanostructures on Si(001)
Impact of Intrinsic Vacancy Ordering on Nanoscale Morphology and Structure: (Group-III)xSey on Si(111)
Anisotropy in the Continuum Step Model: From Step Stiffness to Step-Edge Mobility*
Argon Beam Mediated Modification of Nanotube-Based Structures using Classical Molecular Dynamics
SS2-TuA
Wetting on Metal Surfaces at Ambient Conditions: A Photoemission Spectroscopy Study
Water Clusters Growth on Pd(111) and Ru(0001) Studied by STM
Effect of Oxygen on the Structure and Dissociation of Water on Ru(0001)
The True Ground State of Water Adlayers on Ru(0001)
Wetting and Multilayer Growth on Metal Surfaces
Adsorption and Desorption Kinetics on a Porous Solid: N2 on Amorphous Solid Water
TF+
Surface Functionalization for Selective Area ALD
Surface Mechanisms in Oxygen-Based Noble Metal Atomic Layer Deposition
Atomic Layer Deposition of Hafnium Silicate Gate Dielectric Layers
Mechanistic Details of TiN Atomic Layer Deposition (ALD) Processes
Surface Processes of Plasma-Assisted Atomic Layer Deposition
VT-TuA
Extreme High Vacuum (XHV): The Need, Production and Measurement
1450 m3 at 10-9 Pa: One of the KATRIN Challenges
XHV Experience at Daresbury Laboratory
Development of a New NIST Calibration Service Using the Comparison Method for Vacuum Gauges Spanning the Range 0.65 Pa to 130 kPa
A Comparison of the High Vacuum Standards of the National Physical Laboratory of India and the National Institute of Standards and Technology, USA at 0.05 Pa using the Spinning Rotor Gauge
A Linear Pressure Drop Gas Flow Calibrator
A Memory of Jim Lafferty
Sessions | Time Periods | Topics | Schedule Overview