AVS2006 Tuesday Afternoon

Substrate Rigidity Regulates the Formation and Maintenance of Tissues

Compartmentalized Bioreactor: In Vitro Model for Osteogenesis and Breast Cancer Metastasis

Bio-Microactuator using Cultured Cardiomyocytes

Integrin-Ligand Affinity Affects Neuron Outgrowth

Electronically Controlled Biointerface for Neuron Growth

Surface Chemical Gradients to Optimise Substrata for Self-Renewal of ES Cells

Tunable Biomimetic Artificial Extracellular Matrix Coatings

Plasma Polymer Gradients and Their Use for Cellular Guidance

Disposable Molecular Diagnostics: Microfluidic Laboratories for the Field

Surface Modification of Microfluidic Devices for Biological Applications

Study of FET Flow Control and Electrostatic Response of Charged Molecules in Nanofluidic Channels

Soft-state Biologic ASICs and nSERS for Quantitative Medicine

Challenges in Microfluidic Technology Development and Commercialization

Biomolecule Assembly and Functionality in Completely Packaged Microfluidic Devices

A Bio-MEMS Device for Modeling the Reflex-arc

Processing of High-k Oxide Thin Films for High Energy Density Capacitors

Growth of Epitaxial γ-Al₂O₃ Films on 4H-SiC

SiC/SiO₂ Interface and Near Interface Traps in SiC Based MOSFETs

Diffusion Barriers for High-Temperature Reliability of SiC Junction Field Effect Transistors

Boride-based Schottky Contacts to p-GaN

Materials Issues in Power Electronics: Silicon to Silicon Carbide

Optimized RIE Process for High Performance SiC BJTs

Future Nanosystems: Towards Systems Biology of the Individual Cell

Accelerating in the Future with Laser-Plasma Accelerators

Wireless "Non-Radiative" Energy Transfer

Neutron Stars and Black Holes

Spin-Polarized Quantum-Well States in Ni/Cu Thin-Film Structures

Element-Resolved Phase and Amplitude of Magnetization Dynamics in Thin Magnetic Films

The Electronic Band Structure of CoS2

Magnetic Properties of the Thin Cr_1-x V_x Films

Angle-Resolved Photoelectron Spectroscopy Study of Epitaxial CrO₂ Films Grown on TiO₂ Substrates

Growth and Magnetic Properties of Ferrimagnetic Mn₄N(111) Films on GaN(0001)

Anisotropic X-Ray Magnetic Linear Dichroism at the Fe L_2,3 Edges in Fe₃O₄ Thin Films

Fabrication and Testing of NEMS Components Made from Nanocomposite Al-Mo Films

Chemical Mechanical Planarization of BCB Polymer Films: Effect of Cure Temperature

Borosilicate Glass Deep Etching in NLD Plasma by using Low GWP Gases

Molded Electromechanical Shift-Register Memories

Molecular Vapor Deposition Integration with MEMS Manufacturing

Physics of Stress-Induced Performance Gain in Advanced MOSFET Devices

Defect Engineering by Short-Annealing-Time Methods for Ultrashallow Junction Formation

Virtual Integrated Processing for IC Manufacturing

Semiconductor Materials Challenges and Opportunities for Energy Efficient Power Conversion Technologies

Electrochemical Planarization of Copper Surfaces with Sub-Micron Features

Large-Scaled Line Plasma Production by Evanescent Microwave in a Narrow Rectangular Waveguide

Innovative Studies for Ultra High Aspect Ratio Deep Trench Etch

Magnetization Reversal by Spin Injection: Ultra-fast and Ultra-small

Single-Crystal/Amorphous Si-SiO2 Multilayer Systems and Devices based on Si Nanomembranes

Characterization of Ga-Acceptor Nanoscale Wires in Si

Towards Nanowire-Based Thermocouple Arrays

Electrical Properties of Graphene Ribbon Transistors

Superconducting Proximity Effect In Graphene

Catalytic Nanodiode; Chemical Sensing of Gas Phase Catalytic Reaction by using Hot Electron Flows at Metal-Oxide Interface

Hydrogen Detection NEMS Devices Fabricated from Tunable Microstructure Pd-Ta-X Nanocomposites

Formation of Gas Barrier Films for Polymer Sheets with Metal Ion Source

Room Temperature Crystallization of ITO Films on Glass and PET Substrates using RF Plasma

Novel Technique for Processing Biomass by way of Atmospheric Pressure Plasma Processing

Highly-Selective and Low-Damage, Damascene Processes in Robust Porous Low-k/ Cu Interconnects

Plasma Confinement in Multi-frequency Plasma Process Chamber

Scaling of Dual Frequency Capacitively Coupled Plasma Etching Tools Above 100 MHz*

Patterning of Narrow SiOCH Trenches using the Late Porogen Removal Process

Profile Control and Sidewall Modifications of Narrow Porous ULK Trenches after Plasma Etching and Pore Sealing Treatments

Three-Dimensional Control of Interconnect Features: Sidewall Roughness Transfer During Patterning Processes

Dry Etch Process of Contact holes using Multi-Functional Hard Mask

Interfacial Strains in Nanocrystals Revealed by Coherent X-ray Diffraction

Binding Distances of Pi-conjugated Molecules on Cu(111) Studied by X-ray Standing Waves

Surface Segregation in a Polycrystalline Palladium-Copper Alloy

Sub-monolayer Sn/Cu(001) and Sn/Si/Cu(001) Structures

Epitaxial Growth of Gd Silicide Nanostructures on Si(001)

Impact of Intrinsic Vacancy Ordering on Nanoscale Morphology and Structure: (Group-III)_xSe_y on Si(111)

Anisotropy in the Continuum Step Model: From Step Stiffness to Step-Edge Mobility*

Argon Beam Mediated Modification of Nanotube-Based Structures using Classical Molecular Dynamics

Wetting on Metal Surfaces at Ambient Conditions: A Photoemission Spectroscopy Study

Water Clusters Growth on Pd(111) and Ru(0001) Studied by STM

Effect of Oxygen on the Structure and Dissociation of Water on Ru(0001)

The True Ground State of Water Adlayers on Ru(0001)

Wetting and Multilayer Growth on Metal Surfaces

Adsorption and Desorption Kinetics on a Porous Solid: N₂ on Amorphous Solid Water

Surface Functionalization for Selective Area ALD

Surface Mechanisms in Oxygen-Based Noble Metal Atomic Layer Deposition

Atomic Layer Deposition of Hafnium Silicate Gate Dielectric Layers

Mechanistic Details of TiN Atomic Layer Deposition (ALD) Processes

Surface Processes of Plasma-Assisted Atomic Layer Deposition

Extreme High Vacuum (XHV): The Need, Production and Measurement

1450 m³ at 10^-9 Pa: One of the KATRIN Challenges

XHV Experience at Daresbury Laboratory

Development of a New NIST Calibration Service Using the Comparison Method for Vacuum Gauges Spanning the Range 0.65 Pa to 130 kPa

A Comparison of the High Vacuum Standards of the National Physical Laboratory of India and the National Institute of Standards and Technology, USA at 0.05 Pa using the Spinning Rotor Gauge

A Linear Pressure Drop Gas Flow Calibrator

A Memory of Jim Lafferty