AVS1999 Thursday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Thursday, October 28, 1999 | ||||||||||
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8:20 AM | 9:20 AM | 10:20 AM | 11:20 AM | ||||||||
AS-ThM |
The Real World: Surface Analysis Applications and Innovations in Industry
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Effect of Sputtering Gas on Cleaning Al-Based Intermetallics and the Determination of Surface Compositions based on Auger Analysis
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Failure Mechanisms of Adhesively Bonded Hot Dipped Galvanised Steel Studied by Small Area XPS
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Novel X-ray Sensor Suite for In Situ Optimization of Thin Film Architectures
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A 300mm SAM, with EDX and FIB for Full Wafer Defect and Thin Film Characterization
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A Study of the Surface Chemistry and Physical Properties Related to Adhesion of the Polyimide Passivation Layer by XPS, FTIR, and Contact Angle Measurements
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Diffusion of Large Molecules on Metallic Surfaces using TOFSIMS
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Identification of Surface Chemical Functional Groups in Reverse Osmosis Membranes: An X-ray Photoelectron Spectroscopy Study
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BI-ThM |
Nucleation and Growth of Calcium Phosphate on Self-Assembled Monolayers
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Surface Modification of a Model Biomaterial by UV-Laser and/or Electron Beam Irradiation1
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Synthesis and Surface Characterization of Peptide-Modified Interpenetrating Polymer Networks that Control Biomineralization
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Osteoblast Behavior on Surfaces with Varied RGD Peptide Surface Concentrations Prepared Using Gold-Thiol Self-Assembly
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Molecular Recognition at the Protein-Biomineral Interface
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Kinetics and Interfacial Energy Studies of Biomineralization
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Incorporation of Dye Molecules into Calcium Oxalate Host Crystals
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Molecular Orientation in Artificial Joint Polymers: Characterizing the Precursors of Wear with Soft X-ray Absorption
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Peptide Functionalized Titanium Alloy Surfaces for Orthopedic and Dental Materials
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EM1-ThM |
Strength of Nanoscale Copper Under Shear
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A Discussion of the Interconnection Science and Technologies
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Electrochemical Deposition Cu Films for ULSI Applications
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Complete Filling of High-Purity Copper in Subquarter-Micron Trench Structure Using Plasma CVD Reactor with H Atom Source
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The Stability of Thin TiN and TaN Layers as Diffusion Barriers for Copper under Thermal Annealing and Bias Temperature Stress Conditions
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Surface Modification and Cleaning Enhancement of TaSiN Films with Dilute Hydrofluoric Acid*
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Fluroinated Amorphous Carbon - A Low Dielectric Constant Material for Multilevel Interconnect Applications
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Multilayered Si-Based Organic Thin Films with Low-Dielectric-Constant Formed by Plasma-Enhanced Chemical Vapor Deposition from Hexamethyldisiloxane
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Low-k Si-O-C-H Composite Films Prepared by Plasma Enhanced Chemical Vapor Deposition using BTMSM(bis-trimethylsilylmethane) Precursor
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EM2-ThM |
Dielectric Passivation/Oxides on Compound Semiconductors
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Study of GaAs Oxidation in H2O2 and H2O using Spectroscopic Ellipsometry
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The Effective Two-step Passivation of Metal/GaAs Interface with Sulfur and Hydrogen Plasma
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Advanced Selective Dry Etching of GaAs/AlGaAs in High Density Inductively Coupled Plasmas
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Characterization of Hydrogen Passivation in p-type InP (100)
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Synchrotron Radiation-Induced Wet Processing of GaAs*
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MI+ |
1-D Propagation of a Magnetic Domain Wall in Submicron Magnetic Wire
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Magnetism of Interconnected Co Nanodots Grown on the N-modified Cu(001) Surface
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Periodic Magnetic Microstructures using Glancing Angle Deposition
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Magnetic Quantum Cellular Automata
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Growth, Magnetization, and Magnetoresistance of Self-Assembled Lateral Multilayers
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Stripe Domains in Ultraflat Fe/Cu(001) Particles
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Magnetic Properties of Iron Clusters Deposited on Graphite
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Magnetic Properties of Co and Fe Particles on Sapphire Single Crystal Surfaces
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Magnetic Behavior of Nanosize Cobalt Particles in (SiO2, MgO, CoO) Matrix
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MM+ |
Magnetic Micromachining Technology: From Materials to Components to Actuators
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Fabrication and Characterization of Polycrystalline Silicon Thin Films with Hydrofluoric Acid Permeability for Sacrificial Etching of Underlying Oxide Layers
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A New Chemistry for Rapid Etching of SiO2
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Residual Stress Characterization of Thick PECVD Oxide Films for MEMS Applications
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Process and Fabrication of a Thin Film PZT Pressure Sensor
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Microfabricated Low-Power Broad-Band Light Source Utilizing Tungsten Filaments
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MS+ |
ESH as One of the Key Criteria for Semiconductor Process Development
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The Environmental Impact of Perfluorinated Compounds used in the Semiconductor Industry
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Optimization of Processing Plasmas in the Semiconductor Industry for Minimal Environmental Impact
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PFC Abatement in Inductively Coupled Plasma Reactors using O2, H2 and H2O as Additive Gases1
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Modeling of Nonisothermal, Coupled Neutral/Plasma Dynamics in PFC Abatement Plasmas
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Remote Plasma Sources for Cleaning CVD Reactors: Development and Implementation of a Technology for Green Manufacturing of Integrated Circuits
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Study of NF3-Based High Density Plasma Oxide Etch Processes for Reduced Global Warming Emissions
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Environmentally Harmonized Silicon Oxide Selective Etching Process Employing Novel Radical Injection Technique
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NT+ |
Carbon Nanotube Molecular Electronics
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Electrical Transport in Single-Wall Nanotube Rings: Coherence and Localization
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Analysis of Carbon Nanotube Field-Effect-Transistors (FETs)
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Novel Length Scales in Nanotube Devices
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Field Emission from Carbon Nanotubes and Its Application to Electron Sources in Display Elements
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Emission Properties of Large-area, Fully-sealed Carbon Nanotube Field Emission Display
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The Structure of Nanotubes Observed with Thermal Field Emission
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Fabrication and Field Emission Properties of Adherent Carbon Nanotube Films
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Characterization of Oriented Carbon Nanotube Cathodes for Field Emission Flat Panel Display and Light Source Applications
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PS-ThM |
Theoretical Analysis of the Interactions of Chemically Reactive Clusters from Silane Plasmas with Crystalline and Amorphous Silicon Surfaces
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Hydrogen Atom Reactions in a-SiC:H Film Growth
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An In Situ Study of Plasma Deposition of Hydrogenated Amorphous Silicon Using Multiple Total Internal Reflection Infrared Spectroscopy
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Plasma and Surface Chemistry in a Remote Silane Plasma Studied By Various Diagnostics and Related to a-Si:H Film Quality
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Competition Between Etching and Deposition in Methane/Hydrogen Plasma Interactions with the Si(100) Surface
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A Multi-dimensional Model for an Inductively Coupled Ar/C4F8 Discharge
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Inorganic Plasma Low-k Materials - Aurora 2.7 -
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Plasma Modification of Polymeric Membranes
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Polymer Surfaces Modified Using RF Plasma
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SS1+ |
Two-Dimensional Phase Transitions in Amphiphile Monolayers
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Surface Phase Transitions of Asymmetric Dialkyl Disulfide Self-Assembled Monolayers
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Structure, Bonding and Reactivity of Self-assembled Monolayers
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Structure of Partially Fluorinated n-alkanethiols on Polycrystalline Gold and Silver Surfaces
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Controlling the Placement of Molecules in the Self Assembly and Directed Assembly of Organic Monolayers
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Protein Adsorption to Model Surfaces: Probe Adhesion Between Fibrinogen and Patterned SAMs
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Modification of Self-Assembled Monolayers by X-ray, Electron and Thermal Treatments
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Electron-induced Damage in Thio-functionalized Alkanethiol Monolayers
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Sensitivity of Alkanethiol Self-assembled Monolayers toward Low-energy Electron Irradiation
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SS2+ |
Evolving Surface Morphology: An In Situ STM Study of 2-20 nm SiGe Quantum Wells Grown on 75 mm Si (100) Wafers
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Hydrogen-Mediated Surface Morphological Evolution in Si0.7Ge0.3/Si(001) Layers Grown by Hydride Gas-source Molecular Beam Epitaxy
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Interdiffusion During Growth of Ge on Si(100)
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Confined Intermixing of Ge and Si
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Surface Segregation and Surface Reactivity in Heteroepitaxial Vapor Phase Thin Film Growth: Si1-xGex on Si(111)
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The Role of Arsenic Surfactant in the Growth of Germanium Thin Films on Si(100) Surfaces
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The Dynamics of the Si(111) (7x7) to (1x1) Phase Transition Investigated by Low Energy Electron Microscopy
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The Motion of Atomic Steps on Ultra-Flat Si(111)
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Novel Growth Behavior of Ge on Pb Covered Si(111) Surface
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The Growth of High Density, Small Ag Islands at the Si(111)7x7 Surfaces with Adatom Defects
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SS3+ |
Determination of Sticking Probability and Transition State Energy by Line-of-Sight Detection: Halocarbons on Cu(111)
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Demonstration of Angle Resolved Auger-photoelectron Coincidence Spectroscopy from a Solid: First Results from the Cu(111) Surface
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Multiple Atom Resonant Photoemission: A New Tool for Determining Near-Neighbor Atomic Identities and Bonding
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Incident Beam Diffraction in Electron Stimulated Desorption
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Direct Atomistic Observation of Structural Dynamics in Surfaces and Interfaces by Time-Resolved High-Resolution Transmission Electron Microscopy
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Ionization Mechanisms of Water in High Interfacial Electric Fields
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Free Electron Laser Nanospectroscopy Interface Applications
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Imaging and Charge Transport Measurements using Dual-Probe Scanning Tunneling Microscopy
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The Miniature Cylindrical Mirror Analyzer: A New Tool For Surface Analysis
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Investigations of Surface Reactions on Thin Film-Supported Catalysts Using Microhotplate Arrays
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TF-ThM |
Thin Films from Slow and Energetic Cluster Impact
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Spark-Processing - A Novel Technique to Prepare Light-Emitting, Nanocrystalline Silicon Films
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Interesting Properties of Nanophase Films Deposited from a High-rate, Nanoparticle Beam
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Simulation of Fundamental Physical Phenomena in the Deposition of Nanophase Thin Films using a Sputtering Based Source
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Deposited Porous Silicon on Insulator Substrates
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Optical Properties of Chiral Thin Film Nanostructures and Composites
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Solid State Electrochromic Devices for Thermal Emittance Control
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Correlation Between Phase Constituency and Near Ultraviolet Optical Absorption in Nanophase Titania Films
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VT-ThM |
A Comparison of Outgassing Rates from Stainless and Carbon Steels
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Experiments with Thin-Walled Stainless Steel Vacuum Chamber
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Review of Models for the Outgassing of Water Vapor from Metallic Surfaces
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Measuring and Locating Internal Helium Leaks in the RHIC Insulating Vacuum System
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Contraflow Leak Detectors with Improved Sensitivity Under High Helium Background Conditions*
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LIGO Beam Tube Component and Module Leak Testing
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Low-flow Measurements Techniques for Calibrating Mass Flow Controllers
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Dimensionless Parameters for Laminar Flowmeters
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Decay Rate of Photoresist Outgassing from Ion Implantation
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