ALD/ALE 2024 Wednesday Afternoon

ALD Solutions for Compound Semiconductor Devices

Plasma Effects on the Epitaxial Growth of Aluminum Nitride Thin Films on (0001)4H-SiC by PE-ALD

Novel Low Temperature Thermal ALD of Aluminum Nitride Utilizing a Non-Metal Catalyst

Thermal and Plasma Enhanced ALD growth of functional Al₂O₃/AlN dielectric stacks for silicon carbide MOSFETs

Reduction of Defects at or Near ALD-Al₂O₃/GaN Interfaces for Improved Electrical Performance of GaN Power Devices

Fabrication of RuS2 Photodetector Via Post Sulfurization of Atomic Layer Deposition Ru Thin Film

Spatial Atomic Layer Deposition: A New Revolution in Ultra-Fast Production of Conformal and High-Quality Optical Coatings

Deposition and Characterization of Electro-Optic ALD K(Ta_X,Nb_1-X)O₃ Films for Photonics

Advances in Plasma-based Atomic Layer Processing of AlF₃ for the Passivation of FUV Mirrors

Plasma-Enhanced Atomic Layer Deposition with RF Substrate Biasing to Tune the Performance of Superconducting Nanowire Single-Photon Detectors in the Mid-Infrared

Atomic Layer Deposition for Stable On-Chip Quantum Dot LEDs: Hybrid Quantum Dot Pockets

A Comparative Study on Cation distribution effects in Heterogeneous channel IGZO TFTs via Atomic Layer Deposition Supercycle Design

Characteristics of PEALD IGZO Films Using Tetrahydrofuran-Adducted In & Ga Precursors

Triggering Nucleation of Pt ALD through UV-illumination

Reaction Pathway of Copper Atomic Layer Deposition via Time-of-Flight Mass Spectrometry

in vacuo Cluster Tool for Studying Reaction Mechanisms in ALD and ALE Processes

Understanding the Dual-Source Behavior of LiHMDS for Si-Free Li-Containing Films

ALD of Two-Dimensional Gallium Sulfide: Understanding the Nucleation and Strain Evolution During Growth

Self-Limiting Deposition of Copper from Copper Beta-Diketonates and Plasma Electrons

Exploration of Nucleation Phenomena in Ultra-Thin ALD Films on NMC 811 Substrates: An in Situ Quartz Crystal Microbalance Study

The Role of the Oxidizing Co-Reactant in Pt Growth by Atomic Layer Deposition Using MeCpPtMe₃ and O₂/O₃/O₂-Plasma

In vacuo XPS Growth Studies During ALD of ErNiO₃

Surface Chemistry of Aluminum Nitride ALD

Investigating Hf Oxide Growth with Ambient Pressure XPS and Ozone as Co-Reactant

ALD/ALE 2024 Closing Remarks

UHP PEALD Growth and High Field Dielectric Testing of κ-Ga₂O₃ Films

Crystalline Phase Control of Manganese Oxide Films by Plasma Enhanced Atomic Layer Deposition

Superconducting Ultrathin Niobium Nitride Films for Quantum Application

Utilizing Thermodynamic Analysis to Screen Material and Precursor Selection for Selective Thermal Atomic Layer Etching

Atomistic Surface Processing Simulations: ALE of Transition Metal Dichalcogenides

Gas-Phase Etching Mechanism of Amorphous Hydrogenated Silicon Nitride by Hydrogen Fluoride: A Theoretical Study

Dynamic Global Model of Cl₂/Ar Plasmas for Atomic Layer Etching of GaN

A Transient Surface Site Balance Model for Si-Cl2-Ar Atomic Layer Etching

Theoretical Analysis on Halogenation of Transition Metal Surfaces toward Thermal Atomic Layer Etching

Atomic-Scale Homogeneous PtRu Alloy Thin Films Prepared by Atomic Layer Modulation (ALM)

A New Approach to the Synthesis of Nb@TiO₂ Core-Shell Composite for Oxide Dispersion Strengthened Alloy via Atomic Layer Deposition

Influence of an Artificial Structure on the Mechanical Properties of Atomic Layer Deposited Al₂O₃ and Ta₂O₅ Composite Thin Films

ALD Young Investigator Award Finalist Talk: Phosphorus-Rich Metal Phosphide Thin Films Using Zintl Ions

Improved Crystallinity and Polarity Determination of Gallium Nitride on Si (111) Using Atomic Layer Annealing

Self-limiting Epitaxy of GaN and InN Films on Sapphire Substrates

Epitaxial Rare-Earth Orthoferrites by Atomic Layer Deposition

Area Selectivity and Crystallographic Orientation of ZIF-8 Films Deposited by Molecular Layer Deposition