ALD2023 Wednesday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Wednesday, July 26, 2023
1:30 PM 2:30 PM 3:30 PM
Synthesis of Low-k SiCNO Thin Films by Plasma-enhanced Atomic-molecular Layer Deposition with Tetra-isocyanate-silane (TICS) and Phloroglucinol (Phl)
Performance and Thermal Stability Improvement of Vertical-Channel Thin-Film Transistor by Controlling Deposition Temperature of Gate Stack Prepared by Atomic Layer Deposition
Sequential Design of PEALD In-Ga-Zn-O Active Layer: Sub-cycle Engineering of Indium Oxide Layer for Highly Stable TFT
Bilayer Channel Combination Strategy via Atomic-Layer Deposition of In-Sn-O/In-Sn-Zn-O Structures for Highly-Functional Oxide Thin-Film Transistors
Elaboration of Refractory Metamaterials by Atomic Layer Deposition for Tuning Thermal Emission at High Temperature
Optical Properties of Interconnected Plasmonic Nanostructures with sub-10 Nm Nanogaps by Area-Selective Atomic Layer Deposition
Electrochemically Active Antibacterial Electrodes for Neural Interfacing Applications
Ultrathin TiO2 ALD Coatings Strongly Enhance Biological Response of Biomedical Materials
Atomic Layer Deposition of Highly Stable and Efficient Perovskite Solar Cells (~ 24%)
ALD of Niobium Oxide (Nb2O5) and Niobium-doped Titanium Oxide (Nb:TiO2) for Solar Cell Applications
Closing Remarks
Effect of Inhibitor Adsorption on the Mechanisms for Selectivity Loss
Electronic Structure of ALD Al2O3/TiO2 Heterointerfaces: A First-principles Study
Reaction Mechanism of Bifunctional Organic Reactants and Diethylzinc for Atomic and Molecular Layer Deposition
Simulated Conformality of ALD Growth Inside Lateral HAR Channels: Comparison between a Diffusion-Reaction Model and a Ballistic Transport-Reaction Model
Simulated Conformality of ALD in Lateral High Aspect Ratio Channels: Impact of Knudsen Number on the Saturation Profile
Atomistic Modeling of Thin-Film Deposition with Carrier Gases
Chemistry of Plasma-Enhanced and Thermal Atomic Layer Deposition of Metal and Intermetallic Thin Films: The Role of Substrates and Reducing Agent
Revealing Process-Structure Relationships for ALD Amorphous Oxide Semiconductors with XANES and First-Principles Modeling
Machine-Learning Aided Understanding of ALD Processes
Digital Twin and Experimental Platform for AI-Driven Optimization of ALD Processes
Closing Remarks in Grand Ballroom H-K
MLD/ALD of Hybrid Dielectrics for Flexible Electronic Devices
The Molecular Evolution of Zno Sequential Infiltration Synthesis
Conformal ALD/MLD of Perfectly Stable Zn-Benzenedithiol Thin Films
Recent Developments in Oxidative Molecular Layer Deposition (oMLD)
In Situ Analysis of Growth Mechanism During Molecular Layer Deposition of Polyurea
A Chemist’s Lego Blocks: Molecular Layer Deposition (MLD) for Nanoelectronic Applications
Recent Advances for Spatial Atomic Layer Deposition Process: Microreactor Direct Atomic Layer Processing (μDALP™)
Towards Improved Conversion of Wet Waste to Jet Fuel with Atomic Layer Deposition-Coated Hydrodeoxygenation Catalysts
A Kinetic Model for Heterogeneous Nucleation in ALD and CVD
Intrinsic Area Selective Atomic Layer Deposition of MoS2 Thin Films
Selective Deposition of HfO2 on Aminosilane-treated TiN/SiO2 Substrates
Atomic Layer Deposited Zr-doped HfO2 (HZO) and Indium Gallium Oxide (IGO) Thin Films for 3D Gate-All-Around FeFET
Development of Robust Gate Insulators for MIS-HEMT Structures Based on ALD/PEALD Techniques
Exploring the Blocking Mechanism of Small Molecule Inhibitors by Density Functional Theory
Reaction Mechanism of Atomic Layer Deposition of Pt from First Principles
Closing Remarks in Grand Ballroom H-K
Sessions | Time Periods | Topics | Schedule Overview