ALD2023 Tuesday Morning

Nanoscale Surface Engineering for Battery Electrode and Solid Ionic Electrolytes

Enabling Fast Charging of Lithium-ion Batteries by Coating of Graphite with ALD

Aluminum Doping of Lithium Phosphate using Atomic Layer Deposition

Developing High-Performance Nickel-Rich Cathodes of Lithium-ion Batteries via Atomic Layer Deposition

Molecular-Layer-Deposited Zincone Films Induce the Formation of LiF-Rich Interphase for Lithium Metal Anodes

Deconvoluting the Impacts of Lithium Morphology and SEI Stability on Battery Cyclability Using ALD-Grown Thin Films

ALD for MEMS Sensors and Actuators

Applications of Piezoelectric, Ferroelectric, and Antiferroelectric Thin Films Grown by Atomic Layer Deposition

Effect of RF Substrate Biasing in Tuning the Tribological Properties of Plasma Enhanced Atomic Layer Deposited Titanium Vanadium Nitride Thin Films

Towards ALD of hard AlTiN coatings

Precursor Design Enabling Angstrom Era Semiconductor Manufacturing

Atomic Layer Deposition of Silver Halides

Novel Metal Fluoride ALD Processes

Halide-free, Low Melting, Volatile, Thermally Stable Mo(0) Precursors for ALD of Mo films

Thermal Atomic Layer Deposition of MoC Thin Films

Precursors and Processes for the Atomic Layer Deposition of Bismuth Metal Thin Films

Atomic Layer Deposition of Tin Oxide Thin Films Using a New Liquid Precursor Bis(ethylcyclopentadienyl) Tin

Influence of Plasma Species on the Growth Kinetics, Morphology, and Crystalline Properties of Epitaxial InN Films Grown by Plasma-Enhanced Atomic Layer Deposition

Towards Self-Limiting III-Nitride Epitaxy via Hollow-Cathode Nitrogen Plasmas

Thermal Atomic Layer Deposition of Gallium Nitride at 150 - 300°C using Tris(dimethylamido)gallium Precursor and Hydrazine

Crystalline Gallium Nitride Deposition on SiO₂/Si by RF-Biased Atomic Layer Annealing

Intensified Atomic Layer Deposition and Atomic Layer Etching

Mass Changes During and After Al(CH₃)₃ Exposures for Thermal Al₂O₃ ALE at Low TemperaturesUsing HF and Al(CH₃)₃ as Reactants

Crystallinity of Sacrificial Etch Layer Influences Resulting Structure During Simultaneous Deposition and Etching

There's no Place like a Surface: How Deposition and Etch Chemistry Depend on the Nature of the Surface

Substrate Dependent HfO₂ Atomic Layer Etch Rate Evolution Observed by In-situ Quartz Crystal Microbalance during Integrated ALD+ALE

Al Mirror Passivation with Atomic Layer Etching of Native Oxide and in-Situ Passivation with Atomic Layer Deposition of AlF₃ or MgF₂

Plasma Oxidation of Copper: Molecular Dynamics Study with Neural Network Potentials

Multi-scale Simulation Study for the Role of High C/F ratio Plasma on Etch Selectivity of SiO₂ and Si₃N₄ in q-ALE

Selecting a Method for ALE Modeling

Advances in the Industrial Adoption of Selective ALD Processes

Control of Silanol Density in Silicon Oxide Surfaces via Gas-Phase Treatments to Control Metal Atomic Layer Deposition

Inherently Area-Selective Atomic Layer Deposition of Device-Quality Hf_1-xZr_xO₂ Thin Films through Catalytic Local Activation

Targeted Dehydration as a Route to Site-Selective Atomic Layer Deposition at TiO₂ Defects

Inhibitor-Free Area Selective Atomic Layer Deposition based on Atomic Layer Nucleation Engineering and Surface Recovery with a Feature Size of Nearly 10 nm

Dopant-selective Choreography of Metal Deposition for Bottom-up Nanoelectronics

Effect of Surface Pretreatment to reduce the Incubation Period of Iridium Thin Film grown by ALD on the Oxide Surface

Consequences of Random Sequential Adsorption of Inhibitor Molecules for Loss of Selectivity During ALD

In-Situ Formation of Inhibitor Species Through Catalytic Surface Reactions During Area-Selective Tan ALD

Area Selective Atomic Layer Deposition of Ru and W Using W Precursor Inhibitor

Partial Surface Passivation for Controlled Growth and Conformality Improvement on High Aspect Ratio Features Using Small Molecule Inhibitors

Fundamental Surface Chemistry Considerations for Selecting Small Molecule Inhibitors for AS-ALD