ALD2023 Monday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Monday, July 24, 2023
1:30 PM 2:30 PM 3:30 PM 4:30 PM
Precursors for Photoassisted Area Selective Deposition on Self Assembled Monolayers
Reductive Thermal ALD of Pd and Au Thin Films
Phosphorus Zintl Species as ALD precursors for Metal Phosphide Thin Films
Investigation of Discrete Reactant Feeding for Atomic Layer Deposition of In2O3 Using Novel Liquid Alkyl-Cyclopentadienyl Indium Precursor
Synthesis and Precursor Property Evaluation of Er Enaminolate Complexes and Deposition of Er2O3 Thin Film using Thermal Atomic Layer Deposition (ALD)
Deposition of CsSnI3 Perovskite Thin Films by Atomic Layer Deposition and Pulsed Chemical Vapor Deposition
Student Award Finalist Talk: Thermal characterization and Area Selective Deposition of NHCs
Student Award Finalist Talk: Reaction Mechanism on ALD Process of Ru and Pt
Student Award Finalist Talk: Thermal Atomic Layer Etching of Gold Using Sulfuryl Chloride for Chlorination and Triethylphosphine for Ligand Addition
Student Award Finalist Talk: Conformality of Atmospheric-Pressure Plasma-Enhanced Spatial Atomic Layer Deposition of SiO­­2 and TiO2
Student Award Finalist Talk: “Inverted ASD” with High Selectivity: Polymer on SiO2 vs. Si-H and Polymer on Si-OH vs. SiO2
Student Award Finalist Talk: Plasma Isotropic ALE of GaN Using SF6 Plasma and TMA
Student Award Finalist Talk: Competition between Deposition and Etching Reactions in ALD of Indium Gallium Zinc Oxide (IGZO)
Student Award Finalist Talk: Atomic Layer Deposition of Semimetallic TiS2 Contact Layer on MoS2-based Thin Film Transistor for Contact Resistance Reduction
Break & Exhibits
Wet Atomic Layer Etching of Metals
Thermal Atomic Layer Etching of Molybdenum Based on Sequential Oxidation and Chlorination Reactions
Non-Halogen Plasma for Selective Removal of Titanium Compounds Applied in Advanced Atomic Layer Etching
Leveraging Surface Nitridation to Enable Plasma-Thermal Atomic Layer Etching of Ni Based Metals
Plasma Atomic Layer Etching of Ruthenium with Surface Fluorination and Ion Bombardment for Next-generation Interconnect Metal
Comparison of Ruthenium ALE based on ICP and Ion Beam
A Modified ALD-like Approach to Demonstrate Exceptionally Thin Dielectric Layer Growth on 2D Materials
Water-free SbOx-ALD-process for Coating Bi2Te3-particles
2D FeSX Nanosheets by ALD: Electrocatalytic Properties Towards Hydrogen Evolution Reaction
300 mm Wafer-Scale and Self-limiting Layer Synthesis of 2D MoSe2 by Atomic Layer Deposition
Wafer-Scale Controlled Growth of Two-Dimensional Metal Dichalcogenides Through Atomic Layer Deposition and Top-Bottom Epitaxy
Sessions | Time Periods | Topics | Schedule Overview