Atomic Layer Deposited Nano-Coatings to Protect SrAl₂O₄ Based Long-Life Phosphors from Environmental Degradation

Enhanced Interfacial Fracture Toughness of Polymer-Epoxy Interfaces using ALD Surface Treatments

Atomic Layer Deposition of Pd on ZnO Nanorods for High Performance Photocatalysts

Accelerating Light Beam (ALB) Generation through Dielectric Optical Device Fabricated by Low Temperature Atomic Layer Deposition (ALD)

Tunable Plasmonic Colours Preserved and Modified by Atomic Layer Deposition of Alumina

TFE of OLED Displays by Time-Space-Divided (TSD) PE-ALD and PE-CVD Hybrid System

Tailoring the Ferroelectricity of ZrO₂ Thin Films using Ultrathin Interfacial Layers Prepared by Plasma-Enhanced Atomic Layer Deposition

Spin-Hall-Active Platinum Thin Films Grown Via Atomic Layer Deposition

Silicon-Based Low k Dielectric Materials with Remote Plasma ALD

SiOC Films by PEALD with Excellent Conformality and Wet Etch Resistance

ALD TiN for Superconducting Through-Silicon Vias

Physical and Electronic Properties of Annealed ALD-deposited Ru from Ru(DMBD)(CO)₃ and Oxygen

Fluorine Free Boron-Containing Composite Layers for Shallow Dopant Source Applications

Impact of Medium Energy Ions on the Microstructure and Physical Properties of TiN Thin Layers Grown by Plasma Enhanced Atomic Layer Deposition (PE-ALD).

ALD Process Monitoring for 3D Device Structures

Rhenium(III)-based Ternary Oxides: Novel Materials from Straightforward Synthesis via ALD Comprising Uncommon Reaction Pathways

Growth Bbehavior and Electronic Characterization of PbZrO₃ and PbZr_xTi_1-xO₃ Grown by Atomic Layer Deposition with Several Zr Precursors

Understanding Growth Characteristics of ALD NiAl_yO_x: The Role of Ozone

Atomic Layer Deposition of B_xMg_1-xO Films: Progress Towards Shallow Boron Doping

Enhanced Doping Control of Metal Oxide Thin Films Using a Modified ALD Process

As Deposited Epitaxial LaNiO₃ and La(Ni,Cu)O₃ with Controllable Electric Properties

Time Dependence of Pyroelectric Response in Ferroelectric Hf_0.58Zr_0.42O₂ Films

Tailoring Nickel Oxide Conductivity by Introducing Transition Metals: From First-principles to Experimental Demonstration

Modified ALD Process to Achieve Crystalline MoS₂Thin Films

Nucleation and Growth of ALD MoS₂ Films on Dielectric Surfaces

Plasma-Enhanced Atomic Layer Deposition of Transition Metal Dichalcogenides: From 2D Monolayers to 3D Vertical Nanofins

Atomic Layer Deposition of Emerging 2D Semiconductors HfS₂ and ZrS₂

Low Temperature ALD for Phase-controlled Synthesis of 2D Transition Metal (M=Ti, Nb) di- (MX₂) and Tri- (MX₃) Sulfides

ALD Boron Nitride Coated and Infiltrated Carbon Materials for Environmental Applications