ALD2019 Tuesday Morning

ALD for Solar Fuels: Rendering Halide Perovskites Acid-Compatible + Precision Cluster Electrocatalysts

Plasma-Assisted ALD of Cobalt Phosphate: Process Development and Electro-Catalytic Activity Towards Oxygen Evolution Reaction

Improved Electrochemical Activity of Pt Catalyst Fabricated by Vertical Forced-Flow Atomic Layer Deposition

Improved Catalyst Selectivity and Longevity using Atomic Layer Deposition

Enhancing Co₂C Activity for C₂₊ Oxygenate Production from Syngas using ALD Promoters

Atomic Layer Deposition of Bismuth Vanadate Core-Shell Nanowire Photoanodes

Improved Photocatalytic Efficiency by Depositing Pt and SiO₂ on TiO₂ (P25) using Atomic Layer Deposition in a Fluidized Bed

Atomic Layer Deposition of Glassy Lithium Borate-Carbonate Electrolytes for Solid-State Lithium Metal Batteries

ALD Interlayers for Stabilization of Li₁₀GeP₂S₁₂ Solid Electrolytes Against Li Metal Anodes

ALD and MLD on Lithium Metal – A Practical Approach Toward Enabling Safe, Long Lasting, High Energy Density Batteries

Synergistic Effect of 3D Current Collectors and ALD Surface Modification for High Coulombic Efficiency Lithium Metal Anodes

Atomic Layer Deposition FeS@CNT from Elemental Sulfur as an Electrode for Lithium-Ion batteries

Surface Chemistry during ALD of Nickel Sulfide

In situ and In vacuo Studies on Plasma Enhanced Atomic Layer Deposited Cobalt Films

Investigation of PEALD Grown HfO₂ Thin Films via Near Ambient Pressure XPS: Precursor Tuning, Process Design and a New In-situ Examination Approach for Studying Film Surfaces Exposed to Reactive Gases

Surface Science Studies of GaN Substrates Subjected to Plasma-Assisted Atomic Layer Processes

Infrared and Optical Emission Spectroscopy on Atmospheric-Pressure Plasma-Enhanced Spatial ALD of Al₂O₃

Fingerprinting of ALD Reaction Products with Time-Resolved In situ Mass Spectrometry

Studying Pt and Pd Nanoparticle ALD through X-ray based In situ Characterization

Characterizing Water Delivery for ALD Processes

A Nickel Chloride Adduct Complex as a Precursor for Low-Resistivity Nickel Nitride Thin Films with Tert-butylhydrazine as a Coreactant

Simple, Rationally Designed Aluminum Precursors for the Deposition of Low-impurity AlN Films

Atomic Layer Deposition of Lead(II) Sulfide at Temperatures Below 100 °C

Development and Characterization of a Novel Atomic Layer Deposition Process for Transparent p-Type Semiconducting Nickel Oxide using Ni(^tBu2DAD)₂ and Ozone

Blocking Thermolysis in Diamido Plumbylenes

ALD of Sc₂O₃ with Sc(cp)₃ and a Novel Heteroleptic Precursors

A Novel Self-limited Atomic Layer Deposition of WS₂ based on the Chemisorption and Reduction of bis(t-butylimido)bis(dimethylamino) Complexes

Enabling Nucleation Phenomena Studies of ALD Deposited Films by In-situ High-Resolution TEM

In-situ ellipsometric analysis of plasma assisted ALD grown- stoichiometric and crystalline AlN films

Film Properties of ALD SiNx Deposited by Trisilylamine and N₂ Plasma

Comparison of Properties of Conductive Nitride Films Prepared by PEALD using Quartz and Sapphire Plasma Sources

Role of Hydrogen Radicals in the Surface Reactions of Trimethyl-Indium (TMI) with Ar/N₂ Plasma in Hollow-Cathode Plasma-Assisted ALD

Analyses of Hexafluoroacetylacetone (Hfac) Adsorbed on Transition Metal Surfaces

Thermal Atomic Layer Etching of Silicon Nitride using an Oxidation and “Conversion-Etch” Mechanism

Thermal Dry Atomic Layer Etching of Cobalt with Sequential Exposure to Molecular Chlorine and Diketones

Spontaneous Etching of B₂O₃ and TiO₂ by HF: Removal Reaction in WO₃ ALE and TiN ALE

Thermal Based Atomic Layer Etching of Aluminum Oxide and Titanium Nitride

Thermal Atomic Layer Etching of Amorphous and Crystalline Hafnium Oxide, Zirconium Oxide and Hafnium Zirconium Oxide

Isotropic Atomic Layer Etching of Cobalt with Smooth Etched Surfaces by using Cyclic Repetition of Plasma Oxidation and Organometallization

Atomic Layer Etching for Germanium using Halogen Neutral Beam =Comparison between Br and Cl Chemistry=

A New Etching / Passivation Process in Cyclic Mode for Spacer Etching in 3D CMOS Integrations

Atomic Layer Etching of Transition Metals with Gas Cluster Ion Beam Irradiation and Acetylacetone

Atomic Layer Etching at Atmospheric Pressure

Overview of Wet And Dry Selective Processes Driven by Area Activation or Deactivation Down to Below 20nm Critical Dimensions

Electron-Enhanced Atomic Layer Deposition (EE-ALD) of Cobalt Metal Films at Room Temperature

Area Selective Atomic Layer Deposition on Molecular Design

From Surface Dependence in Atomic Layer Deposition to Area-Selective Deposition of TiN in Nanoscale Patterns